Abstract:
A microelectromechanical system (MEMS) assembly includes at least one emission source; a top wafer having a plurality of side walls and a generally horizontal portion, the horizontal portion having a thickness between a first side and a directly opposed second side, at least one window in the horizontal portion extending between the first and second sides and a transmission membrane across the at least one window; and a bottom wafer having a first portion with a first substantially planar surface, an intermediate surface directly opposed to the first substantially planar surface, a second portion with a second substantially planar surface, the at least one emission source provided on the second substantially planar surface; where the top wafer bonds to the bottom wafer at the intermediate surface and encloses a cavity within the top wafer and the bottom wafer.
Abstract:
Cette invention concerne un canon à électrons à émission de champ comportant une pointe d'émission d'électrons, une anode extractrice, ainsi que des moyens permettant de créer une différence de potentiel électrique entre la pointe d'émission et l'anode extractrice. La pointe d'émission comporte une pointe métallique et un cône d'extrémité obtenu par dépôt chimique en phase vapeur sur un nanofilament, le cône étant aligné et soudé sur la pointe métallique. Application à un microscope électronique en transmission.
Abstract:
The invention relates in general terms to the field of "cold cathode" electronic cathodes including an electrically conductive flat substrate (2) and an emitter comprising a tip (1) with a micrometric or nanometric diameter arranged vertically above the surface of the substrate. The cathode according to the invention comprises a single annular electrode (6) electrically insulated from the substrate by an insulating layer (3) and centred on the emitter, the source comprising a means for applying a potential difference of several dozen volts between the substrate and the annular electrode, enough to cause the emission of an electronic beam from the tip of the emitter, the annular electrode being large enough to focus said electronic beam. A source of an electronic beam can comprise a plurality of identical cathodes arranged in a specific pattern.
Abstract:
Le domaine général de l'invention est celui des cathodes électroniques de type « cathode froide » comprenant un substrat plan (2) électriquement conducteur et un émetteur comportant une pointe (1) de diamètre micrométrique ou nanométrique disposée verticalement au-dessus de la surface du substrat. La cathode selon l'invention comporte une et une seule électrode annulaire (6) isolée électriquement du substrat par une couche d'isolant (3) et centrée sur l'émetteur, la source comportant des moyens permettant d'appliquer une différence de potentiel de plusieurs dizaines de volts entre le substrat et l'électrode annulaire, suffisante pour provoquer l'émission d'un faisceau électronique à la pointe de l'émetteur, l'électrode annulaire étant de dimension suffisante pour assurer la focalisation dudit faisceau électronique. Une source de faisceau électronique peur comporter une pluralité de cathodes identiques agencées selon un motif particulier.
Abstract:
Methods of producing microrods for electron emitters and associated microrods and electron emitters. In one example, a method of producing a microrod for an electron emitter comprises providing a bulk crystal ingot, removing a first plate from the bulk crystal ingot, reducing a thickness of the first plate to produce a second plate, and milling the second plate to produce one or more microrods. In another example, a microrod for an electron emitter comprises a microrod tip region that comprises a nanoneedle that in turn comprises a nanorod and a nanoprotrusion tip. The microrod and the nanoneedle are integrally formed from a bulk crystal ingot by sequentially: (i) removing the microrod from the bulk crystal ingot; (ii) coarse processing the microrod tip region to produce the nanorod; and (iii) fine processing the nanorod to produce the nanoprotrusion tip.
Abstract:
There is provided an iridium tip including a pyramid structure having one {100} crystal plane as one of a plurality of pyramid surfaces in a sharpened apex portion of a single crystal with orientation. The iridium tip is applied to a gas field ion source or an electron source. The gas field ion source and/or the electron source is applied to a focused ion beam apparatus, an electron microscope, an electron beam applied analysis apparatus, an ion-electron multi-beam apparatus, a scanning probe microscope or a mask repair apparatus.
Abstract:
A field emission electron source includes a CNT needle and a conductive base. The CNT needle has an end portion and a broken end portion; the end portion is contacted with and electrically connected to a surface of the conductive base. The CNTs at the broken end portion form a taper-shape structure, wherein one CNT protrudes and is higher than the adjacent CNTs.
Abstract:
A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core.
Abstract:
A field-emission type electron source includes (i) a single-crystal tungsten rod having a sharpened terminus and (ii) a mass of ZrO formed only on a portion of the surface, or the entire surface, of the sharpened terminus. In preferred design, the single-crystal tungsten rod is placed in a gaseous medium that consists of oxygen and a non-oxygen gas. The molar ratio between oxygen and the non-oxygen gas is greater than 1:1.
Abstract:
The present disclosure provides a method for manufacturing a particle source, comprising: placing a metal wire in vacuum, introducing active gas and catalyst gas, adjusting a temperature of the metal wire, and applying a positive high voltage V to the metal wire to dissociate the active gas at the surface of the metal wire, in order to generate at a peripheral surface of the head of the metal wire an etching zone in which field induced chemical etching (FICE) is performed; increasing by the FICE a surface electric field at the top of the metal wire head to be greater than the to evaporation field of the material for the metal wire, so that metal atoms at the wire apex are evaporated off; after the field evaporation is activated by the FICE, causing mutual adjustment between the FICE and the field evaporation, until the head of the metal wire has a shape of combination of a base and a tip on the base; and stopping the FICE and the field evaporation when the head of the metal wire takes a predetermine shape.