STRUCTURE DE MEMOIRE COMPORTANT UN ELEMENT RESISTIF PROGRAMMABLE ET SON PROCEDE DE FABRICATION.

    公开(公告)号:FR2930371A1

    公开(公告)日:2009-10-23

    申请号:FR0802106

    申请日:2008-04-16

    Abstract: Une structure mémoire comportant un transistor d'accès (TR) connecté en série avec un élément résistif programmable (EM), caractérisé en ce que ledit élément résistif programmable comporte sur un substrat semi-conducteur (110) ; une couche isolante (170) disposant d'un évidement comportant :- une première couche (140) tapissant les surfaces latérales et le fond dudit évidemment et imperméable à la diffusion de métal ;- une seconde couche (150) composé d'un matériau poreux sur ladite première couche ; :- une troisième couche (160) de matériau métallique permettant de réaliser une électrode de contact susceptible de diffusion au sein dudit matériau poreux constitué de la seconde couche.La diffusion des ions métalliques au sein de ladite seconde couche étant commandée par l'action conjointe d'un champ électrique et de la température.Un procédé de fabrication est également décrit.

    15.
    发明专利
    未知

    公开(公告)号:FR2828763B1

    公开(公告)日:2004-01-16

    申请号:FR0110867

    申请日:2001-08-16

    Abstract: Integrated circuit with dram memory cell Integrated circuit comprising a substrate (1), at least one capacitor (9) placed above the substrate (1) and provided with a first electrode (5), with a second electrode (8) and with a dielectric (7) placed between the two electrodes, at least one via for connection between the substrate (1) and a conductor level lying above the capacitor (9), and a dielectric covering the substrate (1) and surrounding both the capacitor (9) and the via (6). The via comprises a first portion (18) lying between the substrate and the lower level of the first electrode, a second portion (6) lying between the lower level of the first electrode and the upper level of the first electrode, and a third portion (12) in contact with the first portion and flush with the said conductor level, the second portion being made from the same material as the first electrode of the capacitor.

    17.
    发明专利
    未知

    公开(公告)号:FR2828766A1

    公开(公告)日:2003-02-21

    申请号:FR0110866

    申请日:2001-08-16

    Abstract: There is provided an integrated circuit having active components including junctions formed in a monocrystalline substrate doped locally, and at least one passive component situated above the active components. The integrated circuit includes a first insulating layer separating the active components and abase of the passive component, and a metal terminal for electrically connecting the passive component with at least one of the active components. The metal terminal is formed in the thickness of the first insulating layer and has a contact surface that projects from the limits of a junction of the one active component. In a preferred embodiment, the passive component is a capacitor. Also provided is a method of fabricating an integrated circuit that includes MOS transistors and an onboard memory plane of DRAM cells in a matrix.

    18.
    发明专利
    未知

    公开(公告)号:FR2828763A1

    公开(公告)日:2003-02-21

    申请号:FR0110867

    申请日:2001-08-16

    Abstract: The invention concerns an integrated circuit comprising a substrate (1), at least a capacitor (9) arranged above the substrate (1) and provided with a first electrode (5), a second electrode (8), and a dielectric (7) arranged between the two electrodes, at least a connecting feedthrough between the substrate (1) and a conductive level located above the capacitor (9), and a dielectric material covering the substrate (1) and enclosing the capacitor (9) and the feedthrough. The feedthrough comprises a first portion (18) arranged between the substrate and the lower level of the first electrode, a second portion (6) arranged between the lower level of the first electrode and the upper level of the first electrode, and a third portion (12) in contact with the first electrode and flush with said conductive level, the second portion being made of the same material as the first electrode of the capacitor.

    20.
    发明专利
    未知

    公开(公告)号:FR2830365B1

    公开(公告)日:2004-12-24

    申请号:FR0112519

    申请日:2001-09-28

    Abstract: A DRAM formed of an array of cells, each of which includes a capacitive memory point and a control transistor. The array is formed of the repetition of an elementary pattern extending over three rows and three columns and including six cells arranged so that each of the three rows and each of the three columns of the elementary pattern includes two cells, wherein each column of the elementary pattern includes a first and a second bit line, each first and second bit line being connected to one half of the memory cells included by the column.

Patent Agency Ranking