Abstract:
A method and apparatus for aligning a laser beam (216) coincident with a charged particle beam (350). The invention described provides a method for aligning the laser beam through the center of an objective lens (214) and ultimately targeting the eucentric point of a multi-beam system (300). The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber (360) of the charged particle system.
Abstract:
Apparatuses and methods for improved reconstructions of electron-based holograms are disclosed herein. An example method at least includes forming a hologram of a sample and a known object, forming a reconstruction of the known object using a reconstruction algorithm, comparing the reconstruction of the known object to a reference reconstruction of the known object, and adjusting the reconstruction algorithm based on the comparison of the reconstruction of the known object to the reference reconstruction of the known object. The example method may further include forming a reconstruction of the sample using the adjusted reconstruction algorithm.
Abstract:
An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photon yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable mirror.
Abstract:
A method and apparatus for aligning a laser beam (216) coincident with a charged particle beam (350). The invention described provides a method for aligning the laser beam through the center of an objective lens (214) and ultimately targeting the eucentric point of a multi-beam system (300). The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber (360) of the charged particle system.
Abstract:
A method of creating a layer of a target deposit-material, in a first target pattern, on a substrate surface. The substrate surface is placed in a vacuum and exposed to a first chemical vapor, having precursor molecules for a seed deposit-material, thereby forming a first substrate surface area that has adsorbed the precursor molecules. Then, a charged particle beam is applied to the first substrate surface area in a second target pattern, largely identical to the first target pattern thereby forming a seed layer in a third target pattern. The seed layer is exposed to a second chemical vapor, having target deposit-material precursor molecules, which are adsorbed onto the seed layer. Finally, a laser beam is applied to the seed layer and neighboring area, thereby forming a target deposit-material layer over and about the seed layer, where exposed to the laser beam.
Abstract:
An improved apparatus for laser processing that prevents material redeposition during laser ablation but allows material to be removed at a high rate. In a preferred embodiment, laser ablation is performed in a chamber (140, 501) filled with high pressure precursor (etchant) gas so that sample particles ejected during laser ablation will react with the precursor gas in the gas atmosphere of the sample chamber. When the ejected particles (108) collide with precursor gas particles (202), the precursor is dissociated, forming a reactive component that binds the ablated material. In turn, the reaction between the reactive dissociation by-product and the ablated material forms a new, volatile compound (204) that can be pumped away in a gaseous state rather than redepositing onto the sample (104).
Abstract:
A method of and an apparatus (300) to perform laser ablation in the vicinity of a charged particle beam (308) while simultaneously protecting the light optical components (316) of the apparatus (300) utilized to perform the ablation from being coated with debris resulting from the ablation process. A protective transparent screen (400) is used to shield the laser optical components(316). A preferred screen 400) could be replaced or repositioned without breaking vacuum in the sample chamber (340) and would not be particularly susceptible to undesirable charging effects.
Abstract:
Improved method of and system for substrate micromachining is described. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser.