11.
    发明专利
    未知

    公开(公告)号:DE59304220D1

    公开(公告)日:1996-11-21

    申请号:DE59304220

    申请日:1993-12-02

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP93/03383 Sec. 371 Date Jun. 15, 1995 Sec. 102(e) Date Jun. 15, 1995 PCT Filed Dec. 2, 1993 PCT Pub. No. WO94/13862 PCT Pub. Date Jun. 23, 1994Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y sands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C. atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2, -PO(OH)(OR5), -PO(OR5)2, OPO(OH)2, -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(-) stands for s water solubility-promoting, n-valent inorganic or organic anion.

    12.
    发明专利
    未知

    公开(公告)号:AT144263T

    公开(公告)日:1996-11-15

    申请号:AT93906587

    申请日:1993-03-23

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP93/00695 Sec. 371 Date Sep. 30, 1994 Sec. 102(e) Date Sep. 30, 1994 PCT Filed Mar. 23, 1993 PCT Pub. No. WO93/20087 PCT Pub. Date Oct. 14, 1993.Nickelized shaped articles are produced by electrodeposition of nickel from aqueous acidic baths containing as essential constituents one or more nickel salts, one or more inorganic acids and one or more brighteners by a procedure in which the brighteners used are phosphonium salts I (I) where R1 to R3 are each C1-C18-alkyl, which may be carboxyl-, C1-C4-alkoxycarbonyl- or cyano-substituted, C2-C12-alkenyl, C2-C12-alkynyl, C5-C8-cycloalkyl, C7-C12-phenylalkyl, phenyl, which may be substituted by one or two substituents selected from the group consisting of C1-C4-alkyl, C1-C4-alkoxy, halogen, hydroxyl, phenyl and C1-C4-alkoxycarbonyl, or mono- or di(C1-C4-alkyl)amino, R4 and R5 are each hydrogen or C1-C4-alkyl, A is hydrogen or a group of the formula -CO-H, -CO-R6, -CO-OH, -CO-OR6, -CO-CH2-CO-OR6, -O-CO-H, -O-CO-R6, -OR6, -SO2-R6, -SO2-OH, -SO2-OR6, -PO(OH)2, -PO(OH)(OR6), -PO(OR6)2, -OPO(OH)2, -OPO(OH)(OR6) or -OPO(OR6)2, where R6 is C1-C12-alkyl, C2-C12-alkenyl, C2-C12-alkynyl, C5-C8-cycloalkyl, C7-C12-phenylalkyl or phenyl, which may be substituted by one or two substituents selected from the group consisting of C1-C4-alkyl, C1-C4-alkoxy, halogen, hydroxyl, phenyl and C1-C4-alkoxycarbonyl, Y is -CH=CH- or -C=C-, m is from 0 to 10, n is from 1 to 4, p is 0 or 1, q is from 0 to 10, and X(-) is an n-valent inorganic or organic anion that promotes solubility in water.

    13.
    发明专利
    未知

    公开(公告)号:DE59300569D1

    公开(公告)日:1995-10-12

    申请号:DE59300569

    申请日:1993-01-14

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP93/00063 Sec. 371 Date Jul. 25, 1994 Sec. 102(e) Date Jul. 25, 1994 PCT Filed Jan. 14, 1993 PCT Pub. No. WO93/15241 PCT Pub. Date Aug. 5, 1993.Nickelized shaped articles are produced by electrodeposition of nickel from aqueous acidic baths containing as essential constituents one or more nickel salts, one or more inorganic acids and at least two brighteners by using as brighteners a mixture of A) from 2 to 98% by weight of one or more cyclic N-allylammonium or N-vinylammonium compounds I (I) where the nitrogen atom is part of a pyridine, quinoline or isoquinoline ring system which may additionally carry one or two C1- to C4-alkyl substituents or halogen atoms, R1, R3 and R4 are each hydrogen or C1- to C4-alkyl, R2 is hydrogen or methyl, m is from 0 to 4, n is from 1 to 4, and X(-) is an n-valent inorganic or organic anion which promotes solubility in water, and B) from 98 to 2% by weight of one or more acetylenically unsaturated compounds II R4-C 3BOND C-R5(II) where R4 and R5 are identical or different and each is C1- to C4-alkyl substituted by hydroxyl, sulfo, amino, C1- to C4-alkylamino or di(C1- to C4-alkyl)amino, although hydroxyl groups may have been reacted with from 1 to 10 mol of a C2- to C4-alkylene oxide or a mixture of such alkylene oxides and one of the radicals R4 and R5 may also be hydrogen or C1- to C4-alkyl.

    PROCESS FOR PRODUCING NICKEL-PLATED MOULDINGS

    公开(公告)号:CA2128022A1

    公开(公告)日:1993-08-05

    申请号:CA2128022

    申请日:1993-01-14

    Applicant: BASF AG

    Abstract: Nickelized shaped articles are produced by electrodeposition of nickel from aqueous acidic baths containing as essential constituents one or more nickel salty, one or more inorganic acids and at least two brighteners by using as brightener a mixture of A) from 2 to 98% by weight of one or more cyclic N-allylammonium or N-vinylammonium compoundo I (I) where the nitrogen atom is part of a pyridine, quinoline or isoquinoline ring system which may additionally carry one or two C1- to C4-alkyl substituents or halogen atoms, R1, R3 and R4 are each hydrogen or C1- to C4-alkyl, R2 is hydrogen or methyl, m is from 0 to 4, n is from 1 to 4, and X? is an n-valent inorganic or organic anion which promotes solubility in water, and B) from 98 to 2% by weight of one or more acetyleni cally unsaturated compounds II R1 - C ? C - R5 (II) where R4 and R5 are identical or different and each is C1- to C4-alkyl substituted by hydroxyl, sulfo, amino, C1- to C4-alkylamino or di(C1- to C4-alkyl)-amino, although hydroxyl groups may have been reacted with from 1 to 10 mol of a C1- to C4-alkylene oxide or a mixture of such alkylene oxides and one of the radicals R4 and R5 may also be hydrogen or C1to C4-alkyl.

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