IMPROVED SAMPLE INSPECTION SYSTEM
    31.
    发明公开
    IMPROVED SAMPLE INSPECTION SYSTEM 有权
    VERBESSERTESPRÜFSYSTEMFÜRPROBEN

    公开(公告)号:EP1023582A4

    公开(公告)日:2000-11-29

    申请号:EP98947155

    申请日:1998-09-18

    Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors (78) to restrict detection to certain azimuthal angles.

    Abstract translation: 使用弯曲镜像表面(78)来收集由样本表面(76a)散射并且源自正常照明光束(70)和斜向照明光束(90)的辐射。 所收集的辐射被聚焦到检测器(80)。 通过采用两个不同波长的辐射,通过有意地在由两个光束照射的光点之间引入偏移或者通过将正常照明光束和倾斜照明光束(70,90)切换到其上,并且通过使用两个不同波长的辐射来区分源自正常照明光束和倾斜照明光束的散射辐射 交替关闭。 可以通过检测倾斜照明光束的镜面反射并响应于此改变照明方向来校正由样本高度变化引起的光束位置误差。 蝴蝶形空间滤波器可以与曲面镜辐射收集器(78)结合使用,以将检测限制在某些方位角。

    REFERENCED INSPECTION DEVICE
    32.
    发明申请
    REFERENCED INSPECTION DEVICE 审中-公开
    参考检验设备

    公开(公告)号:WO2009151984A3

    公开(公告)日:2010-03-18

    申请号:PCT/US2009045704

    申请日:2009-05-29

    CPC classification number: H01L21/6838

    Abstract: A tool for investigating a substrate, where the tool has a tool head for investigating the substrate, a chuck for disposing an upper surface of the substrate in proximity to the tool head, and an air bearing disposed on the tool head adjacent the substrate. The air bearing has a pressure source and a vacuum source, where the vacuum source draws the substrate toward the air bearing and the pressure source prevents the substrate from physically contacting the air bearing. The pressure source and the vacuum source work in cooperation to dispose the upper surface of the substrate at a known distance from the tool head. By using the air bearing as part of the tool in this manner, registration of the substrate to the tool head is accomplished relative to the upper surface of the substrate, not the back side of the substrate.

    Abstract translation: 一种用于调查基板的工具,其中该工具具有用于检查基板的工具头,用于将基板的上表面设置在工具头附近的卡盘以及设置在与基板相邻的工具头上的空气轴承。 空气轴承具有压力源和真空源,其中真空源将基板拉向空气轴承,并且压力源防止基板物理接触空气轴承。 压力源和真空源协同工作,将衬底的上表面设置在与工具头一段已知距离处。 通过以这种方式使用空气轴承作为工具的一部分,基板相对于基板的上表面而不是基板的背面完成对准工具头。

    IMPROVED SYSTEM FOR MEASURING PERIODIC STRUCTURES
    33.
    发明申请
    IMPROVED SYSTEM FOR MEASURING PERIODIC STRUCTURES 审中-公开
    改进的周期结构测量系统

    公开(公告)号:WO0250509A3

    公开(公告)日:2002-12-12

    申请号:PCT/US0149259

    申请日:2001-12-18

    CPC classification number: G01N21/21 G01B11/00 G01N21/4788 G01N21/956

    Abstract: A periodic structure (32) is illuminated by polychromatic electromagnetic radiation (20). Radiation from the structure is collected and divided into two rays having different polarization states. The two rays (46, 48) are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a polychromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam.

    Abstract translation: 周期性结构(32)被多色电磁辐射(20)照射。 收集来自结构的辐射并将其分成具有不同偏振状态的两条光线。 检测两条射线(46,48),从中可以导出周期性结构的一个或多个参数。 在另一个实施例中,当周期性结构被多色电磁辐射照射时,来自该结构的收集的辐射穿过具有偏振面的偏振元件。 元件和多色光束受到控制,使得元件的偏振面相对于多色光束的入射面处于两个或更多个不同的取向。

    SELF-CLEARING OPTICAL MEASUREMENT APPARATUS AND METHODS OF USE
    34.
    发明申请
    SELF-CLEARING OPTICAL MEASUREMENT APPARATUS AND METHODS OF USE 审中-公开
    自清除光学测量装置及其使用方法

    公开(公告)号:WO0120304A3

    公开(公告)日:2001-10-04

    申请号:PCT/US0024888

    申请日:2000-09-11

    Abstract: Disclosed is a self-clearing objective (100) for directing a beam towards a sample and clearing away debris from an optical viewing path adjacent to the sample. The self-clearing objective includes an optical element (106, 210, 310, 408, 510) and a substantially transparent fluid (104, 213, 326, 512) flowing between the optical element and the sample such that at least a portion adjacent to the sample is substantially cleared of debris. The optical element and the fluid cooperatively direct the beam towards the sample. This self-clearing objective may be coupled with various measurement devices to measure various characteristics of samples having debris that prevents clear optical measurements. Additionally, the measurement device may be integrated with or coupled to various sample processing systems so that the relevant process may be clearly monitored.

    Abstract translation: 公开了一种用于将光束引向样品并从邻近样品的光学观察路径清除碎屑的自清除目标(100)。 自清理物镜包括在光学元件和样品之间流动的光学元件(106,210,310,408,510)和基本上透明的流体(104,213,326,512),使得至少一部分邻近 样品基本上清除了碎片。 光学元件和流体协调地将光束引向样品。 这种自清除物镜可以与各种测量装置耦合,以测量具有防止清晰光学测量的碎片的样品的各种特性。 此外,测量装置可以与各种样品处理系统集成或耦合到可以清楚地监测相关过程。

    WAFER INSPECTION
    35.
    发明公开

    公开(公告)号:EP2652776A4

    公开(公告)日:2018-01-17

    申请号:EP11849418

    申请日:2011-12-07

    Abstract: Systems and methods for inspecting a wafer are provided. One system includes an illumination subsystem configured to illuminate the wafer; a collection subsystem configured to collect light scattered from the wafer and to preserve the polarization of the scattered light; an optical element configured to separate the scattered light collected in different segments of the collection numerical aperture of the collection subsystem, where the optical element is positioned at a Fourier plane or a conjugate of the Fourier plane of the collection subsystem; a polarizing element configured to separate the scattered light in one of the different segments into different portions of the scattered light based on polarization; and a detector configured to detect one of the different portions of the scattered light and to generate output responsive to the detected light, which is used to detect defects on the wafer.

    COMPOSITE POLARIZER WITH ADJUSTABLE POLARIZATION ANGLES
    37.
    发明申请
    COMPOSITE POLARIZER WITH ADJUSTABLE POLARIZATION ANGLES 审中-公开
    具有可调极化角度的复合极化器

    公开(公告)号:WO2012112616A3

    公开(公告)日:2012-11-15

    申请号:PCT/US2012025130

    申请日:2012-02-14

    Inventor: ZHAO GUOHENG

    Abstract: An adjustable, composite polarizer can include first and second plate polarizers and an adjusting apparatus. The adjusting apparatus can adjust a pitch angle and a roll angle for the first and second plate polarizers while maintaining a predetermined, minimal distance between those plates. In this configuration, the adjustable, composite polarizer can provide mirror symmetric polarization with respect to an incident plane while providing the flexibility of any polarization.

    Abstract translation: 可调节的复合偏振器可以包括第一和第二板偏振器和调节装置。 调节装置可以在保持这些板之间预定的最小距离的同时,调整第一和第二板偏振器的俯仰角和滚动角。 在这种配置中,可调整的复合偏振器可以提供相对于入射平面的镜对称极化,同时提供任何偏振的柔性。

    DEFECT DETECTION AND RESPONSE
    39.
    发明申请
    DEFECT DETECTION AND RESPONSE 审中-公开
    缺陷检测和响应

    公开(公告)号:WO2010077865A2

    公开(公告)日:2010-07-08

    申请号:PCT/US2009068060

    申请日:2009-12-15

    Abstract: To increase inspection throughput, the field of view of an infrared camera can be moved over the sample at a constant velocity. Throughout this moving, a modulation can be provided to the sample and infrared images can be captured using the infrared camera. Moving the field of view, providing the modulation, and capturing the infrared images can be synchronized. The infrared images can be filtered to generate the time delay lock-in thermography, thereby providing defect identification. This filtering can account for the number of pixels of the infrared camera in a scanning direction. For the case of optical modulation, a dark field region can be provided for the field of view throughout the moving, thereby providing an improved signal-to-noise ratio during filtering. Localized defects can be repaired by a laser integrated into the detection system or marked by ink for later repair in the production line.

    Abstract translation: 为了提高检查吞吐量,红外摄像机的视野可以以恒定的速度移动到样品上。 在整个移动过程中,可以向样品提供调制,并可以使用红外摄像机捕获红外图像。 可以同步移动视野,提供调制和捕获红外图像。 可以对红外图像进行滤波以产生延时锁定热成像,从而提供缺陷识别。 该过滤可以解释红外摄像机在扫描方向上的像素数。 对于光调制的情况,可以在整个移动期间为视场提供暗场区域,从而在滤波期间提供改善的信噪比。 局部缺陷可以通过集成到检测系统中的激光器或由墨水标记来修复,以便在生产线中进行后续修复。

    IMPROVED SAMPLE INSPECTION SYSTEM
    40.
    发明申请
    IMPROVED SAMPLE INSPECTION SYSTEM 审中-公开
    改进的样品检测系统

    公开(公告)号:WO9914575B1

    公开(公告)日:1999-06-03

    申请号:PCT/US9819564

    申请日:1998-09-18

    Abstract: A curved mirrored surface (78) is used to collect radiation scattered by a sample surface (76a) and originating from a normal illumination beam (70) and an oblique illumination beam (90). The collected radiation is focused to a detector (80). Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams (70, 90) on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors (78) to restrict detection to certain azimuthal angles.

    Abstract translation: 使用弯曲镜像表面(78)来收集由样本表面(76a)散射并且源自正常照明光束(70)和斜向照明光束(90)的辐射。 所收集的辐射被聚焦到检测器(80)。 通过采用两个不同波长的辐射,通过有意地在由两个光束照射的光点之间引入偏移或者通过将正常照明光束和倾斜照明光束(70,90)切换到其上,并且通过使用两个不同波长的辐射来区分源自正常照明光束和倾斜照明光束的散射辐射 交替关闭。 可以通过检测倾斜照明光束的镜面反射并响应于此改变照明方向来校正由样本高度变化引起的光束位置误差。 蝴蝶形空间滤波器可以与曲面镜辐射收集器(78)结合使用,以将检测限制在某些方位角。

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