公开(公告)号：WO2020043401A1

公开(公告)日：2020-03-05

申请号：PCT/EP2019/070104

申请日：2019-07-25

Applicant: ASML NETHERLANDS B.V.

Inventor： FISCHER, Olof, Martinus, Josephus ,  BUTLER, Hans ,  KIMMAN, Maarten, Hartger ,  ROVERS, Johannes, Marinus, Maria ,  YANG, Tao

IPC: H02K41/035 ,  G03F7/20

Abstract: The invention provides an electromagnetic actuator comprising: - a first member and a second member configured to co-operate with the first member to, in use, generate a force in a first direction; - the first member comprising a permanent magnet assembly and a first magnetic member, the permanent magnet and the first magnetic member forming a first magnetic circuit having a first gap; - the second member comprising a coil member configured to, in use, be arranged at least partly inside the first gap, and, when energized, generated an electromagnetic force in the first direction; - the second member further comprising a second magnetic member, the permanent magnet assembly, the first magnetic member and the second magnetic member forming a second magnetic circuit having a second gap, the second magnetic circuit being configured to, in use, generate a reluctance force in the first direction.

公开(公告)号：WO2019043204A1

公开(公告)日：2019-03-07

申请号：PCT/EP2018/073548

申请日：2018-08-31

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： BAGGEN, Marcel, Koenraad, Marie ,  ARENDS, Antonius, Henricus ,  KUINDERSMA, Lucas ,  VAN DE RIJDT, Johannes, Hubertus, Antonius ,  HEMPENIUS, Peter, Paul ,  VAN KEMPEN, Robertus, Jacobus, Theodorus ,  BOSCH, Niels, Johannes, Maria ,  VAN DE GROES, Henricus, Martinus, Johannes ,  TSENG, Kuo-Feng ,  BUTLER, Hans ,  RONDE, Michaël, Johannes, Christiaan

IPC: H01J37/20

Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

公开(公告)号：WO2018166745A1

公开(公告)日：2018-09-20

申请号：PCT/EP2018/053808

申请日：2018-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： KIMMAN, Maarten, Hartger ,  BUTLER, Hans ,  FISCHER, Olof, Martinus, Josephus ,  HOOGENDAM, Christiaan, Alexander ,  HUIZINGA, Theodorus, Mattheus, Joannus, Maria ,  ROVERS, Johannes, Marinus, Maria ,  VENNAT, Eric, Pierre-Yves ,  WIJCKMANS, Maurice, Willem, Jozef, Etiënne

IPC: G03F7/20 ,  F16C39/06

Abstract: The invention relates to a bearing device arranged to support in a vertical direction a first part of an apparatus with respect to a second part of the apparatus, comprising a magnetic gravity compensator. The magnetic gravity compensator comprises: a first permanent magnet assembly mounted to one of the first part and the second part and comprising at least a first column of permanent magnets, the first column extending in the vertical direction, wherein the permanent magnets have a polarization direction in a first horizontal direction or in a second horizontal direction opposite to the first horizontal direction, wherein vertically adjacent permanent magnets have opposite polarization directions, a second permanent magnet assembly mounted to the other of the first part and the second part and comprising at least one other column of permanent magnets, the at least one other column extending in the vertical direction, wherein vertically adjacent permanent magnets of the at least one other column have opposite polarization directions in the first horizontal direction or the second horizontal direction, wherein the first permanent magnet assembly at least partially encloses the second permanent magnet assembly.

公开(公告)号：WO2018024416A1

公开(公告)日：2018-02-08

申请号：PCT/EP2017/066101

申请日：2017-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  SYMENS, Wim ,  JANSEN, Bas

IPC: G03F7/20

Abstract: The invention relates to a positioning system comprising: - a first body; - a second body; - an actuator arranged between the first body and the second body to position the first body relative to the second body; and wherein the actuator comprises a first piezoelectric actuator and a second piezoelectric actuator arranged in series, wherein the first piezoelectric actuator has a first hysteresis, wherein the second piezoelectric actuator has a second hysteresis smaller than the first hysteresis, wherein the second piezoelectric actuator has a positioning range at least equal to the first hysteresis.

Abstract translation: 定位系统技术领域本发明涉及一种定位系统，其包括：第一主体; - 第二个机构; - 布置在第一主体和第二主体之间以将第一主体相对于第二主体定位的致动器; 且其中所述致动器包括串联布置的第一压电致动器和第二压电致动器，其中所述第一压电致动器具有第一滞后，其中所述第二压电致动器具有小于所述第一滞后的第二滞后，其中所述第二压电致动器具有 定位范围至少等于第一次滞后。

公开(公告)号：WO2018015079A1

公开(公告)日：2018-01-25

申请号：PCT/EP2017/064738

申请日：2017-06-16

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT GMBH

Inventor： BUTLER, Hans ,  GEUPPERT, Bernhard ,  LOOPSTRA, Erik, Roelof ,  WIJCKMANS, Maurice, Willem, Jozef, Etiënne

IPC: G03F7/20

Abstract: The present invention relates to a lithographic apparatus, comprising: - a base frame (10), adapted for mounting the lithographic apparatus (1) on a support surface (9), - a projection system (20) comprising: - a force frame (30), - an optical element (21) which is moveable relative to the force frame, - a sensor frame (40), which is separate from the force frame, - at least one sensor which is adapted to monitor the optical element, comprising at least one sensor (25) element which is mounted to the sensor frame, - a force frame support (31), which is adapted to support the force frame on the base frame, - an intermediate frame (45), which is separate from the force frame, - a sensor frame coupler (41), which is adapted to couple the sensor frame to the intermediate frame, - an intermediate frame support (46), which is separate from the force fame support and adapted to support the intermediate frame on the base frame.

Abstract translation: 本发明涉及一种光刻设备，包括： - 适于将光刻设备（1）安装在支撑表面（9）上的基座框架（10）， - 投影系统（20 ）包括： - 力框架（30）; - 可相对于力框架移动的光学元件（21）; - 与力框架分开的传感器框架（40）; - 至少一个传感器，其是 ，适合于监测光学元件，包括至少一个传感器（25）元件，其安装到传感器框架; - 力框架支撑件（31），其适于将力框架支撑在基础框架上; - 中间框架 （45），其与所述力框架分开;传感器框架连接器（41），其适于将所述传感器框架连接到所述中间框架;中间框架支撑件（46），其与所述力框架 支持并适应于支持基本框架上的中间框架。

公开(公告)号：WO2017118508A1

公开(公告)日：2017-07-13

申请号：PCT/EP2016/080062

申请日：2016-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  DE HOON, Cornelius, Adrianus, Lambertus ,  JACOBS, Fransiscus, Mathijs ,  KAGAN, Pavel ,  STARREVELD, Jeroen, Pieter ,  WIJCKMANS, Maurice, Willem, Jozef, Etiënne

IPC: G03F7/20

CPC classification number: G03F7/709 ,  G03F7/70833

Abstract: A lithographic apparatus is described, the lithographic apparatus comprising: - an illumination system (IL) configured to condition a radiation beam; - a support (SA2) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam (PR); - a projection system (PS) configured to project the patterned radiation beam onto a target portion of a substrate (W), - a stage assembly (SA) comprising: - a substrate table (WT) constructed to hold the substrate; and - a positioning device configured to displace the substrate table relative to the projection system; - a base frame onto which stage assembly and the projection system are mounted; - the base frame comprising a first portion (SABF) configured to support the stage assembly and a second portion (BF2) configured to support the projection system, the first portion and the second portion being connected to each other via a compliant portion (DC) of the base frame.

Abstract translation: 描述了一种光刻设备，该光刻设备包括： - 照射系统（IL），其被配置为调节辐射束; - 构造成支撑图案形成装置（MA）的支撑件（SA2），所述图案形成装置能够在辐射束的横截面上赋予图案以形成图案化的辐射束（PR）; - 投影系统（PS），其经配置以将所述经图案化的辐射束投影到衬底（W）的目标部分上; - 平台组合件（SA），其包括： - 衬底台（WT），其经构造以保持所述衬底; 以及 - 定位装置，其被构造成相对于所述投影系统移位所述衬底台; - 台架组件和投影系统安装在其上的基座框架; - 基架包括被配置为支撑台组件的第一部分（SABF）和被配置为支撑投影系统的第二部分（BF2），第一部分和第二部分经由柔性部分（DC）彼此连接， 的基本框架。

公开(公告)号：WO2015106925A1

公开(公告)日：2015-07-23

申请号：PCT/EP2014/078541

申请日：2014-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  DE HOON, Cornelius, Adrianus, Lambertus ,  KERP, Ingmar, August ,  MEIJERS, Pieter, Johannes, Gertrudis ,  OOMS, Wesley ,  STARREVELD, Jeroen, Pieter ,  TEN HOOPEN, Derk ,  VAN DUIJNHOVEN, Martinus ,  HAGE, Edward ,  DRAAIJER, Evert, Hendrik, Jan

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  F16F15/0232 ,  G03F7/70733 ,  G03F7/70833 ,  G03F7/709

Abstract: A support device (2) configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes: a supporting system (20) configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber (30) connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting section; and a section of acoustic damping material (40), arranged at a location within the gas chamber such that it separates first and second gas containing regions within the gas chamber on either side of the section of acoustic damping material.

Abstract translation: 支撑装置（2），被配置为相对于第二部件支撑第一部件，使得两个部件之间的振动传递最小化，包括：支撑系统（20），其构造成在压力下使用气体以在第一部分之间提供支撑力 和第二部分; 连接到所述支撑系统并被配置为容纳处于压力下的气体并将气体提供给所述支撑部分的气室（30）; 以及一部分声学阻尼材料（40），其布置在气体室内的位置处，使得其分隔在声阻尼材料部分的任一侧上的气体室内的第一和第二气体容纳区域。

公开(公告)号：WO2014114405A2

公开(公告)日：2014-07-31

申请号：PCT/EP2013/076310

申请日：2013-12-12

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE KERKHOF, Marcus ,  VAN OOSTEN, Anton ,  BUTLER, Hans ,  LOOPSTRA, Erik ,  VAN DER WIJST, Marc ,  ZAAL, Koen

IPC: G03F7/20

CPC classification number: G03F7/702 ,  G02B7/182 ,  G02B7/1827 ,  G02B26/0825 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70575 ,  G03F7/709

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

Abstract translation: 公开了一种被配置为将光束投影到光刻设备内的基板的目标部分上的系统。 该系统包括具有用于定位反射镜的致动器和/或配置反射镜的形状的致动器的反射镜，致动器还向反射镜提供主动阻尼，以及用于产生用于控制所述致动器的致动器控制信号的控制器。 当定位所述反射镜和/或构造所述反射镜的形状时，第一坐标系用于控制所述致动器，并且当向所述反射镜提供主动阻尼时，使用第二坐标系统来控制所述致动器。

公开(公告)号：WO2013160016A1

公开(公告)日：2013-10-31

申请号：PCT/EP2013/055537

申请日：2013-03-18

Applicant: ASML NETHERLANDS B.V.

Inventor： BUTLER, Hans ,  VAN DER WIJST, Marc

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70775 ,  G01D5/347 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/709 ,  G03F9/7015 ,  G03F9/7096

Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage (16), and a measurement system (12-14) including a sensor part (13) and a reference part (12, 14), the measurement system being configured to determine the position and/or orientation of the support stage (16), or of a component mounted on the support stage, relative to a reference frame (6, 8, 10) by using the sensor part (13) to interact with the reference part (12, 14), wherein: the reference frame (6, 8, 10) comprises N sub-frames (6, 8) coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.

Abstract translation: 公开了一种光刻设备和设备的制造方法。 光刻设备包括支撑台（16）和包括传感器部件（13）和参考部件（12,14）的测量系统（12-14），该测量系统被配置为确定位置和/或取向 通过使用传感器部分（13）与参考部件（12,14）相互作用而相对于参考框架（6,8,10）安装在支撑台上的部件或安装在支撑台上的部件， 其中：所述参考框架（6,8,10）包括N个子框架（6,8），所述N个子框架（6,8）相对于第一参考频率之下的振动而主要地作为单个刚体表现，主要以N体 系统相对于高于第二参考频率的振动，其中N是大于1的整数。

公开(公告)号：WO2013143777A3

公开(公告)日：2013-10-03

申请号：PCT/EP2013/053084

申请日：2013-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  DE GROOT, Antonius, Franciscus, Johannes ,  HOOGENDAM, Christiaan, Alexander ,  LOOPSTRA, Erik, Roelof ,  BUTLER, Hans

IPC: G03F7/20

Abstract: A substrate table system includes a substrate table (WT) and a dual directional motor for moving the substrate table in a plane of movement. The plane of movement is defined by a first direction and a second direction perpendicular to the first direction. The dual directional motor includes: a first pusher structure (FPS) extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate so as to form a first motor arranged to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure (SPS) extending in the first direction, the substrate table being movable in respect of the second pusher structure (along the first and second directions), the second pusher structure and the substrate table being arranged to cooperate so as to form a second motor arranged to exert a force between the second pusher structure and the substrate table in the second direction.