公开(公告)号：JPH03230513A

公开(公告)日：1991-10-14

申请号：JP2507190

申请日：1990-02-06

Applicant: CANON KK

Inventor： SHIMODA ISAMU ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To obtain desired precision by measuring M/W interval matching error for each of integer times as many exposure regions as those of a first aligner at the time of exposure with a second aligner, and adjusting the equipment so as to minimize the error over the whole exposure region of the second aligner. CONSTITUTION:At the time of exposure with a second aligner, M/W interval matching error is measured for each of the same exposure regions as those of a first aligner or for each of integer times as many exposure regions as those thereof. The equipment is adjusted so as to minimize the error over the whole exposure region of the second aligner. Hence all of the semiconductor device M/W interval matching errors contained in the exposure region of the second aligner can be minimized, and the precision of M/W interval matching of each semiconductor device can be grasped. Thereby minimum line width, productivity, alignment precision, etc., can be optimized when the aligners whose exposure regions are different are used together.

公开(公告)号：JPH03135049A

公开(公告)日：1991-06-10

申请号：JP27304689

申请日：1989-10-19

Applicant: CANON KK

Inventor： MARUMO KOJI ,  TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  IWAMOTO KAZUNORI ,  MATSUI SHIN ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: B23Q3/08 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  H01L21/683

Abstract: PURPOSE:To realize a reliable delivery operation by a method wherein the following are installed on respective branched pipelines: opening and shutting valves which open and shut the pipelines and conductance-regulating valves which adjust a conductance of the pipelines. CONSTITUTION:First, a vacuum is produced by means of a vacuum pump 15, a valve 4 of an orientation-flat inspection chuck 1 is opened; a wafer is sucked. In order to attache the wafer to a hand chuck 2 in this state, a valve 5 in opened. At this time, a conductance is reduced and a fluid resistance is increased by using a fluid-regulating valve 8; a difference in a pressure is increased; as a result, an influx of a gas from the chuck 2 can be reduced, and the wafer can be held at the chuck 1. The chuck 2 is approached to the wafer from this state, and the wafer is sucked to the chuck 2. Then, a vacuum of the chuck 1 is released, and the wafer is sucked only to the chuck 2. Then, when the wafer which has been sucked to the chuck 2 is sucked to a wafer chuck 3, the operation if performed likewise.

公开(公告)号：JPH03135010A

公开(公告)日：1991-06-10

申请号：JP27187789

申请日：1989-10-20

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI ,  AMAMIYA MITSUAKI

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To preponderantly control an essential part in an atmosphere of helium by a method wherein a supply port, a discharge port and a pressure detection port of helium are installed near an X-ray irradiation passage, from a light- shielding window to a wafer, through which X-rays are passed. CONSTITUTION:A wafer 15 is exposed, via a mask 13 in a stage-housing chamber 19, to X-rays from an X-ray source via a light-shielding window 6. The air inside the chamber 19 is replaced with helium of a required pressure; after that, helium is supplied to keep a purity of helium against a leak or the like of the air into a seal of the chamber 19; then, a pressure of the helium in an X-ray irradiation passage is controlled to be definite via a variable valve 10. A helium supply port 3, a helium discharge port 4 and a helium pressure inspection port 7 which are used to control the helium are installed near the X-ray irradiation passage from the window 6 to the wafer 15; an atmosphere of helium in an essential part is controlled preponderantly. Thereby, a high-accuracy exposure operation is executed. When a thin film is installed at the side of the X-ray source from the mask, it is possible to prevent a vibration of the mask by an air current of helium.

公开(公告)号：JPH03133039A

公开(公告)日：1991-06-06

申请号：JP27044089

申请日：1989-10-19

Applicant: CANON KK

Inventor： KORENAGA NOBUSHIGE ,  GOTO SUSUMU ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: H01J37/04 ,  H01L21/027 ,  H01L21/66

Abstract: PURPOSE:To measure pattern size highly precisely while setting an optical axis to be rectangular to a sample by detecting inclination of an electron beam optical axis based on relative transfering volume of a first and a second electron beam detecting means against the electron beam optical axis and correcting the inclination of the electron beam optical axis by driving a deflecting means based on the detected value. CONSTITUTION:Since inclination of an electron beam optical axis 20 in x- direction (y-direction) against a transfering plane of a stage 4 is known based on electric current supplied to an auxiliary deflecting coil 6 and deflecting magnification of the auxiliary deflecting coil 6, the volume of inclination is corrected by a second deflecting coil installed in an electron optical lens-barrel. Ideally, the electron beam should cross rectangularly to a stage transfering plane when it is observed from x-direction of y-direction at the time of correction, but considering errors of deflecting magnification, etc. the correction procedure is repeated 2-3 times and in both x- and y-directions. As a result, the electron beam is injected rectangularly against the sample stage 4 and right information of pattern shape and size is obtained. In this way, precise measuring of a pattern is achieved.

公开(公告)号：JPH03108310A

公开(公告)日：1991-05-08

申请号：JP24329089

申请日：1989-09-21

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  OZAWA KUNITAKA ,  KARIYA TAKUO ,  UZAWA SHUNICHI ,  NOSE TETSUSHI

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To improve the exposing area setting accuracy of an exposing device by detecting the positional relation between light shielding means which limit the exposing area and the circuit pattern section of a mask. CONSTITUTION:A total of four positional deviation detecting means 6 are provided for detecting positional deviations between alignment marks 101 on a mask 1 on the periphery of a circuit pattern 102 on the mask 1 and alignment marks on a water 2. Aperture blades 4 are sufficiently retreated from the marks 101 so that they cannot intercept the laser beams 601 of the means 6 reaching the marks 101. When the blades 4 comes to positions where they cover the marks 101 against the beams 601, drive controlling sections of aperture stages 401 receive signals from signal processing sections of the means 6 and obtain the positional information of the marks 101 of the blades 4. When the marks 101 are not exposed against the laser beams 601, the blades 4 are retreated by prescribed amounts upon detecting the positional deviation between the wafer 2 and mask 1 and, when the marks 101 are exposed, the blades 4 are advanced. When the blades 4 are repeatedly retreated and advanced in such way, the exposing area setting accuracy can be improved.

公开(公告)号：JPH03101216A

公开(公告)日：1991-04-26

申请号：JP23730089

申请日：1989-09-14

Applicant: CANON KK

Inventor： MATSUI SHIN ,  TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UDA KOJI ,  UZAWA SHUNICHI

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To maintain accuracy of the parts installed in a stage housing chamber with high accuracy and to suppress transmissivity fluctuation of X-rays by controlling differential pressure between the inside and the outside of a stage housing chamber by means of the inner pressure of the stage housing chamber for adjusting the exposure time according to the inner pressure. CONSTITUTION:Evacuation inside a stage housing chamber 1 is performed up to prescribed pressure while introducing helium until differential pressure between the inside of the stage housing chamber 1 and the open air becomes prescribed differential pressure followed by continuing supply of a fixed amount of helium while constantly detecting differential pressure by means of a differential pressure sensor 17 so that differential pressure inside and outside the stage chamber is not changed due to the fluctuation of atmospheric pressure in order to perform pressure adjustment so that the differential pressure may always be constant. When at this time, for instance, atmospheric pressure is fluctuated, an absolute pressure sensor 15 constantly detects the pressure inside the stage housing chamber 1 while feeding back this to a motor 8 driving a shutter 7 through a controller 18 to correct the switching time of the shutter, that is, the exposure amount for suppressing X-ray transmissivity fluctuation.

公开(公告)号：JPH0388318A

公开(公告)日：1991-04-12

申请号：JP22329289

申请日：1989-08-31

Applicant: CANON KK

Inventor： SHIMODA ISAMU ,  OZAWA KUNITAKA ,  UDA KOJI ,  UZAWA SHUNICHI ,  KARIYA TAKUO

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make it possible to perform highly accurate position alignment and exposure without decreasing throughput by aligning the positions of a mask and a wafer, exposing and transferring a mask pattern on a wafer, increasing the distance between the mask and the wafer larger than the distance in said exposure and transfer, and exposing the vicinities, of position aligning marks. CONSTITUTION:Position aligning marks 3 and 7 of a mask 5 and a wafer 1 are used, and the positions of the mask 5 and the wafer 1 are aligned. A pattern 6 of the mask 5 is exposed and transferred on the wafer 1. Thereafter, the distance between the mask 5 and the wafer 1 is made larger than the distance at the time of exposure and transfer. Then the vicinities of the position aligning marks 3 and 7 of the mask 5 and the wafer 1 are exposed. Since resolution is decreased in this way, the transfer of the mask mark 7 is prevented, and resist 4 at the upper part of the wafer mark 3 is exposed. Thus, the wafer mark 3 can be exposed without the transfer of the mask mark 7 in the position aligning region. In this way, the highly accurate exposure and the position alignment can be performed.

公开(公告)号：JPH0387602A

公开(公告)日：1991-04-12

申请号：JP22329389

申请日：1989-08-31

Applicant: CANON KK

Inventor： KUROSAWA HIROSHI ,  UDA KOJI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO

IPC: G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PURPOSE:To easily change a wafer and a mask by detecting an absolute position at the time of starting and resetting a measurement of a wafer stage position executed by a laser interferometer. CONSTITUTION:The aligner is provided with a light source whose mutual position relation is fluctuated in accordance with a movement of a wafer stage 3 and a photodetecting means for detecting an optical axis position of a light beam emitted from this light source, and a means for detecting a position of the stage 3 by this light source and the photodetecting means at the time of starting a measurement and resetting the measurement. Also, this device is provided with the stage 3 for holding a wafer 2, a stage position measuring means for executing a position measurement of the stage 3 by using a laser interferometer 4, a stage driving control means for driving the stage 3 based on an output of this measuring means, and an alignment measuring means for detecting optically a misalignment between a mask 1 and the wafer 2, and based on the output of this measuring means, the wafer 2 is aligned against the mask 1 by the stage position measuring means and the stage driving control means, and thereafter, a pattern of the mask 1 is exposured and transferred to the wafer 2.

公开(公告)号：JPH0293538A

公开(公告)日：1990-04-04

申请号：JP24626288

申请日：1988-09-30

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  UZAWA SHUNICHI ,  KARIYA TAKUO ,  MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI

IPC: G03F1/66 ,  H01L21/027 ,  H01L21/30 ,  H01L21/673 ,  H01L21/68

Abstract: PURPOSE:To allow the storage of plural sheets of masks into the mask cassette and to facilitate taking-out and housing of the masks by providing a chucking means which magnetically attracts and holds the masks, positioning means which installs the masks to the prescribed position and means which grips the outer edges of the masks. CONSTITUTION:The magnetic flux of a permanent magnet 8 forms a magnetic path via a mask frame 5 when the mask frame 5 is brought near to a mask holder 2. The mask is attracted and held to the mask holder 2 in this way. The mask frame 5 is positioned while the frame comes into collision against a V block 3 at the time when the mask is attracted and held to the mask holder 2; therefore, the mask is eventually attracted and held with high accuracy. The magnetic flux of the permanent magnet 8 is merely necessitated to be instantaneously negated by exciting a solenoid coil 9 via a lead wire 10 at the time of removing the mask from the mask holder 2. The constitution of the mask cassette in a manner as to house plural sheets of the masks is facilitated in this way and the easy taking-out and housing of the masks are executed.

公开(公告)号：JPH0293139A

公开(公告)日：1990-04-03

申请号：JP24631488

申请日：1988-09-30

Applicant: CANON KK

Inventor： IWAMOTO KAZUNORI ,  UZAWA SHUNICHI ,  KARIYA TAKUO ,  EBINUMA RYUICHI

IPC: F16F15/02 ,  G03F7/20 ,  G12B5/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To prevent the influence of deformation from being transmitted to a main frame by supporting a supported body at least at two supporting points for a vacuum container and installing a vibration absorbing mechanism at least at one point among these supporting points, in the device equipped with the vacuum container and the supported body supported in the vacuum container. CONSTITUTION:For a chamber wall, a spherical seat 8 restricts only the y- direction, and a spherical seat 9 for glancing restricts only the z-direction. The third supporting point is a whole restriction point for preventing the position deflection state of a main frame 7 for the chamber wall. The deformation of the chamber wall due to exhaust is taken account of, when the main frame supporting points are on the upper and lower surfaces of the chamber, and even if the relative deformations of the upper and lower surfaces occur in all the directions, in other words in the revolution direction of each x, y, z axis, the main frame 7 is prevented from being influenced by the deformation, if the relative deformation occurs within the stroke of two spherical surface seats.