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公开(公告)号：WO2020120082A1
公开(公告)日：2020-06-18
申请号：PCT/EP2019/081836
申请日：2019-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： CRAMER, Hugo, Augustinus, Joseph , BOS, Hilko, Dirk , KOOP, Erik, Johan , KOOLEN, Armand, Eugene, Albert , NIENHUYS, Han-Kwang , POLO, Alessandro , LIAN, Jin , DEN BOEF, Arie, Jeffrey
Abstract: The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.
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公开(公告)号：WO2019042809A1
公开(公告)日：2019-03-07
申请号：PCT/EP2018/072432
申请日：2018-08-20
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DER POST, Sietse, Thijmen , BÄUMER, Stefan, Michael, Bruno , VAN VOORST, Peter, Danny , TUKKER, Teunis, Willem , ZIJP, Ferry , NIENHUYS, Han-Kwang , VAN DEN EERENBEEMD, Jacobus, Maria, Antonius
Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration- correcting reflector.
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公开(公告)号：WO2017076695A1
公开(公告)日：2017-05-11
申请号：PCT/EP2016/075672
申请日：2016-10-25
Applicant: ASML NETHERLANDS B.V.
Inventor： LOOPSTRA, Erik, Roelof , NIENHUYS, Han-Kwang
CPC classification number: G03F7/70075 , G02B5/09 , G03F7/70116
Abstract: An optical system arranged to receive a radiation beam (Ba). The optical system comprising a reflective element (101) comprising a plurality of reflective regions (105), wherein different reflective regions (105a, 105b) are configured to reflect incident radiation in different directions, and wherein the reflective regions are configured such that at a given position of the reflective element the radiation beam is only incident on a subset of the reflective regions and an actuator (103) configured to move the reflective element, relative to the radiation beam, thereby changing the one or more reflective regions on which the radiation beam is incident.
Abstract translation: 光学系统布置成接收辐射束（Ba）。 所述光学系统包括具有多个反射区域（105）的反射元件（101），其中不同的反射区域（105a，105b）被配置为在不同的方向上反射入射辐射，并且其中所述反射区域被配置为使得在 辐射束的给定位置仅入射在反射区域的子集上，以及致动器（103），其被配置为相对于辐射束移动反射元件，从而改变其上放射辐射的一个或多个反射区域 梁入射。
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公开(公告)号：WO2016128152A1
公开(公告)日：2016-08-18
申请号：PCT/EP2016/050242
申请日：2016-01-08
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G01T1/185 , G03F7/70558 , G03F7/7085 , G03F7/70933
Abstract: A radiation sensor comprising a chamber (110) for containing a gas, the chamber having a first opening (108a) and a second opening (108b) such that a radiation beam can enter the chamber through the first opening, propagate through the chamber and exit the chamber through the second opening, a gas supply mechanism (112, 114, 116, 118) configured to supply hydrogen or helium into the chamber, a first electrode (121) situated in the chamber, a second electrode (122) situated in the chamber, a voltage source (141) configured to maintain a potential difference between the first electrode and the second electrode, an electrical sensor (143a, 145a, 143b, 145b) configured to measure an electrical current flowing through at least one of the first electrode and the second electrode, the electrical current resulting from ionization of the hydrogen or helium in the chamber caused by a radiation beam propagating through the chamber and a processor operable to determine, from the measured electrical current, at least one of a power and a position of a radiation beam propagating through the chamber.
Abstract translation: 一种辐射传感器，包括用于容纳气体的室（110），所述室具有第一开口（108a）和第二开口（108b），使得辐射束可以通过第一开口进入室，传播通过室并且离开 所述室通过所述第二开口，被配置为将氢或氦供应到所述室中的气体供应机构（112,114,116,118），位于所述室中的第一电极（121），位于所述室中的第二电极（122） 被配置为保持第一电极和第二电极之间的电位差的电压源（141）;电传感器（143a，145a，143b，145b），被配置为测量流过第一电极和第二电极中的至少一个的电流 和所述第二电极，由通过所述室传播的辐射束引起的所述室中的氢或氦离子化所产生的电流以及可操作以从所测量的电气 电流，辐射束的功率和位置中的至少一个传播通过腔室。
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25.发明申请
公开(公告)号：WO2014095266A2
公开(公告)日：2014-06-26
申请号：PCT/EP2013/074742
申请日：2013-11-26
Applicant: ASML NETHERLANDS B.V.
Inventor： ARLEMARK, Erik , KOEVOETS, Adrianus , LAFARRE, Raymond , TEN KATE, Nicolaas , LUIJTEN, Carlo , NIENHUYS, Han-Kwang
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70908
Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate. The substrate support comprises a substrate table constructed to hold a substrate, a support block for supporting the substrate table, and a cover plate disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.
Abstract translation: 公开了一种用于将EUV辐射束投射到基板的目标部分上的装置的基板支撑件。 衬底支撑件包括构造成保持衬底的衬底台，用于支撑衬底台的支撑块和设置在衬底台周围的盖板。 盖板的顶表面和安装在基板上的基板的顶表面基本上处于相同的水平。 至少一个传感器单元位于基板支撑件上，其顶表面也处于与盖板和基板相同的高度。 还公开了包括这种基板支撑件的EUV光刻设备。
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Patent Agency Ranking
公开(公告)号：WO2019057409A1
公开(公告)日：2019-03-28
申请号：PCT/EP2018/072211
申请日：2018-08-16
Applicant: ASML NETHERLANDS B.V.
Inventor： DONKER, Rilpho, Ludovicus , NIENHUYS, Han-Kwang
IPC: H05G2/00
Abstract: A radiation source comprises: an emitter for emitting a fuel target towards a plasma formation region; a laser system for hitting the target with a laser beam to generating a plasma; a collector for collecting radiation emitted by the plasma; an imaging system configured to capture an image of the target; one or more markers at the collector and within a field of view of the imaging system; and a controller. The controller receives data representative of the image; and controls operation of the radiation source in dependence on the data.
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公开(公告)号：WO2019020450A1
公开(公告)日：2019-01-31
申请号：PCT/EP2018/069476
申请日：2018-07-18
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： HUANG, Yang-Shan , BOONEN, Marcel, Joseph, Louis , NIENHUYS, Han-Kwang , BRINKERT, Jacob , BRULS, Richard, Joseph , KOCHERSPERGER, Peter, Conrad
IPC: G03F7/20
Abstract: A lithographic apparatus can include an illumination system (IL) that conditions a radiation beam (B), a first stationary plate (412) having a first surface (426), and a reticle stage defining, along with the first stationary plate, a first chamber (404). The reticle stage supports a reticle (402) in the first chamber, and the reticle stage includes a first surface (424) spaced apart from a second surface of the first stationary plate, thereby defining a first gap (414) configured to suppress the amount of contamination passing from a second chamber (406) to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system (PS) configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.
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28.发明申请
公开(公告)号：WO2017153085A1
公开(公告)日：2017-09-14
申请号：PCT/EP2017/051603
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： NIENHUYS, Han-Kwang , NAKIBOGLU, Günes , PETIT, Rita, Marguerite, Albin, Lambertine , PEN, Hermen, Folken , VAN DE MOESDIJK, Remco, Yuri , VAN BOXTEL, Frank, Johannes, Jacobus , KRUIZINGA, Borgert
Abstract: A measurement system to determine a deformation of an object having a front surface and a back surface and being provided with a pattern is described, the measurement system comprising: ∙ a processor and ∙ an interferometer system comprising a light source and a detector system; the light source being configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively; the detector system being configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor; the processor being configured to: ∙ receive the signals; ∙ determine, based on the signals as received, a characteristic of the object; and ∙ determine a deformation of the pattern based on the characteristic.
Abstract translation: 描述了一种用于确定具有前表面和后表面并且设置有图案的物体的变形的测量系统，所述测量系统包括：处理器和干涉仪系统，所述干涉仪系统包括 光源和检测器系统; 所述光源被配置为向所述物体上的多个位置中的每一个发射测量光束，以便在所述相应的多个位置中的每一个处分别产生从所述物体的前表面和后表面离开的反射测量光束; 所述检测器系统被配置为接收相应的反射测量光束并将代表所接收的反射测量光束的信号输出到所述处理器; 该处理器被配置为：·接收信号; ∙根据收到的信号确定物体的特性; 并根据特性确定图案的变形。
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公开(公告)号：WO2016139022A1
公开(公告)日：2016-09-09
申请号：PCT/EP2016/052102
申请日：2016-02-02
Applicant: ASML NETHERLANDS B.V.
Inventor： BANINE, Vadim, Yevgenyevich , BRUSSAARD, Gerrit, Jacobus, Hendrik , KOPPERT, Willem, Jakobus, Cornelis , LUITEN, Otger, Jan , NIENHUYS, Han-Kwang , BECKERS, Job , VAN DER HORST, Ruud, Martinus
CPC classification number: G01J1/58 , G01J1/4257 , G01J1/429 , G01T1/2018 , G03F7/70558 , G03F7/7085 , H01S3/0903 , H01S3/1305
Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam comprises: a chamber for containing a gas; one or more sensors; and a processor. The chamber is provided with a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of a radiation beam propagating through the chamber generally along the axis.
Abstract translation: 用于确定辐射束的位置和/或功率的辐射传感器装置包括：用于容纳气体的腔室; 一个或多个传感器; 和处理器。 腔室设置有第一开口和第二开口，使得辐射束可以通过第一开口进入腔室，大致沿轴线传播通过腔室，并通过第二开口离开腔室。 一个或多个传感器中的每一个被布置成接收和检测围绕轴线的腔室的区域发射的辐射。 处理器可操作以使用由一个或多个传感器检测到的辐射来确定通常沿轴线传播通过腔室的辐射束的位置和/或功率。
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公开(公告)号：WO2016091486A1
公开(公告)日：2016-06-16
申请号：PCT/EP2015/075716
申请日：2015-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： NIENHUYS, Han-Kwang , DONDERS, Sjoerd, Nicolaas, Lambertus , DE VRIES, Gosse, Charles , RENKENS, Michael, Jozef, Mathijs , LOOPSTRA, Erik, Roelof
IPC: G03F7/20
CPC classification number: G03F7/70891 , G02B5/1838 , G02B5/1861 , G03F7/70266 , G03F7/7095
Abstract: A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the reflector. The channels (16) of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.
Abstract translation: 1.一种反射器（2），包括由基板（8）支撑的板（4），其中所述板具有反射表面（5），并且通过无粘合粘合固定到所述基板，并且其中冷却通道阵列（10） 设置在反射器中。 冷却通道阵列的通道（16）可以由衬底的表面中的开放通道形成，开放通道由板闭合以产生通道。
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