11.
    发明专利
    未知

    公开(公告)号:DE3905765A1

    公开(公告)日:1990-08-30

    申请号:DE3905765

    申请日:1989-02-24

    Applicant: BASF AG

    Abstract: Photosensitive recording element containing at least one photopolymerisable recording layer (B) composed of… b1) at least one partially or virtually completely hydrolysed poly(vinylalcohol alkane carboxylate) and/or at least one partially or virtually completely hydrolysed vinyl alcohol alkane carboxylate/alkylene oxide graft copolymer as binder,… b2) at least one photopolymerisation initiator,… b3) at least one photopolymerisable olefinically unsaturated compound (monomer) which is compatible with the binder (b1), and/or photopolymerizable olefinically unsaturated radicals which are linked laterally and/or terminally to the binder (b1), and… b4) at least two auxiliaries, the photopolymerizable recording layer (B) containing, as auxiliaries (b4), at least the sensitometric regulator (b4) composed of… b4.1) at least one compound from the class comprising the isoalloxazines and/or the class comprising the alloxazines, and also… b4.2) the potassium salt of N-nitrosocyclohexyl hydroxylamine, N-nitrosodiphenylamine and/or the monomethyl ether of hydroquinone in an amount of 0,01 to 6% by weight of the photopolymerizable recording layer (B), the (b4.1):(b4.2) weight ratio being 1:2 to 1:1000.

    Multiple use copying masks for prodn. of printing plates - comprising transparent support film bearing the image to be copied, covered with protective layer of transparent film-forming polymer contg. transparent matting agent

    公开(公告)号:DE4107378A1

    公开(公告)日:1992-09-10

    申请号:DE4107378

    申请日:1991-03-08

    Applicant: BASF AG

    Abstract: Masks consisting of (A) an optically transparent support film 10-500 micro-m thick, (B) an image mask layer 0.01-1 micro-m thick with optically transparent non-image regions and image regions of higher optical density obtd. by imagewise application of a 0.01 - 1 micro-m thick energy absorbing layer contg. a finely dispersed material of high optical density or an energy absorbing layer made of this, or by removing the non-image regions from this layer or by transferring the image regions to the support film (A), and (C) a 0.01 - 5 micro-m thick, non-tacky, optically transparent protective layer adhered strongly to the mask layer (B), consisting of a polymer which forms films with high tensile strength and 0.1-10 wt.% w.r.t. (C) of an optically transparent matting agent with a mean particle size of 0.1-10 micro-m. USE/ADVANTAGE - The copying masks can be used repeatedly in close contact with positive- or negative working photosensitive layers without deterioration of the mask by migration of low mol. components from the photosensitive material into the mask. This is an improvememnt over earlier systems in which a protective layer was applied over the photosensitive layer, which caused a redn. in resolution of the image during exposure. The masks are useful e.g. in the prodn. of printing plates, screen printing plates and photoresists e.g. for printed circuit

    15.
    发明专利
    未知

    公开(公告)号:DE3904780A1

    公开(公告)日:1990-08-23

    申请号:DE3904780

    申请日:1989-02-17

    Applicant: BASF AG

    Abstract: Process for the production of a relief printing plate whose photopolymerised relief layer has a nontacky surface by (1) exposing, through an image, a photopolymerisable relief-forming recording layer which contains at least one polymeric binder containing acid groups, (2) washing out (developing) the unexposed, and therefore unphotopolymerised regions of the relief-forming recording layer exposed through an image with a developer solvent, and (3) posttreatment of the resultant photopolymerised relief layer with a basic posttreatment solution.

    16.
    发明专利
    未知

    公开(公告)号:AT177764T

    公开(公告)日:1999-04-15

    申请号:AT95118128

    申请日:1995-11-17

    Applicant: BASF AG

    Abstract: In the prepn. of copolymers (I) of 94-99.5 mole-% C2H4 and 0.5-6 mole-% 3-6C alkenoic acid (II) by free radical high pressure polymerisation in a tubular reactor, the monomer mixt. is heated to a temp. not above 100 degrees C before adding the initiator and the max. polymerisation temp. does not exceed 260 degrees C. Also claimed are (I) per se; and adhesion promoters, fibres, films and mouldings contg. (I).

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