公开(公告)号：JPH03289121A

公开(公告)日：1991-12-19

申请号：JP9041390

申请日：1990-04-06

Applicant: CANON KK

Inventor： KUNO MITSUTOSHI ,  FUJIOKA HIDEHIKO ,  MIZUSAWA NOBUTOSHI ,  CHIBA YUJI ,  KARIYA TAKUO ,  UDA KOJI ,  UZAWA SHUNICHI

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce the dispersion of mask pattern distortion so as to prevent the drop in positioning accuracy or the drop in repeatability and reproducibility by performing the rotation and the sucking of the mask in the condition that the pressure is weakened, after pressing a mask frame at the specified pressure in the condition that it is erected approximately vertically to a positioning V block. CONSTITUTION:By the mask transfer instruction from a CPU, a mask band 13 also shifts in the direction of a mask stage 17, and a mask frame 14 is made to abut on a V block 18, and when it reaches the first pressure, it drives a pulse motor in the backward direction. This reverse sending is performed at the place where the pressure of the mask is equal or approximate to the second pressure (Ogf), and a pulse motor drive is stopped and the stage is rotated THETA. Next, the pulse motor is driven again, and the pressure to the V block is changed to the first pressure, subsequently the pule motor is driven in the backward direction, and the pressure to the V block is changed to the third pressure weaker than the first pressure, and when it reaches the third pressure, the motor drive is stopped, and a mask frame 14 is sucked and fixed by a mask chuck 14.

公开(公告)号：JPH03253018A

公开(公告)日：1991-11-12

申请号：JP4958390

申请日：1990-03-02

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  SUDA SHIGEYUKI ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To eliminate the exclusive stages for apertures for preventing respective photointerrupting bodies from shifting in the lateral direction thereby enabling the size of the photointerrupting bodies to be miniaturized by a method wherein the stages for shifting the photointerrupting bodies are used both as the stages for shifting the position slip detecting optical system. CONSTITUTION:Within an X-ray aligner, respective two axle stages for shifting pickups 6a-6d are composed of one axle stages 8a-8d capable of shifting in the lateral direction in parallel with respective sides 2a-2d of an exposure region 2 and the other one axle stages 9a-9d capable of shifting in the longitudinal direction perpendicular to said stages 8a-8d. Next, the shifting direction of the one axle stages 9a-9d is limited in the longitudinal direction only by loading the stages 9a-9d with the stages 8a-8d and then the stages 9a-9d are further loaded with photointerrupting bodies 7a-7d for limiting the exposure region 2. That is, the stages for shifting the pickups 6a-6d can be used both as the stages for shifting the photointerrupting sheets 7a-7d so that the exclusive stages for apertures may be eliminated to prevent the stages 9a-9d and the bodies 7a-7d from shifting in the lateral direction, thereby enabling the title exposure device to be miniaturized.

公开(公告)号：JPH03111361A

公开(公告)日：1991-05-13

申请号：JP24814289

申请日：1989-09-26

Applicant: CANON KK

Inventor： KAWAKAMI EIGO ,  UDA KOJI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI ,  KUNO MITSUTOSHI ,  IWAMOTO KAZUNORI ,  KARIYA TAKUO

IPC: B65H3/00 ,  B65G1/00 ,  B65G49/07 ,  B65H7/06 ,  B65H9/00 ,  G03F7/20 ,  G05B19/23 ,  H01L21/027

Abstract: PURPOSE:To enhance the reliability of a transport device by selecting an applicable one among location restricting means prior to start of transportation according to the purpose position where the transport is to be performed, and selecting another applicable location restricting means after the start of the transport according to the situation of the location restricting means or a position checking means. CONSTITUTION:A plurality of location restricting means 45, 46, 47 are arranged in the transporting direction, and prior to start of the transportation a selecting means 20 selects an applicable one among these location restricting means 45, 46, 47 according to the purpose position where the transport is to be made. After the start of the transportation another applicable location restricting means is selected according to the situation of the location restricting means 45, 46, 47 or a position checking means 47. This achieves prevention of causing damage to an object to be transported or the transporting device itself even in case the transporting device is put in uncontrolled run as the worst case.

公开(公告)号：JPH03108311A

公开(公告)日：1991-05-08

申请号：JP24329189

申请日：1989-09-21

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UDA KOJI ,  UZAWA SHUNICHI ,  OZAWA KUNITAKA

IPC: G21K5/00 ,  G03F1/22 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce the flow rate of helium required for the title device by covering the X-ray beam path from a shielding window to a mask with bellows. CONSTITUTION:When the operating state of this X-ray exposing device rises from the initial state to the exposing state, a mask cover 7 is moved so that the cover 7 can face a mask 12 by means of a driving unit 8. When the space between double bellows is pressurized, the cover 7 is expanded and airtightly fixed to a mask supporting section 5. A vacuum pump 16 evacuates the air from a stage housing chamber 6 so as to reduce the air pressure in the chamber 6 to an exposing pressure level. After the air pressure in the X-ray beam path section from a shielding window 2 in the bellows 4 to a gate valve 14 is reduced to vacuum, helium is supplied to the path section through a supply port 29 until a reduced helium pressure atmosphere for exposure is set. The helium is supplied after air is simultaneously evacuated from the spaces between the valve 14 and mask 12 and between the mask 12 and cover 7 through ports 30 and 31 by means of a pump 33 and the reduced helium pressure atmosphere for exposure is set. After the atmosphere is set, the valve 14 is opened and the cover 7 is driven to a prescribed retreated position. Therefore, the evacuating time can be reduced at the rising time of this device and the flow rate of helium can be reduced at the time of exposure.

公开(公告)号：JPH03107800A

公开(公告)日：1991-05-08

申请号：JP24329289

申请日：1989-09-21

Applicant: CANON KK

Inventor： MATSUI SHIN ,  TANAKA YUTAKA ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  UDA KOJI ,  UZAWA SHUNICHI

IPC: G21K5/00 ,  G21K5/02 ,  H05H7/14

Abstract: PURPOSE:To maintain an ultra high vacuum and enable vibration removal by forming the double structure of a thin bellows and piping which is provided outside it and withstands the differential pressure between the atmosphere and the vacuum. CONSTITUTION:A shield window 12 withstands the differential pressure between a beam port 3 and a stage storage chamber 1. A communication pipe 13 links the inside of the bellows 4 with the bellows 4 and a piping flange 5 through low vacuum valves 11 and 21. An ultra high vacuum pump 18 is connected to the beam port 3 through an ultra high vacuum valve 17. In this constitution, the valve 17 and two valves 11 and 21 are closed, the pump 18 and low vacuum pump 14 are started, and when the rotation of the pump becomes stable, the valves 11 and 21 are opened at the same time. Then after it is confirmed that specific pressure is obtained in the flange 5 in the beam port 3, the valve 11 is closed. Finally, the valve 17 is opened to evacuate the beam port 3 to an ultra high vacuum. Consequently, no differential pressure is applied to the bellows 4 and the ultra high vacuum is produced in the beam port 3.

公开(公告)号：JPH0385717A

公开(公告)日：1991-04-10

申请号：JP22153989

申请日：1989-08-30

Applicant: CANON KK

Inventor： KUROSAWA HIROSHI ,  UDA KOJI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  NOSE TETSUSHI

IPC: G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To carry out accurate exposure by putting an exposure device having a registration mechanism and by measuring and reflecting a position of a detecting mechanism to detect a position deviation between a transcription pattern and a substrate. CONSTITUTION:For example, a pick-up measures an interval between a mask 2 and a wafer 3 and measures alignment deviation. A mirror 118 which is fixed to a box body 117 of the pick-up reflects meaurment light projected from a collimator 120. A projection beam 113 for alignment measurement is casted from a pick-up and an alignment masurement signal is taken in to a fine AA, AF signal treatment part 102. A position of a mirror tube 117 of a pick up is measured continuously in a collimator in a pick-up head position control part, and alignment measurement deviation is obtained based on position measurement data thereof. If alignment masurement data corrected excepting the alignment measurement error exceeds an allowable value of a deviation between the mask 2 and the wafer 3, a wafer stage is driven only by a distance devilment to the deviation, and alignment is measured again; if it is in a range of an allowable value, exposure is started.

公开(公告)号：JPH0278215A

公开(公告)日：1990-03-19

申请号：JP22838788

申请日：1988-09-14

Applicant: CANON KK

Inventor： SHIMODA ISAMU ,  MIZUSAWA NOBUTOSHI ,  UDA KOJI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To suppress an irregularity in a line width of a pattern and to reduce a stroke of a shifting stage by a method wherein an exposure operation is executed by correcting the following: a change in a quantity of light with the passage of time of a light source; a change in a transmission factor with the passage of time of a lens and a photomask. CONSTITUTION:A shifting-stage drive circuit 113 is operated according to an instruction from a control circuit 111; a shifting stage 3 is shifted to an exposure position of a water 2. Then, a slit width of a slit shutter 81 is set for wafer exposure use by using a shutter drive circuit 112; a slit exposure operation is executed. During this process, the slit width and a shifting velocity of the stage 3 are calculated by the circuit 111 according to an output, of a photosensor 12 on the stage 3, which has been obtained during a measuring operation of a light intensity; an exposure amount is increased by widening the slit width or by slowing the shifting velocity; a shortage of the exposure amount with the passage of time is supplemented. In this manner, a spread of a luminous flux is made different from that during the exposure operation; the luminous flux is shifted in synchronization with a shift of the stage 3.

公开(公告)号：JPH0277627A

公开(公告)日：1990-03-16

申请号：JP22838988

申请日：1988-09-14

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  TERAJIMA SHIGERU ,  SHIMODA ISAMU ,  UZAWA SHUNICHI ,  KARIYA TAKUO

IPC: G01J1/02 ,  G01T1/29 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To measure the exposure distribution on the surface of a wafer within a short time with high accuracy by detecting the difference between the intensity of the light transmitting through the first filter and that of the light transmitting through the second filter. CONSTITUTION:A stage 11 is moved so that an X-ray detector 4 comes to a predetermined exposure position so set the first filter 1 above the detector 4 and an X-ray mirror 10 is subsequently shaken so that X-rays 8 pass above the detector 4 and the intensity of X-rays 8 is measured through the filter 1 to set the output thereof to I1. Next, a filter holder 3 is rotated by a holder driving part 5 so that the second filter 2 is positioned above the detector 4 and the intensity of X-rays is measured through the filter 2 to set the output thereof to I2. Then, the difference between I1, I2 is calculated to be set to the X-ray intensity data at that position. Next, the stage 11 is moved and this process is successively repeated to calculate X-ray intensity data at all of exposure positions.

公开(公告)号：JPH0273617A

公开(公告)日：1990-03-13

申请号：JP22471288

申请日：1988-09-09

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  KARIYA TAKUO ,  SHIMODA ISAMU

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To set the moving region of an alignment unit and a screen size to minimum limits, and to increase the mounting region of other component by setting the length of a direction perpendicular to and parallel to the edge of a blade to a predetermined length in response to maximum/minimum exposure screen angle. CONSTITUTION:The length of a blade BLD in a direction perpendicular to an edge for specifying the screen of the blade is increased slightly larger than (lEX-lmin)/2, where lEX is the direction of a screen sufficiently necessary to radiate at the maximum exposure screen angle, and lmin is the length of the minimum exposure screen angle. The length of the blade BLD of a direction along the edge is slightly increased larger than lmax+lSTG, where lSTG is the distance of an alignment unit AAU for detecting the deviation of an alignment mark on a wafer and an alignment mark AMK on a mask MSK moving in a direction along the edge, and lmax is the maximum exposure screen angle of this aligner. Thus, the moving region and screen size of the unit AAU are minimized to increase the mounting region of other components.

公开(公告)号：JPS63312638A

公开(公告)日：1988-12-21

申请号：JP14861187

申请日：1987-06-15

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  WATANABE YUTAKA ,  OGURA SHIGETARO ,  KARIYA TAKUO ,  FUKUDA YOSHIAKI ,  KAWAI YASUO ,  MINAMI SETSUO

IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To align and transfer a pattern of an original plate irradiated by an electromagnetic wafer of an X-ray range efficiently on a substrate with high resolution by composing a contraction projection optical system with a plurality of multilayer film reflecting mirror having at least one forcible cooling means. CONSTITUTION:A reflecting contraction type projecting optical system is composed sequentially of a concave reflecting mirror M1, a convex reflecting mirror M2 and a concave reflecting mirror M3 from a mask MS side, and contracts to project a circuit pattern of the mask MS on a wafer WF. The reflecting mirror uses a multilayer film reflecting mirror, fundamentally forms a coaxial optical system, and further corrects an aberration by slightly inclining at least one of the mirrors M1, M3, M2 with respect to an optical axis O by displacing from a coaxial relation. Reflecting films are formed on the reflecting surfaces of the mirrors M1, M3 and M2 to efficiently reflect an X-ray. The films are formed of multilayer films of several tens of layers. In this aligner, it is aligned in high vacuum to superhigh vacuum state. Reflecting mirror cooling means is attached to the mirrors at this time.