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Patent Agency Ranking
公开(公告)号：WO2016023740A3
公开(公告)日：2016-08-11
申请号：PCT/EP2015067159
申请日：2015-07-27
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY ALEXANDROVICH , COENEN TEIS JOHAN , VAN HELVOORT JEROEN JOHANNES MICHIEL , ENGELEN WOUTER JOEP , BRUSSAARD GERRIT JACOBUS HENDRIK , POORTER GIJSBERTUS GEERT , LOOPSTRA ERIK ROELOF
CPC classification number: H01S3/0903 , H01S3/0071 , H01S3/0959 , H01S3/1024 , H01S3/11 , H01S3/1103
Abstract: Passage through LINACs of electron bunches in their acceleration phase is co-ordinated with passage through the LINACs of electron bunches in their deceleration phase. Each successive pair of electron bunches are spaced in time by a respective bunch spacing, in accordance with a repeating electron bunch sequence. The electron source provides clearing gaps in the electron bunch sequence to allow clearing of ions at the undulator. The electron source provides the clearing gaps in accordance with a clearing gap sequence such that, for each of the plurality of energy recovery LINACS, and for substantially all of the clearing gaps:- for each passage of the clearing gap through the LINAC in an acceleration phase or deceleration phase the clearing gap is co-ordinated with a further one of the clearing gaps passing through the LINAC in a deceleration phase or acceleration phase thereby to maintain energy recovery operation of the LINAC.
Abstract translation: 在加速阶段通过电子束的LINAC通过其在减速阶段通过电子束的LINAC。 根据重复的电子束序列，每个连续的一对电子束在时间上由相应的束间隔隔开。 电子源提供电子束序列中的清除间隙，以允许在波动器处清除离子。 电子源根据清除间隙序列提供清除间隙，使得对于多个能量回收LINACS中的每一个以及基本上所有的清除间隙： - 对于通过加速度的LINAC的清除间隙的每次通过 相位或减速阶段，清除间隙与在减速阶段或加速阶段中通过LINAC的另一个清除间隙进行协调，从而维持LINAC的能量回收操作。
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公开(公告)号：NL2013885A
公开(公告)日：2015-06-08
申请号：NL2013885
申请日：2014-11-27
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY ALEXANDROVICH , BANINE VADIM YEVGENYEVICH , JAGER PIETER WILLEM HERMAN , VRIES GOSSE CHARLES , FRIJNS OLAV WALDEMAR VLADIMIR , GRIMMINCK LEONARDUS ADRIANUS GERARDUS , KATALENIC ANDELKO , AKKERMANS JOHANNES ANTONIUS GERARDUS , LOOPSTRA ERIK ROELOF , ENGELEN WOUTER JOEP , BARTRAIJ PETRUS RUTGERUS , COENEN TEIS JOHAN , ROOT WILHELMUS PATRICK ELISABETH MARIA
Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
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公开(公告)号：CA2954307C
公开(公告)日：2022-08-30
申请号：CA2954307
申请日：2015-07-02
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY ALEXANDROVICH , BANINE VADIM YEVGENYEVICH , BENSCHOP JOZEF PETRUS HENRICUS , BOOGAARD ARJEN , DHALLUIN FLORIAN DIDIER ALBIN , KUZNETSOV ALEXEY SERGEEVICH , PETER MARIA , SCACCABAROZZI LUIGI , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , YAKUNIN ANDREI MIKHAILOVICH
Abstract: Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 1017 cm-3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.
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公开(公告)号：CA3003766A1
公开(公告)日：2017-05-11
申请号：CA3003766
申请日：2016-11-03
Applicant: ASML NETHERLANDS BV
Inventor： DE JAGER PIETER WILLEM HERMAN , BIJLSMA SIPKE JACOB , FRIJNS OLAV WALDEMAR VLADIMIR , NIKIPELOV ANDREY ALEXANDROVICH , TEN KATE NICOLAAS , DERKSEN ANTONIUS THEODORUS ANNA MARIA , VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS , LANSBERGEN ROBERT GABRIEL MARIA , KASTELIJN AUKJE ARIANNE ANNETTE
Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).
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公开(公告)号：CA2954307A1
公开(公告)日：2016-01-07
申请号：CA2954307
申请日：2015-07-02
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY ALEXANDROVICH , BANINE VADIM YEVGENYEVICH , BENSCHOP JOZEF PETRUS HENRICUS , BOOGAARD ARJEN , DHALLUIN FLORIAN DIDIER ALBIN , KUZNETSOV ALEXEY SERGEEVICH , PETER MARIA , SCACCABAROZZI LUIGI , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , YAKUNIN ANDREI MIKHAILOVICH
Abstract: Disclosed is a membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane comprises one or more high doped regions wherein said membrane is doped with a dopant concentration greater than 1017 cm-3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein said high doped regions are comprised within some or all of said additional layers.
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