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    MATERIALS AND PROCESSES FOR PROVIDING FUEL CELLS AND ACTIVE MEMBRANES
    12.
    发明申请
    MATERIALS AND PROCESSES FOR PROVIDING FUEL CELLS AND ACTIVE MEMBRANES 审中-公开
    提供燃料电池和活性膜的材料和方法

    公开(公告)号：WO0072391A9

    公开(公告)日：2002-04-04

    申请号：PCT/US0013982

    申请日：2000-05-22

    Applicant: MICROCOATING TECHNOLOGIES INC ,  HUNT ANDREW T

    Inventor： HUNT ANDREW T

    IPC: H01M4/88 ,  H01M4/90 ,  H01M4/96 ,  H01M8/02 ,  H01M8/10

    CPC classification number: H01M4/8867 ,  H01M4/8807 ,  H01M4/881 ,  H01M8/1004 ,  H01M2300/0082 ,  Y02P70/56

    Abstract: The materials and processes for forming fuel cell electrodes can include substrates of codeposited materials including an electrically conductive material, such as graphite, a polymer film, such as a proton-exchange membrane, and a catalytic material, such as platinum. The material may be applied to a polymer film by combustion chemical vapor deposition (CCVD) to produce a layered membrane, or the polymer may be deposited simultaneously with the catalytic coating to produce a membrane wherein the layers are intermingled. Proton exchange membranes prepared by this method are useful in the manufacture of fuel cells.

    Abstract translation: 用于形成燃料电池电极的材料和工艺可以包括包括诸如石墨的导电材料，诸如质子交换膜的聚合物膜和诸如铂的催化材料的共沉积材料的衬底。 可以通过燃烧化学气相沉积（CCVD）将材料施加到聚合物膜上以产生层状膜，或者聚合物可以与催化涂层同时沉积以产生其中层彼此混合的膜。 通过该方法制备的质子交换膜可用于制造燃料电池。

    MATERIALS AND PROCESSES FOR PROVIDING FUEL CELLS AND ACTIVE MEMBRANES
    13.
    发明申请
    MATERIALS AND PROCESSES FOR PROVIDING FUEL CELLS AND ACTIVE MEMBRANES 审中-公开
    提供燃料电池和活性膜的材料和方法

    公开(公告)号：WO0072391A2

    公开(公告)日：2000-11-30

    申请号：PCT/US0013982

    申请日：2000-05-22

    Applicant: MICROCOATING TECHNOLOGIES INC ,  HUNT ANDREW T

    Inventor： HUNT ANDREW T

    IPC: H01M4/88 ,  H01M4/90 ,  H01M4/96 ,  H01M8/02 ,  H01M8/10 ,  H01M4/00

    CPC classification number: H01M4/8867 ,  H01M4/8807 ,  H01M4/881 ,  H01M8/1004 ,  H01M2300/0082 ,  Y02P70/56

    Abstract: The materials and processes for forming fuel cell electrodes can include substrates of codeposited materials including an electrically conductive material, such as graphite, a polymer film, such as a proton-exchange membrane, and a catalytic material, such as platinum. The material may be applied to a polymer film by combustion chemical vapor deposition (CCVD) to produce a layered membrane, or the polymer may be deposited simultaneously with the catalytic coating to produce a membrane wherein the layers are intermingled. Proton exchange membranes prepared by this method are useful in the manufacture of fuel cells.

    Abstract translation: 用于形成燃料电池电极的材料和工艺可以包括包括诸如石墨的导电材料，诸如质子交换膜的聚合物膜和诸如铂的催化材料的共沉积材料的衬底。 可以通过燃烧化学气相沉积（CCVD）将材料施加到聚合物膜上以产生层状膜，或者聚合物可以与催化涂层同时沉积以产生其中层彼此混合的膜。 通过该方法制备的质子交换膜可用于制造燃料电池。

    EPITAXIAL THIN FILMS
    14.
    发明专利
    EPITAXIAL THIN FILMS 未知

    公开(公告)号：CA2359710C

    公开(公告)日：2008-09-02

    申请号：CA2359710

    申请日：2000-01-12

    Applicant: MICROCOATING TECHNOLOGIES INC

    Inventor： HWANG TZYY-JIUAN JAN ,  DESHPANDE GIRISH ,  HUNT ANDREW T ,  COUSINS DONALD H ,  LIN WEN-YI ,  SHOUP SHARA S

    IPC: C30B29/22 ,  H01L49/02 ,  B01D71/02 ,  C30B29/32 ,  H01B20060101 ,  H01B1/00 ,  H01G4/06 ,  H01G4/33 ,  H01L21/20 ,  H01L39/24 ,  H01M8/02 ,  H01M8/10

    Abstract: Epitaxial thin films for use as buffer layers for high temperature superconductors, electrolytes in solid oxide fuel cells (SOFC), gas separation membranes or dielectric material in electronic devices, are disclosed. By using CCVD, CACVD or any other suitable deposition process, epitaxial films having pore-free, ideal grain boundaries, and dense structure can be formed. Several different types of materials are disclosed for use as buffer layers in high temperature superconductors. In addition, the use of epitaxial thin films for electrolytes and electrode formation in SOFCs results in densification for pore-free and ideal grain boundary/interface microstructure. Gas separation membranes for the production of oxygen and hydrogen are also disclosed. These semipermeable membranes are formed by high-quality, dense, gas-tight, pinhole free sub-micro scale layers of mixed-conducting oxides on porous ceramic substrates. Epitaxial thin films as dielectric material in capacitors are also taught herein. Capacitors are utilized according to their capacitance values which are dependent on their physical structure and dielectric permittivity. The epitaxial thin films of the current invention form low-loss dielectric layers with extremely high permittivity. This high permittivity allows for the formation of capacitors that can have their capacitance adjusted by applying a DC bias between their electrodes.

    Chemical vapor deposition devices and methods
    20.
    发明专利
    Chemical vapor deposition devices and methods 未知

    公开(公告)号：AU2002249829A1

    公开(公告)日：2002-08-12

    申请号：AU2002249829

    申请日：2001-12-27

    Applicant: MICROCOATING TECHNOLOGIES INC

    Inventor： TOMOV TRIFON ,  LUTEN HENRY A III ,  OLJACA MIODRAG ,  NEUMULLER TRAVIS ,  DANIELSON DOUG ,  WITBROD FRANK ,  NEUMAN GEORGE A ,  HUNT ANDREW T ,  FORTUNATO FRED

    IPC: C23C16/44 ,  C23C16/453 ,  C23C16/455 ,  B05B1/24

    Abstract: Apparatus is described for rapidly coating a large area, or for rapidly producing a powder. In one embodiment, a liquid having a coating chemical is pumped from a liquid reservoir to a distribution manifold. From the distribution manifold, the liquid is carried under pressure to a geometric array, e.g., linear, of atomization nozzles. Flow equalization means are provided for equalizing the flow of the liquid delivered to each nozzle, and, preferably, means are provided for equalizing the temperature of the liquid delivered to each nozzle. The liquid, upon exiting the nozzles with the attendant pressure drop atomizes. The atomized liquid coats a substrate either in non-reacted or reacted form, or forms a powder. In a preferred embodiment, a solution of precursor chemical is reacted in a geometric array of flames produced at the nozzles, and a coating material produced in the flame coats the substrate, or a powder is formed. In another embodiment, vaporized precursor and vaporized are fed to a burner chamber having a linear exit slit. The vapor exiting the slit is burned, and material produced in a flame reaction are deposited on a substrate, or the powder formed is collected.

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