公开(公告)号：SG146615A1

公开(公告)日：2008-10-30

申请号：SG2008065716

申请日：2006-12-15

Applicant: ASML NETHERLANDS BV

Inventor： TROOST KARS ZEGER ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BLEEKER ARNO JAN ,  GREENEICH JAMES SHERWOOD

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD USING MULTIPLE EXPOSURES AND MULTIPLE EXPOSURE TYPES A lithographic apparatus and method in which a relatively high resolution exposure, for example of a repeating pattern, is trimmed using a relatively low resolution exposure. According, a compromise between provision of a high resolution pattern and flexibility in the pattern to be formed is provided. Figure 14b

公开(公告)号：EP1966651A4

公开(公告)日：2010-05-26

申请号：EP06838970

申请日：2006-12-05

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： SEWELL HARRY ,  BASELMANS JOHANNES JACOBUS MATHEUS

IPC: G03F7/20

CPC classification number: G03B27/54 ,  G03F7/70408

公开(公告)号：SG146614A1

公开(公告)日：2008-10-30

申请号：SG2008065708

申请日：2006-12-15

Applicant: ASML NETHERLANDS BV

Inventor： TROOST KARS ZEGER ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BLEEKER ARNO JAN ,  GREENEICH JAMES SHERWOOD

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD USING MULTIPLE EXPOSURES AND MULTIPLE EXPOSURE TYPES A lithographic apparatus and method in which a relatively high resolution exposure, for example of a repeating pattern, is trimmed using a relatively low resolution exposure. According, a compromise between provision of a high resolution pattern and flexibility in the pattern to be formed is provided. Figure 14b

公开(公告)号：SG173309A1

公开(公告)日：2011-08-29

申请号：SG2011034329

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  DIERICHS MARCEL MATHIJS THEODORE MARIE ,  JASPER JOHANNES CHRISTIAAN MARIA ,  MEIJER HENDRICUS JOHANNE MARIA ,  MICKAN UWE ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  LIPSON MATHEW ,  UITTERDIJK TAMMO ,  BASELMANS JOHANNES JACOBUS MATHEUS

IPC: G03F7/20

Abstract: 225A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the final element of the projection system and the substrate W. Several methods are disclosed for protecting components of the projection system, substrate table anda liquid confinement system. These include providing a protective coating on the final10 element 20 of the projection system as well as providing sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.[Fig No. 61115

公开(公告)号：DE60332697D1

公开(公告)日：2010-07-08

申请号：DE60332697

申请日：2003-09-26

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER LAAN HANS ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA

IPC: G01M11/02 ,  G03F7/20 ,  H01L21/027

公开(公告)号：NL2003818A

公开(公告)日：2010-06-21

申请号：NL2003818

申请日：2009-11-18

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  JASPER JOHANNES CHRISTIAAN MARIA

IPC: G03F7/20

公开(公告)号：NL1036313A1

公开(公告)日：2009-06-30

申请号：NL1036313

申请日：2008-12-12

Applicant: ASML NETHERLANDS BV

Inventor： KOK HAICO VICTOR ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  KERKHOF MARCUS ADRIANUS VAN DE

IPC: G03F7/20

公开(公告)号：DE602005014179D1

公开(公告)日：2009-06-10

申请号：DE602005014179

申请日：2005-08-05

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  TROOST KARS ZEGER

IPC: G03F7/20 ,  G02B5/18 ,  G02B26/08

Abstract: An array of individually controllable elements, comprising a plurality of control areas (20) consisting of a plurality of rows (31,32,33,34) of reflectors. Alternate rows (31,33) of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.