公开(公告)号：CZ82298A3

公开(公告)日：1998-10-14

申请号：CZ82298

申请日：1996-09-12

Applicant: IBM

Inventor： AFZALI-ARDAKANI ALI ,  GELORME JEFFREY DONALD ,  KOSBAR LAURA LOUISE

IPC: B32B27/00 ,  B32B27/16 ,  B32B27/18 ,  C08G59/40 ,  C08H3/00 ,  C08H6/00 ,  C08H7/00 ,  C08J5/04 ,  C08K3/00 ,  C08K5/1515 ,  C08K5/16 ,  C08L5/00 ,  C08L63/00 ,  C08L91/00 ,  C08L93/00 ,  C08L97/00 ,  C08L99/00 ,  H05K1/03 ,  C08H5/02

Abstract: Biobased cross-linked compositions, methods of fabrication and structures, in particular biobased printed wiring boards using the compositions and methods of making the structures are described. Biobased materials such as lignin, crop oils, wood resins, tannins, and polysaccharides and combinations thereof are cross-linked, preferably using heat, a cross-linking agent, and an initiator. The materials fabricated have suitable properties for printed wiring boards which are made by impregnating a fibreglass or biobased cloth with an admixture of the biobased material, cross-linking agent and initiator which is processed by conventional methods to produce a printed wiring board.

公开(公告)号：DE69024452T2

公开(公告)日：1996-07-11

申请号：DE69024452

申请日：1990-10-08

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  GELORME JEFFREY DONALD ,  HATZAKIS MICHAEL ,  SHAW JANE MARGARET ,  STEWART KEVIN JAY ,  WITMAN DAVID FRANK

IPC: G03F7/031 ,  C08F2/50 ,  C08G59/68 ,  C08G77/14 ,  C08G77/22 ,  C08G85/00 ,  C08L83/04 ,  C08L83/06 ,  G03F7/027 ,  G03F7/029 ,  G03F7/075

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: wherein X is CH=CH2 or -(-CH2-)-n0-(-R) with R being H or wherein each R , R and R individually is selected from the group of alkyl, alkenyl, aryl, wherein each R , R and R individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

公开(公告)号：DE69024452D1

公开(公告)日：1996-02-08

申请号：DE69024452

申请日：1990-10-08

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  GELORME JEFFREY DONALD ,  HATZAKIS MICHAEL ,  SHAW JANE MARGARET ,  STEWART KEVIN JAY ,  WITMAN DAVID FRANK

IPC: G03F7/031 ,  C08F2/50 ,  C08G59/68 ,  C08G77/14 ,  C08G77/22 ,  C08G85/00 ,  C08L83/04 ,  C08L83/06 ,  G03F7/027 ,  G03F7/029 ,  G03F7/075

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: wherein X is CH=CH2 or -(-CH2-)-n0-(-R) with R being H or wherein each R , R and R individually is selected from the group of alkyl, alkenyl, aryl, wherein each R , R and R individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

公开(公告)号：DE69013945D1

公开(公告)日：1994-12-15

申请号：DE69013945

申请日：1990-02-01

Applicant: IBM

Inventor： DAY RICHARD ALLEN ,  GELORME JEFFREY DONALD ,  RUSSELL DAVID JOHN ,  WITT STEVEN JO

IPC: C08G59/00 ,  C08G59/20 ,  C08G59/30 ,  C08G59/62 ,  C08G59/68 ,  C08L63/00 ,  G03F7/038

公开(公告)号：DE3585437D1

公开(公告)日：1992-04-02

申请号：DE3585437

申请日：1985-12-13

Applicant: IBM

Inventor： GELORME JEFFREY DONALD ,  LAWRENCE WILLIAM HOWELL ,  SLOTA JR

IPC: C08J7/00 ,  C08J7/12 ,  C23C18/22 ,  H05K3/18 ,  H05K3/38 ,  H05K3/10

Abstract: The surface of a substrate is roughened by providing a substrate which comprises a resinous material and an inorganic particulate material; and etching a surface of the substrate to selectively etch the resinous material and thereby produce the roughened surface. The preferred etching process is a dry etching process.

公开(公告)号：ES2017615B3

公开(公告)日：1991-03-01

申请号：ES86114201

申请日：1986-10-14

Applicant: IBM

Inventor： GELORME JEFFREY DONALD ,  COX ROBERT JAMES ,  GUTIERREZ SERGIO ADOLFO RUIZ

IPC: G03F7/004 ,  C08G59/00 ,  C08G59/68 ,  G03F7/027 ,  G03F7/038 ,  H05K3/02 ,  H05K3/06 ,  H05K3/18 ,  H05K3/28