11.
    发明专利
    未知

    公开(公告)号:FR2740224A1

    公开(公告)日:1997-04-25

    申请号:FR9612844

    申请日:1996-10-15

    Applicant: IBM

    Abstract: The invention relates to a contact probe arrangement for electrically connecting a test system with contact pads of a device to be tested. The contact probes are located in guide grooves. The guide grooves as well as areas are provided in a plane parallel to the surface of a guide plate and are covered by a protective plate. The contact probes may bend out laterally into the respective areas. This assures a very dense contact probe array. Contact probe arrays of this type may be used, for example, for detecting opens and shorts in integrated circuits or semiconductor chips. The invention overcomes the problem of adjusting for height differences in the contact pads caused by an uneven surface of the device to be tested.

    Contact probe arrangement
    15.
    发明专利

    公开(公告)号:GB2306804B

    公开(公告)日:1999-07-14

    申请号:GB9621500

    申请日:1996-10-16

    Applicant: IBM

    Abstract: The invention relates to a contact probe arrangement for electrically connecting a test system with contact pads of a device to be tested. The contact probes are located in guide grooves. The guide grooves as well as areas are provided in a plane parallel to the surface of a guide plate and are covered by a protective plate. The contact probes may bend out laterally into the respective areas. This assures a very dense contact probe array. Contact probe arrays of this type may be used, for example, for detecting opens and shorts in integrated circuits or semiconductor chips. The invention overcomes the problem of adjusting for height differences in the contact pads caused by an uneven surface of the device to be tested.

    Contact probe arrangement
    16.
    发明专利

    公开(公告)号:GB2306804A

    公开(公告)日:1997-05-07

    申请号:GB9621500

    申请日:1996-10-16

    Applicant: IBM

    Abstract: The invention relates to a contact probe arrangement for electrically connecting a test system with contact pads of a device to be tested. The contact probes are located in guide grooves. The guide grooves as well as areas are provided in a plane parallel to the surface of a guide plate and are covered by a protective plate. The contact probes may bend out laterally into the respective areas. This assures a very dense contact probe array. Contact probe arrays of this type may be used, for example, for detecting opens and shorts in integrated circuits or semiconductor chips. The invention overcomes the problem of adjusting for height differences in the contact pads caused by an uneven surface of the device to be tested.

    17.
    发明专利
    未知

    公开(公告)号:DE3683763D1

    公开(公告)日:1992-03-12

    申请号:DE3683763

    申请日:1986-03-27

    Abstract: Identically positioned alignment marks are formed on opposite sides of a semiconductor wafer by (i) coating both wafer sides with an insulating layer (2,3); (ii) directing high energy heavy ions onto the front side layer (2), the ions penetrating both layers (2,3) nuclear tracks (4, 4') to form single disturbed lattice nuclear tracks (4, 4') in the layers without disturbing the crystal latt-ice of the wafer; (iii) etching the nuclear tracks (4,4') to form identically positioned pores in the layers; and (iv) using the pores as alignment marks for further processing.

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