Abstract:
The present invention relates to a method for measuring altitude using virtual calibration, capable of obtaining accurate information on a floor where a portable device is positioned in a high-rise building by measuring the altitude using an atmospheric pressure sensor installed in the user device without a network like an existing way, and a portable device performing the same. The objective of the present invention can be achieved by providing the method for measuring the altitude of a portable device using virtual calibration comprising (a) a step of receiving a satellite navigation signal; (b) a step of determining whether or not a user enters the dead area of satellite navigation while tracking the position of the user using the satellite navigation; (c) a step of storing an initial altitude value and an initial atmospheric pressure value at the start position of the dead area of the satellite navigation; and (d) a step of estimating the altitude of the user through the variation of an atmospheric pressure value measured by the atmospheric pressure sensor of the user terminal based on the initial altitude value and the initial atmospheric value.
Abstract:
본 발명은 InGaAs/GaAs 양자점 에너지 밴드갭을 조정하는 방법에 관한 것으로서, InGaAs/GaAs 양자점 기판을 성장하는 단계와, InGaAs/GaAs 양자점 기판에 2중 유전체 덮개층을 성장하는 단계와, 2중 유전체 덮개층이 성장된 InGaAs/GaAs 양자점 기판을 열처리하는 단계를 포함하는 InGaAs/GaAs 양자점 에너지 밴드갭 조정 방법을 제공한다. InGaAs/GaAs 양자점 기판에 유전체 덮개층으로 SiN x 와 SiO 2 를 성장하고, 700℃에서 1 내지 4분간 열처리한 결과, InGaAs/GaAs 양자점 기판에 국부적으로 다른 에너지 밴드갭이 형성되었고 공정 조건에 의존하여 에너지 밴드갭의 이동량이 변화하는 것을 관찰하며, 이와 함께 반치폭 값의 감소 현상과 스펙트럼 강도의 증가 현상을 관찰한다.
Abstract:
PURPOSE: A method for controlling an energy band gap of InGaAs/GaAs quantum dot by combination of a dielectric capping layer in a quantum dot disorder method is provided to form different band gap regions on the same InGaAs/GaAs quantum dot substrate by coating a dielectric capping layer on a quantum dot structure and performing a thermal process. CONSTITUTION: A method for controlling an energy band gap of InGaAs/GaAs quantum dot by using a dielectric capping layer includes a dielectric combination formation process and an energy band gap formation process. The dielectric combination formation process is to form a dielectric combination on a quantum dot substrate by using SiNx and SiO2 as the dielectric capping layer. The quantum dot substrate having a different energy band gap is formed by performing a thermal process for the quantum dot substrate.