中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

53 records (took 0.025 seconds)

    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY
    31.
    发明专利
    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY 未知

    公开(公告)号：SG135934A1

    公开(公告)日：2007-10-29

    申请号：SG2003075587

    申请日：2003-12-18

    Applicant: ASML NETHERLANDS BV

    Inventor： STEVENS LUCAS HENRICUS JOHANNE ,  LEENDERS MARTINUS HENDRIKUS AN ,  MEILING HANS ,  MOORS JOHANNES HUBERTUS JOSEPH

    IPC: B08B7/00 ,  G03F7/20 ,  H01L21/027 ,  B08B6/00

    Abstract: Various novel cleaning processes are disclosed. Previous cleaning processes are global in that they involve infusing oxygen into the whole system and switching on a single radiation source which supplies a cleaning beam of radiation to every optical element in the lithographic apparatus. This can lead to overexposure of some optical elements whilst leaving other optical elements not cleaned to a sufficient amount. This is overcome by providing a system which allows selective ones or groups of the optical elements to be cleaned and which allows a spatially varied cleaning to occur across the surface of an optical element. This can be achieved by only supplying the cleaning beam of radiation to one or some of the optical elements and/or by increasing the local oxygen density in the vicinity of certain optical elements. Spatially resolved cleaning can be achieved using gray filters, which may be dynamically adapted, or by using a steerable electron mean beam.

    Lithographic device, device manufacturing method and device manufactured thereby
    32.
    发明专利
    Lithographic device, device manufacturing method and device manufactured thereby 未知

    公开(公告)号：SG126120A1

    公开(公告)日：2006-10-30

    申请号：SG200602061

    申请日：2006-03-28

    Applicant: ASML NETHERLANDS BV

    Inventor： JACOBS JOHANNES HENRICUS WILHE ,  BANINE VADIM YEVGENYEVICH ,  BREWSTER BARRIE DUDLEY ,  IVANOV VLADIMIR VITALEVITCH ,  MERTENS BASTIAAN MATTHIAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  LIVESEY ROBERT GORDON ,  WOLSCHRIJN BASTIAAN THEODOOR

    Abstract: A lithographic projection apparatus comprising: - a radiation system for supplying a projection beam of radiation; - a mask table provided with a mask holder for holding a mask; - a substrate table provided with a substrate holder for holding a substrate; - a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate,whereby: a) the projection system is separated from the substrate table by an intervening space which can be at least partially evacuated and which is delimited at the location of the projection system by a solid surface from which the employed radiation is directed toward the substrate table; b) the intervening space contains a hollow tube located between the solid surface and the substrate table and situated around the path of the radiation, the form and size of the tube being such that radiation focused by the projection system onto the substrate table does not intercept a wall of the hollow tube; c) means are provided for continually flushing the inside of the hollow tube with a flow of gas, wherein the gas is hydrogen, helium, deuterated hydrogen, deuterium or a mixture of argon and hydrogen and the flow of the gas is opposed to the flow of contaminants from the substrate and/or the hollow tube is in fluidic communication with the intervening space.

    35.
    发明专利
    未知

    公开(公告)号：DE102006054726A1

    公开(公告)日：2008-05-29

    申请号：DE102006054726

    申请日：2006-11-21

    Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV

    Inventor： EHM DIRK HEINRICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  BANINE VADIM ,  IVANOV VLADIMIR VITALEVITSCH

    IPC: B08B7/00

    Abstract: A method and an optical arrangement for removing contamination on optical surfaces (26), which are arranged in a vacuum environment in an optical arrangement, preferably in a projection exposure apparatus (1) for EUV lithography. The method includes generating a residual gas atmosphere containing molecular hydrogen (18) and at least one inert gas (17) in the vacuum environment, generating inert gas ions (21) by ionization of the inert gas (17), preferably with EUV radiation (20), and generating atomic hydrogen (27) by acceleration of the inert gas ions (21) in the residual gas atmosphere, to remove the contamination.

    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY
    36.
    发明专利
    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY 未知

    公开(公告)号：SG139554A1

    公开(公告)日：2008-02-29

    申请号：SG2006026827

    申请日：2003-12-18

    Applicant: ASML NETHERLANDS BV

    Inventor： STEVENS LUCAS HENRICUS JOHANNE ,  LEENDERS MARTINUS HENDRIKUS AN ,  MEILING HANS ,  MOORS JOHANNES HUBERTUS JOSEPH

    IPC: B08B7/00 ,  G03F7/20 ,  H01L21/027

    Abstract: Lithographic Apparatus, Device Manufacturing Method, and Device Manufactured Thereby. Various novel cleaning processes are disclosed. Previous cleaning processes are global in that they involve infusing oxygen into the whole system and switching on a single radiation source which supplies a cleaning beam of radiation to every optical element in the lithographic apparatus. This can lead to overexposure of some optical elements whilst leaving other optical elements not cleaned to a sufficient amount. This is overcome by providing a system which allows selective ones or groups of the optical elements to be cleaned and which allows a spatially varied cleaning to occur across the surface of an optical element. This can be achieved by only supplying the cleaning beam of radiation to one or some of the optical elements and/or by increasing the local oxygen density in the vicinity of certain optical elements. Spatially resolved cleaning can be achieved using gray filters, which may be dynamically adapted, or by using a steerable electron mean beam.

Patent Agency Ranking