21.
    发明专利
    未知

    公开(公告)号:DE4342316A1

    公开(公告)日:1995-06-14

    申请号:DE4342316

    申请日:1993-12-11

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP94/04057 Sec. 371 Date May 20, 1996 Sec. 102(e) Date May 20, 1996 PCT Filed Dec. 6, 1994 PCT Pub. No. WO95/16020 PCT Pub. Date Jun. 15, 1995The use of polyaspartic acid prepared by polycondensation of aspartic acid in the presence of phosphoric acid in a molar ratio of from 1:0.05 to 1:10 at temperatures of at least 120 DEG C. to give polysuccinimide, and subsequent hydrolysis of the polysuccinimide with bases to give at least partially neutralized polyaspartic acid, as additive to detergents and cleaners in amounts of from 0.1 to 10% by weight, and detergents and cleaners which contain polyaspartic acids prepared in the presence of phosphoric acid.

    DRY RESIST FILM AND PROCESS FOR PRODUCING RESIST PATTERNS

    公开(公告)号:DE3561771D1

    公开(公告)日:1988-04-07

    申请号:DE3561771

    申请日:1985-12-16

    Applicant: BASF AG

    Abstract: In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of (a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or methacryloyl groups and are soluble or dispersible in aqueous alkaline solutions, (b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, (c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, (d) from 0.001 to 10% by weight of one or more photoinitiators and (e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.

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