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公开(公告)号:DE112012004768T5
公开(公告)日:2014-11-06
申请号:DE112012004768
申请日:2012-08-29
Applicant: IBM
Inventor: DAUBENSPECK TIMOTHY H , GAMBINO JEFFREY P , MUZZY CHRISTOPHER D , QUESTAD DAVID L , SAUTER WOLFGANG , SULLIVAN TIMOTHY D
IPC: H01L23/48
Abstract: Ein topographisches Merkmal (305) ist in unmittelbarer Nähe zu einer leitfähigen Bond-Kontaktstelle (235) ausgebildet, die dazu verwendet wird, einen Lötkontakthügel (160) mit einem Halbleiter-Chip (140) zu verbinden. Das topographische Merkmal (305) ist durch einen Zwischenraum (310) von der leitfähigen Bond-Kontaktstelle (235) getrennt. Bei einer Ausführungsform ist das topographische Merkmal (305) an einer Stelle ausgebildet, die sich etwas jenseits der äußeren Begrenzung des Lötkontakthügels (160) befindet, wobei eine Kante des Kontakthügels (160) vertikal so ausgerichtet ist, dass sie mit dem Zwischenraum (310) zusammenfällt, der die leitfähige Bond-Kontaktstelle (235) von dem topographischen Merkmal (305) trennt. Das topographische Merkmal (305) stellt eine Erhöhung der Dicke einer nichtleitfähigen Schicht (240), die über dem Halbleiter-Chip (140) und der leitfähigen Bond-Kontaktstelle (235) angeordnet ist, und eine Verspannungspufferung bereit.
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公开(公告)号:DE602007012367D1
公开(公告)日:2011-03-17
申请号:DE602007012367
申请日:2007-10-31
Applicant: IBM
Inventor: DAUBENSPECK TIMOTHY HARRISON , SAUTER WOLFGANG , GAMBINO JEFFREY PETER , MUZZY CHRISTOPHER DAVID
IPC: B23K1/20 , B23K20/24 , H01L25/065
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公开(公告)号:AT497419T
公开(公告)日:2011-02-15
申请号:AT07822113
申请日:2007-10-31
Applicant: IBM
Inventor: DAUBENSPECK TIMOTHY HARRISON , SAUTER WOLFGANG , GAMBINO JEFFREY PETER , MUZZY CHRISTOPHER DAVID
IPC: B23K1/20 , B23K20/24 , H01L25/065
Abstract: Methods of forming wire and solder bond structures are disclosed. In one embodiment, a method includes providing a structure including a wire bond metal region for the wire bond and a solder bond metal region for the solder bond; forming a protective layer over the wire bond metal region only; forming a silicon nitride layer over a silicon oxide layer over the wire bond metal region and the solder bond metal region; forming the solder bond to the solder bond metal region while maintaining the wire bond metal region covered; exposing the wire bond metal region including removing the protective layer; and forming the wire bond to the wire bond metal region. Wire bond and solder bond structures can be made accessible on a single multi-part wafer (MPW) wafer or on a single chip, if necessary.
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公开(公告)号:AT477588T
公开(公告)日:2010-08-15
申请号:AT05808156
申请日:2005-11-16
Applicant: IBM
Inventor: BURRELL LLOYD , CHEN HOWARD , HSU LOUIS , SAUTER WOLFGANG
IPC: H01L21/48 , H01L23/14 , H01L23/538
Abstract: Economical methods for forming a co-planar multi-chip wafer-level packages are proposed. Partial wafer bonding and partial wafer dicing techniques are used to create chips as well as pockets. The finished chips are then mounted in the corresponding pockets of a carrier substrate, and global interconnects among the chips are formed on the top planar surface of the finished chips. The proposed methods facilitate the integration of chips fabricated with different process steps and materials. There is no need to use a planarization process such as chemical-mechanical polish to planarize the top surfaces of the chips. Since the chips are precisely aligned to each other and all the chips are mounted facing up, the module is ready for global wiring, which eliminates the need to flip the chips from an upside-down position.
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公开(公告)号:AT549741T
公开(公告)日:2012-03-15
申请号:AT04723639
申请日:2004-03-26
Applicant: IBM
Inventor: ANGELL DAVID , BEAULIEU FREDERIC , HISADA TAKASHI , KELLY ADREANNE , MCKNIGHT SAMUEL , MIYAI HIROMITSU , PETRARCA KEVIN , SAUTER WOLFGANG , VOLANT RICHARD , WEINSTEIN CAITLIN
IPC: H01L21/60 , H01L23/485
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公开(公告)号:DE602005022919D1
公开(公告)日:2010-09-23
申请号:DE602005022919
申请日:2005-11-16
Applicant: IBM
Inventor: BURRELL LLOYD , CHEN HOWARD HAO , HSU LOUIS , SAUTER WOLFGANG
IPC: H01L21/52 , H01L23/14 , H01L23/538
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公开(公告)号:AT490552T
公开(公告)日:2010-12-15
申请号:AT07822110
申请日:2007-10-31
Applicant: IBM
Inventor: DAUBENSPECK TIMOTHY HARRISON , MUZZY CHRISTOPHER DAVID , GAMBINO JEFFREY PETER , SAUTER WOLFGANG
IPC: H01L23/31 , H01L23/485
Abstract: Methods of forming wire and solder bonds are disclosed. In one embodiment, a method includes providing a structure including a wire bond metal region for the wire bond and a solder bond metal region for the solder bond, both regions covered by a silicon nitride layer over a silicon oxide layer; forming in a material a first opening to the silicon oxide layer over the wire bond metal region and a second opening exposing the solder bond metal region; forming the solder bond to the solder bond metal region while the wire bond metal region is covered; exposing the wire bond metal region including removing the silicon oxide layer to the wire bond metal region; and forming the wire bond to the wire bond metal region. Wire bonds and solder bonds can be made accessible on a single multi-part wafer (MPW) or on a single chip, if necessary, and can be formed substantially simultaneously.
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