Abstract:
A trench (5) is formed in a semiconductor body (2); the side walls and the bottom of the trench are covered with a first dielectric material layer (9); the trench (5) is filled with a second dielectric material layer (10); the first and the second dielectric material layers (9, 10) are etched via a partial, simultaneous and controlled etching such that the dielectric materials have similar etching rates; a gate-oxide layer (13) having a thickness smaller than the first dielectric material layer (9) is deposited on the walls of the trench (5); a gate region (14) of conductive material is formed within the trench (5); and body regions (7) and source regions (8) are formed within the semiconductor body (2), at the sides of and insulated from the gate region (14). Thereby, the gate region (14) extends only on top of the remaining portions of the first and second dielectric material layers (9, 10).
Abstract:
A method of forming an MIS (metal-insulator-semiconductor) structure, the method comprising: forming a first semiconductor electrode in a cavity formed in a crystalline semiconductor region by depositing a first silicon containing layer provided with an increased oxidation rate relatively to an exposed surface of said crystalline semiconductor region in said cavity and depositing a second silicon containing layer above said silicon containing layer with a different oxidation rate relatively to said silicon containing layer, said first semiconductor electrode being electrically insulated from said crystalline semiconductor region by an insulating layer, concurrently oxidizing said exposed surface of said crystalline semiconductor region in said cavity and an exposed surface of said first semiconductor electrode so as to form a first oxide layer on said exposed surface of said first semiconductor electrode and a second oxide layer on said exposed surface of said crystalline semiconductor region and forming a second semiconductor electrode in said cavity and above said first semiconductor electrode, said second semiconductor electrode being electrically isolated from said first semiconductor electrode by said first oxide layer.
Abstract:
An arrangement comprising a node having a node input configured to receive a plurality of transactions intended for a plurality of different targets, said node having a plurality of node outputs; at least one target, said at least one target comprising an input configured to receive a respective output of said node; an output, wherein said node is configured to direct said transactions to one of said at least one target and said output depending on if said transactions are intended for said at least one target or at least one different target.
Abstract:
Operation of a memory with a plurality of locations (101, 102, 103), such as a FIFO buffer memory envisages: - writing the data (D1, D2) at input to the memory in a single write location (101); and - making the single write location (101) available for writing an input datum (D1, D2) with a shift of the datum written in the single write location (101) to another location (102) of the memory. At each operation of writing of an input datum (D1, D2) in the single write location (101), there is scheduled shifting of the datum written therein to another location (102), without waiting for a new write request, thus eliminating the combinational constraint between the two operations.
Abstract:
A self consistent monitoring device comprises a core cell wirelessly RF identifiable and excitable comprising a tag antenna adapted to exchange data with a data acquisition reader device via electromagnetic or magnetic coupling of the tag antenna with an antenna of the reader device, a monolithically integrated circuit including al least a resonance capacitor, a modulator, a rectifier circuit, a charge-pump circuit, a detection circuit, logic and/or analog signal processing circuit, and at least a one tier corolla of identical or different sensor cells around said core cell, covering an area of a monitored structure or body onto which the multi-cellular monitoring device is applied that is a multiple of the individual surface area of a single sensor cell, all sensor cells adapted to convert a change of a geometrical, physical, or chemical parameter or state at the cell location, parameter change and location being detected by the detection circuit of the core cell, upon excitation by said reader device. Generally, the self consistent monitoring device constitutes a unitary module that is replicated innumerable times over a flexible supporting cloth or plastic film, forming a bi-dimensional tablecloth array of identical or different monitoring devices each covering a certain surface area of a monitored structure or body.
Abstract:
A semiconductor electronic device (1) is disclosed, which comprises a die (2) of semiconductor material and a support (3), the die (2) of semiconductor material including an integrated electronic circuit and a plurality of contact pads (6) associated with the electronic circuit and connected electrically to the support (3) by wire leads (4), each contact pad of said plurality of contact pads (6) comprising a lower layer (7) of copper, or alloys thereof; and an upper layer. Advantageously, the upper layer consists of: a first film (9) of nickel or alloys thereof, overlying the lower layer (7) of copper or alloys thereof; and a second film (10) of gold or alloys thereof, overlying the first film (9) of nickel or alloys thereof. Moreover, the layer (7) or film (9, 10) are deposited by an electroless chemical process.