METHOD FOR MANUFACTURING MEMS DOUBLE-LAYER SUSPENSION MICROSTRUCTURE, AND MEMS INFRARED DETECTOR
    27.
    发明公开
    METHOD FOR MANUFACTURING MEMS DOUBLE-LAYER SUSPENSION MICROSTRUCTURE, AND MEMS INFRARED DETECTOR 审中-公开
    MEMS双层悬浮微结构的制造方法以及MEMS红外探测器

    公开(公告)号:EP3228583A1

    公开(公告)日:2017-10-11

    申请号:EP15866031.6

    申请日:2015-08-20

    Inventor: JING, Errong

    Abstract: A method for manufacturing a MEMS double-layer suspension microstructure comprises steps of: forming a first film body (310) on a substrate (100), and a cantilever beam (320) connected to the substrate (100) and the first film body (310); forming a sacrificial layer (400) on the first film body (310) and the cantilever beam (320); patterning the sacrificial layer (400) located on the first film body (310) to manufacture a recessed portion (410) used for forming a support structure (520), the bottom of the recessed portion (410) being exposed of the first film body (310); depositing a dielectric layer (500) on the sacrificial layer (400); patterning the dielectric layer (500) to manufacture a second film body (510) and the support structure (520), the support structure (520) being connected to the first film body (310) and the second film body (510); and removing the sacrificial layer (400) to obtain the MEMS double-layer suspension microstructure.

    Abstract translation: 一种制造MEMS双层悬浮微结构的方法包括以下步骤:在衬底(100)上形成第一膜体(310);以及连接到衬底(100)和第一膜体(100)的悬臂梁(320) 310); 在所述第一膜体(310)和所述悬臂梁(320)上形成牺牲层(400); 图案化位于第一膜体(310)上的牺牲层(400)以制造用于形成支撑结构(520)的凹陷部分(410),凹陷部分(410)的底部暴露于第一膜体 (310); 在牺牲层(400)上沉积介电层(500); 图案化介电层500以制造第二膜体510和支撑结构520,支撑结构520连接到第一膜体310和第二膜体510; 并去除牺牲层(400)以获得MEMS双层悬浮微结构。

    A deformable apparatus and method
    29.
    发明公开
    A deformable apparatus and method 审中-公开
    Verformbare Vorrichtung und Verfahren

    公开(公告)号:EP3010315A1

    公开(公告)日:2016-04-20

    申请号:EP14189248.9

    申请日:2014-10-16

    Abstract: An apparatus and method wherein the method comprises: a deformable substrate; a curved support structure configured to support at least a portion of a resistive sensor wherein the resistive sensor comprises a first electrode, a second electrode and a resistive sensor material provided between the electrodes; at least one support configured to space the curved support structure from the deformable substrate so that when the deformable substrate is deformed the curved support structure is not deformed in the same way; wherein the resistive sensor is positioned on the curved support structure so as to limit deformation of the resistive sensor when the deformable substrate is deformed.

    Abstract translation: 一种装置和方法,其中所述方法包括:可变形基板; 弯曲的支撑结构,其构造成支撑电阻式传感器的至少一部分,其中所述电阻式传感器包括设置在所述电极之间的第一电极,第二电极和电阻式传感器材料; 至少一个支撑件被构造成将弯曲的支撑结构与可变形基板隔开,使得当可变形的基板变形时,弯曲的支撑结构不会以相同的方式变形; 其中所述电阻传感器位于所述弯曲的支撑结构上,以便当所述可变形基板变形时限制所述电阻式传感器的变形。

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