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    CATHODE RAY TUBE AND ELECTRON GUN
    21.
    发明申请
    CATHODE RAY TUBE AND ELECTRON GUN 审中-公开
    阴极射线管和电子枪

    公开(公告)号：WO2003054907A1

    公开(公告)日：2003-07-03

    申请号：PCT/IB2002/005260

    申请日：2002-12-06

    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V. ,  JUNGBLUT, Reiner, M. ,  GERSMANN, Frank ,  GEHRING, Frederik, C. ,  ROSINK, Johannes, J., W., M.

    Inventor： JUNGBLUT, Reiner, M. ,  GERSMANN, Frank ,  GEHRING, Frederik, C. ,  ROSINK, Johannes, J., W., M.

    IPC: H01J29/48

    CPC classification number: H01J3/029 ,  H01J29/488 ,  H01J2229/482 ,  H01J2229/4848 ,  H01J2229/4875 ,  H01J2229/4886

    Abstract: A cathode ray tube (400) comprising an electron source and an extraction electrode (140) provided with an electrode aperture (170). The extraction electrode (140) is arranged to produce an electric field so as to effect the transport of electrons from said electron source and through said electrode aperture (170). Furthermore, the cathode ray tube (400) comprises an aperture electrode (150) located between said extraction electrode (140) and the electron source. The aperture electrode (150) comprises an aperture region (180) provided with a plurality of apertures (190), each aperture of said plurality of apertures (190) being shaped such that an electron beam with a beam current in a predetermined range of beam currents is formed at low drive voltage so that the cathode ray tube has a desired gamma value.

    Abstract translation: 一种包括电子源的阴极射线管（400）和设置有电极孔（170）的引出电极（140）。 引出电极（140）被布置成产生电场，以便实现电子从所述电子源和所述电极孔（170）的传输。 此外，阴极射线管（400）包括位于所述引出电极（140）和电子源之间的孔径电极（150）。 孔径电极（150）包括设置有多个孔（190）的开口区（180），所述多个孔（190）中的每个孔被成形为使得具有预定范围的束中的束电流的电子束 在低驱动电压下形成电流，使得阴极射线管具有期望的伽马值。

    CATHODE ARRANGEMENT, ELECTRON GUN, AND LITHOGRAPHY SYSTEM COMPRISING SUCH ELECTRON GUN
    24.
    发明申请
    CATHODE ARRANGEMENT, ELECTRON GUN, AND LITHOGRAPHY SYSTEM COMPRISING SUCH ELECTRON GUN 审中-公开
    包括这种电子枪的阴极布置，电子枪和光刻系统

    公开(公告)号：WO2015101538A1

    公开(公告)日：2015-07-09

    申请号：PCT/EP2014/078995

    申请日：2014-12-22

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： DINU-GÜRTLER, Laura ,  HOGERVORST, Eric Petrus

    IPC: H01J3/02 ,  H01J1/28 ,  H01J1/46 ,  H01J37/07

    CPC classification number: H01J37/3174 ,  G03F7/70058 ,  H01J1/15 ,  H01J1/28 ,  H01J3/027 ,  H01J3/029 ,  H01J37/075 ,  H01J37/3177 ,  H01J2229/481 ,  H01J2237/061

    Abstract: The invention relates to a cathode arrangement (20) comprising: • - a thermionic cathode comprising an emission portion (30) provided with an emission surface for emitting electrons, and a reservoir (38) for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; • - a focusing electrode (40) comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and • - an adjustable heat source (50) configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.

    Abstract translation: 本发明涉及阴极布置（20），其包括：·热阴极，其包括设置有用于发射电子的发射表面的发射部分（30）和用于保持 材料，其中所述材料在被加热时释放朝向所述发射部分扩散并在所述发射表面以第一蒸发速率发散的功函数降低颗粒; - 聚焦电极（40），其包括用于聚焦从阴极的发射表面发射的电子的聚焦表面; 和 - 可调节热源（50），其被配置用于将聚焦表面保持在防止聚焦表面上的功函数下降颗粒的聚集的温度。

    DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTION IMAGING WITH BOTH HIGH AND LOW BEAM CURRENTS
    25.
    发明申请
    DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTION IMAGING WITH BOTH HIGH AND LOW BEAM CURRENTS 审中-公开
    双镜头电子束装置和用于高分辨率成像和高光束和低光束电流的方法

    公开(公告)号：WO2014043557A1

    公开(公告)日：2014-03-20

    申请号：PCT/US2013/059788

    申请日：2013-09-13

    Applicant: KLA-TENCOR CORPORATION

    Inventor： JIANG, Xinrong ,  HAN, Liqun

    IPC: H01J37/26

    CPC classification number: H01J37/063 ,  H01J3/029 ,  H01J3/08 ,  H01J37/09 ,  H01J2237/0458 ,  H01J2237/30472

    Abstract: One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.

    Abstract translation: 一个实施例涉及一种电子束装置，其包括用于发射电子束的双透镜电子枪。 电子束是第一操作模式中的高束流电子束和处于第二操作模式的低束流电子束。 该装置还包括在第一操作模式中超出远光束电子束的路径的列孔径，并且在第二操作模式中围绕电子束装置的光轴居中。 另一实施例涉及一种电子枪，其包括第一枪式透镜，光束限制孔和第二枪形透镜。 第一个枪形透镜在电子通过光束限制光圈之前聚焦电子，而第二个枪形透镜在电子通过光束限制光圈后聚焦电子。 还公开了其它实施例，方面和特征。

    NON-PLANAR EXTRACTOR STRUCTURE FOR ELECTRON SOURCE
    26.
    发明申请
    NON-PLANAR EXTRACTOR STRUCTURE FOR ELECTRON SOURCE 审中-公开
    电子源的非平面萃取器结构

    公开(公告)号：WO2013169825A1

    公开(公告)日：2013-11-14

    申请号：PCT/US2013/040010

    申请日：2013-05-07

    Applicant: KLA-TENCOR CORPORATION

    Inventor： NASSER-GHODSI, Mehran ,  PLETTNER, Tomas ,  HAYNES, Robert G. ,  SEARS, Christopher Malcolm Stanley

    IPC: H01J37/06

    CPC classification number: H01J37/04 ,  H01J3/027 ,  H01J3/029 ,  H01J27/024 ,  H01J37/063 ,  H01J37/065 ,  H01J37/28 ,  H01J2237/06375

    Abstract: One embodiment disclosed relates to an electron source for generating an electron beam. The electron source includes an electron emitter having a tip from which an electron beam is extracted. The electron further includes a non-planar extractor with an extractor opening and a built-in beam-limiting aperture. The extractor opening is larger than the beam-limiting aperture, and central axes of both the extractor opening and the beam-limiting aperture are aligned with the tip along a beam axis. Another embodiment relates to a method of generating an electron beam using an electron source having a non-planar extractor. Another embodiment relates to an array of electron sources for generating an array of electron beams. The array of electron sources includes an array of electron emitters and an array of non-planar extractor structures. Other embodiments, aspects and features are also disclosed.

    Abstract translation: 公开的一个实施例涉及用于产生电子束的电子源。 电子源包括具有尖端的电子发射器，电子束从该尖端被提取。 电子还包括具有提取器开口和内置光束限制孔的非平面提取器。 提取器开口大于光束限制孔径，并且提取器开口和光束限制孔径的中心轴线沿着光束轴线与尖端对准。 另一实施例涉及使用具有非平面提取器的电子源产生电子束的方法。 另一实施例涉及用于产生电子束阵列的电子源阵列。 电子源阵列包括一组电子发射器和一组非平面提取器结构。 还公开了其它实施例，方面和特征。

    COLD-CATHODE ELECTRON SOURCE AND FIELD-EMISSION DISPLAY
    27.
    发明申请
    COLD-CATHODE ELECTRON SOURCE AND FIELD-EMISSION DISPLAY 审中-公开
    冷阴极电子源和场发射显示

    公开(公告)号：WO02027745A1

    公开(公告)日：2002-04-04

    申请号：PCT/JP2001/008465

    申请日：2001-09-27

    IPC: H01J1/304 ,  H01J3/02 ,  H01J29/46 ,  H01J29/48 ,  H01J31/12

    CPC classification number: H01J29/488 ,  H01J1/304 ,  H01J3/021 ,  H01J3/029 ,  H01J29/467 ,  H01J2329/00

    Abstract: A cold-cathode electron source having an improved use efficiency of an electron beam and a simple structure. The cold-cathode electron source comprises a gate electrode (4) provided on a substrate (2) through an insulating layer (3) and an emitter (6) extending through the insulating layer (3) and the gate electrode (4) and disposed in an opening of the gate. During the emission of electrons from the emitter (6), the relationships are satisfied: 10 [V/ mu m] > (Va-Vg) / (Ha-Hg) > Vg / VaVg / Hg [V/ mu m] > VaX10 X (9.7-1.3 X ln(Hg)) X (1000/Ha) where Ha [ mu m] is the distance between the anode and emitter, Va [V] is the voltage between the anode and emitter, Hg [ mu m] the distance between the gate and emitter, and Vg [ mu m] is the voltage between the gate and emitter.

    Abstract translation: 具有提高电子束的使用效率和简单结构的冷阴极电子源。 冷阴极电子源包括通过绝缘层（3）设置在基板（2）上的栅极（4）和延伸穿过绝缘层（3）和栅电极（4）的发射极（6） 在门口的开口。 在从发射极（6）发射电子的过程中，满足关系：10 [V / m]>（Va-Vg）/（Ha-Hg）> Vg / VaVg / Hg [V / <-4> X（9.7-1.3 X ln（Hg））X（1000 / Ha）<0.5>其中Ha1是阳极和发射极之间的距离，Va [V]是阳极和 发射极，Hg是栅极和发射极之间的距离，Vg]是栅极和发射极之间的电压。

    CATHODE ARRANGEMENT, ELECTRON GUN, AND LITHOGRAPHY SYSTEM COMPRISING SUCH ELECTRON GUN
    28.
    发明申请
    CATHODE ARRANGEMENT, ELECTRON GUN, AND LITHOGRAPHY SYSTEM COMPRISING SUCH ELECTRON GUN 审中-公开
    包括这种电子枪的阴极布置，电子枪和光刻系统

    公开(公告)号：WO2015101537A1

    公开(公告)日：2015-07-09

    申请号：PCT/EP2014078993

    申请日：2014-12-22

    Applicant: MAPPER LITHOGRAPHY IP BV

    Inventor： DINU-GÜRTLER LAURA ,  HOGERVORST ERIC PETRUS

    IPC: H01J3/02 ,  H01J1/28 ,  H01J1/46 ,  H01J37/063 ,  H01J37/07 ,  H01J37/075

    CPC classification number: H01J37/3174 ,  G03F7/70058 ,  H01J1/15 ,  H01J1/28 ,  H01J3/027 ,  H01J3/029 ,  H01J37/075 ,  H01J37/3177 ,  H01J2229/481 ,  H01J2237/061

    Abstract: The invention relates to a cathode arrangement (20) comprising: a cathode body housing an emission surface (32) for emitting electrons in a longitudinal direction (Z), wherein the emission surface is bounded by an emission perimeter (35); a focusing electrode (40) at least partially enclosing the cathode body in a transversal direction and comprising an electron transmission aperture (44) for focusing the electrons emitted by the emission surface, wherein the aperture is bounded by an aperture perimeter (45), wherein the cathode body is moveably arranged within the focusing electrode over a maximum transversal distance (d1) from an aligned position (R0), and wherein the aperture perimeter transversally extends over the emission surface and beyond the emission perimeter over an overlap distance (d2) that exceeds the maximum transversal distance.

    Abstract translation: 本发明涉及一种阴极布置（20），包括：阴极主体，该阴极主体容纳用于沿纵向方向（Z）发射电子的发射表面（32），其中发射表面由发射周界（35）界定; 聚焦电极（40），所述聚焦电极（40）在横向方向上至少部分地包围所述阴极体并且包括用于聚焦由所述发射表面发射的所述电子的电子传输孔（44），其中所述孔由孔周边（45） 所述阴极体在与所述对准位置（R 0）相距最大横向距离（d 1）的范围内可移动地布置在所述聚焦电极内，并且其中所述孔周边横跨所述发射表面并且在重叠距离（d 2）之上横跨所述发射周界横向延伸， 超过最大横向距离。

    A GUN WITH A COLD CATHODE
    30.
    发明申请
    A GUN WITH A COLD CATHODE 审中-公开

    公开(公告)号：WO2003098657A1

    公开(公告)日：2003-11-27

    申请号：PCT/CN2002/000921

    申请日：2002-12-30

    IPC: H01J29/48

    CPC classification number: H01J3/021 ,  H01J3/029 ,  H01J29/481

    Abstract: A gun with a cold cathode is disclosed in the present invention. A cold cathode made of a material for a cold cathode is held on a base, a mesh gate is right over the cold cathode, a focusing electrode in a circular hole-shape is right over the mesh gate, and the above-described electrodes are insulated with each other and held on the base. A mesh shielding electrode may be also provided right over the focusing electrode and is fixed on the base by a support for the shielding electrode. Depending on circumstances, the shielding electrode is required in a smaller device such as a pixel tube, but is not required in the applicattion of a cold lamp. The gun with a cold cathode according to the present invention is simple in structure, excellent in performance, and mainly used for a electron source, a electrical lamp with a cold cathode, and a pixel tube, it may be also used for other circumstances having the require similar to that.

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