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    Pulse modifier, lithographic apparatus, and device manufacturing method
    11.
    发明专利
    Pulse modifier, lithographic apparatus, and device manufacturing method 有权
    脉冲修正器，光刻设备和器件制造方法

    公开(公告)号：JP2009147333A

    公开(公告)日：2009-07-02

    申请号：JP2008312093

    申请日：2008-12-08

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BOTMA HAKO

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70983 ,  G03F7/7055 ,  Y10S372/70

    Abstract: PROBLEM TO BE SOLVED: To provide a pulse modifier, a related lithographic apparatus, and a device manufacturing method.
    SOLUTION: The pulse modifier is so configured as to receive the input pulse of radiation and emit a plurality of corresponding output pulse portions of radiation. Each pulse portion is reflected symmetrically about an axis that traverses the optical axis of the pulse portion, as well as, being reflected symmetrically about a point on the optical axis of the pulse portion.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供脉冲修正器，相关的光刻设备和器件制造方法。 解决方案：脉冲修改器被配置为接收辐射的输入脉冲并且发射多个相应的辐射的输出脉冲部分。 每个脉冲部分围绕穿过脉冲部分的光轴的轴对称地被对称地反射，并且围绕脉冲部分的光轴上的点被对称地反射。 版权所有（C）2009，JPO＆INPIT

    Beam correction apparatus
    12.
    发明专利
    Beam correction apparatus 有权
    光束校正装置

    公开(公告)号：JP2007052428A

    公开(公告)日：2007-03-01

    申请号：JP2006220800

    申请日：2006-08-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BOTMA HAKO

    IPC: G02B27/09 ,  H01L21/027

    CPC classification number: G03F7/7055

    Abstract: PROBLEM TO BE SOLVED: To provide a beam correction apparatus that reduces asymmetrical properties of a radiation beam.
    SOLUTION: The beam correction apparatus 50 is arranged along a first optical axis, and includes a splitter 10 configured so as to split the incident radiation beam into first and second portions. The splitter is configured so as to guide the first portion along a second optical axis and guide the second portion through a delay path 40. The apparatus further includes an optical element for forming a delay path. The optical element is configured so as to receive the second portion, to guide the second portion through the delay path, and then to guide the second portion along the second optical axis. The optical element is arranged so that the second portion is mirrored with respect to the first portion, thereby mirroring the second portion.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供减少辐射束的不对称性质的光束校正装置。 光束校正装置50沿着第一光轴布置，并且包括分离器10，其被配置为将入射的辐射束分成第一和第二部分。 分离器被配置为沿着第二光轴引导第一部分并且引导第二部分通过延迟路径40.该装置还包括用于形成延迟路径的光学元件。 光学元件被配置为接收第二部分，以引导第二部分穿过延迟路径，然后沿着第二光轴引导第二部分。 光学元件被布置成使得第二部分相对于第一部分被镜像，从而镜像第二部分。 版权所有（C）2007，JPO＆INPIT

    Lithography equipment and device manufacturing method
    15.
    发明专利
    Lithography equipment and device manufacturing method 有权

    公开(公告)号：JP2004207735A

    公开(公告)日：2004-07-22

    申请号：JP2003424946

    申请日：2003-12-22

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： BOTMA HAKO

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70108 ,  G03F7/70158

    Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment capable of quickly converting the beam intensity distribution in the pupil plane surface and a device manufacturing method.
    SOLUTION: The device manufacturing method of the lithography equipment comprises the steps of: projecting a projection beam PB on a substrate W through a mask MA; controlling direction dependency of beam intensity in the substrate W by passing the beam through a series of optical elements 120
    a-b in front of the pupil plane surface 14; determining goniochromatic properties in the substrate W by the intensity distribution which is the function of location in the pupil plane surface; fixing the goniochromatic properties of the intensity of the beam PB by each optical element 120
    a-b which is preferable to be an array of a micronic lens (or more concretely, DOE: Diffractive Optical Element), respectively; arranging each optical element 120
    a-b in order to pass a major member of the beam PB without real deflection and a minor member having a deflection angle dependent intensity, respectively; and removing the major member of the beam which is cut after it has passed through the optical elements 120
    a-b . Consequently, efficacy over intensity in the pupil plane surface 14 is added.
    COPYRIGHT: (C)2004,JPO&NCIPI

    RADIATION SYSTEM
    16.
    发明申请
    RADIATION SYSTEM 审中-公开
    辐射系统

    公开(公告)号：WO2016139055A3

    公开(公告)日：2016-10-27

    申请号：PCT/EP2016053216

    申请日：2016-02-16

    Applicant: ASML NETHERLANDS BV

    Inventor： NIENHUYS HAN-KWANG ,  BOGAART ERIK WILLEM ,  DONKER RILPHO LUDOVICUS ,  KRUIZINGA BORGERT ,  LOOPSTRA ERIK ROELOF ,  BOTMA HAKO ,  DE VRIES GOSSE CHARLES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  BASELMANS JOHANNES JACOBUS MATHEUS

    IPC: G03F7/20 ,  G02B5/02

    CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

    Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Abstract translation: 一种辐射系统，包括分束装置，其被配置为接收主辐射束并将主辐射束分裂成多个分支辐射束，以及布置成接收输入辐射束并输出修改的辐射束的辐射改变装置，其中辐射 改变装置被配置为提供与所接收的输入辐射束相比具有增加的光密度的输出修改的辐射束，其中所述辐射改变装置被布置成使得由所述辐射改变装置接收的输入辐射束是主 辐射束和辐射改变装置被配置为向分束装置提供修改的主辐射束，或者其中辐射改变装置被布置成使得由辐射改变装置接收的输入辐射束是分支辐射束输出 从分束装置。

    LITHOGRAPHIC APPARATUS AND METHOD.
    17.
    发明专利
    LITHOGRAPHIC APPARATUS AND METHOD. 未知

    公开(公告)号：NL2005378A

    公开(公告)日：2011-06-21

    申请号：NL2005378

    申请日：2010-09-21

    Applicant: ASML NETHERLANDS BV

    Inventor： BOTMA HAKO ,  HOMBERG JOHANNES ALDEGONDA THEODORUS

    IPC: G03F7/20

    Abstract: A lithographic apparatus is provided with a sensor. The sensor comprises a frame that defines a space that is crossed multiple times by wire. Detection electronics are connected to the wire and configured to detect a change of temperature of the wire due to infrared radiation being incident upon the wire. The detection electronics are further configured to provide an output signal in the event that a change of temperature of the wire is detected.

    18.
    发明专利
    未知

    公开(公告)号：DE602004015713D1

    公开(公告)日：2008-09-25

    申请号：DE602004015713

    申请日：2004-12-21

    Applicant: ASML NETHERLANDS BV

    Inventor： LUIJKX CORNELIS PETRUS ANDREAS ,  BANINE VADIM YEVGENYEVICH ,  BOTMA HAKO ,  VAN DUIJNHOVEN MARTINUS

    IPC: G02B26/02 ,  G03F7/20

    Abstract: An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element (4). The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

    19.
    发明专利
    未知

    公开(公告)号：DE602005007409D1

    公开(公告)日：2008-07-24

    申请号：DE602005007409

    申请日：2005-03-24

    Applicant: ASML NETHERLANDS BV

    Inventor： MULDER HEINE MELLE ,  BOTMA HAKO

    IPC: G03F7/20 ,  G02B19/00 ,  H01L21/027

    Abstract: A lithographic projection apparatus includes an illumination system having a reflective integrator with a rectangular cross-section. An optical element is provided to redistribute an intensity distribution exiting the reflective integrator.

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