公开(公告)号：CA3003766A1

公开(公告)日：2017-05-11

申请号：CA3003766

申请日：2016-11-03

Applicant: ASML NETHERLANDS BV

Inventor： DE JAGER PIETER WILLEM HERMAN ,  BIJLSMA SIPKE JACOB ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  NIKIPELOV ANDREY ALEXANDROVICH ,  TEN KATE NICOLAAS ,  DERKSEN ANTONIUS THEODORUS ANNA MARIA ,  VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  LANSBERGEN ROBERT GABRIEL MARIA ,  KASTELIJN AUKJE ARIANNE ANNETTE

IPC: G21G1/12 ,  G21K5/04 ,  G21K5/08 ,  G21K5/10

Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).

公开(公告)号：SG148015A1

公开(公告)日：2008-12-31

申请号：SG2004029625

申请日：2004-05-26

Applicant: ASML NETHERLANDS BV

Inventor： GEORGE RICHARD ALEXANDER ,  CHENG-QUN GUI ,  DE JAGER PIETER WILLEM HERMAN ,  VAN LEEUWEN ROBBERT EDGAR ,  BURGHOORN JACOBUS

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: Lithographic Apparatus and Device Manufacturing Method Lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.

公开(公告)号：SG114733A1

公开(公告)日：2005-09-28

申请号：SG200500893

申请日：2005-02-16

Applicant: ASML NETHERLANDS BV

Inventor： GUI CHENG-QUN ,  BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN

IPC: G03F7/20 ,  H01L21/027

Abstract: Provided is a method and system for facilitating use of a plurality of individually controllable elements (21-26) to modulate the intensity of radiation received at each focusing element (31;32) of an array of focusing elements (12) to control the intensity of the radiation in the areas (33;34) on the substrate (13) onto which the focusing elements direct the radiation.

公开(公告)号：DE602005014179D1

公开(公告)日：2009-06-10

申请号：DE602005014179

申请日：2005-08-05

Applicant: ASML NETHERLANDS BV

Inventor： BASELMANS JOHANNES JACOBUS MATHEUS ,  BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  TROOST KARS ZEGER

IPC: G03F7/20 ,  G02B5/18 ,  G02B26/08

Abstract: An array of individually controllable elements, comprising a plurality of control areas (20) consisting of a plurality of rows (31,32,33,34) of reflectors. Alternate rows (31,33) of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.

公开(公告)号：SG114763A1

公开(公告)日：2005-09-28

申请号：SG200501175

申请日：2005-03-01

Applicant: ASML NETHERLANDS BV

Inventor： SYTSMA JOOST ,  DE JAGER PIETER WILLEM HERMAN

IPC: G03F7/20 ,  H01L21/027

Abstract: A detector, feedback and compensation system for use with a radiation distribution system (30) for distributing the radiation from a radiation system (5) to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate (9). The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.

公开(公告)号：SG114736A1

公开(公告)日：2005-09-28

申请号：SG200500900

申请日：2005-02-16

Applicant: ASML NETHERLANDS BV

Inventor： GUI CHENG-QUN ,  BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  SYTSMA JOOST

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG112970A1

公开(公告)日：2005-07-28

申请号：SG200407391

申请日：2004-12-15

Applicant: ASML NETHERLANDS BV

Inventor： DE JAGER PIETER WILLEM HERMAN

IPC: H01L21/027 ,  G03F7/20

Abstract: A system and method is used to pattern a substrate (18). A projection beam (10) received from a radiation system is patterned using an array of individually controllable elements (13). Each element of a first array of focusing elements (12) directs a portion of the projection beam directly onto one of the individually controllable elements and collects radiation reflected therefrom. An image of the first array of focusing elements (12) is projected onto a second array of focusing elements (17) using a projection system (14,16), such that radiation reflected from one of the individually controllable elements is projected via one of the focusing elements in the first array of focusing elements (12) and the projection system (14,16) to one of the focusing elements in the second array (17) which focuses the radiation onto a spot on the substrate.