Abstract:
An adhesive film composition for a semiconductor assembly is provided to reduce the generation of burr or chipping in a sawing process by increasing a tensile modulus before curing of the adhesive film. An adhesive film composition for a semiconductor assembly comprises, based on solid portion, (i) phenoxy resin 2-15 weight%; (ii) ester-based thermoplastic resin 10-30 weight%; (iii) elastomer resin 30-60 weight% containing an hydroxyl group or epoxy group; (iv) epoxy-based resin 5-20 weight%; (v) at least one resin 2-20 weight% selected from the group consisting of a phenol type resin hardener or aromatic amine-based hardener resin as a hardener; and (vi) at least one catalyst 0.01-5 weight% selected from the group consisting of phosphine-based, boron-based and imidazole-based curing catalyst.
Abstract:
본 발명은 반도체 조립용 접착필름 조성물에 관한 것으로서, 더욱 상세하게는 수산기, 카르복실기 또는 에폭시기로부터 라디칼 중합을 가능하게 하는 라디칼 중합형 엘라스토머 수지, 0℃ 내지 200℃범위의 높은 유리전이온도(Tg)를 갖는 접착증진 결정성 폴리에스터 필름형성 수지, (메타)아크릴레이트계 수지 및 모노머, (메타)아크릴레이트 수지 경화제, 첨가제,실란 커플링제, 충진제, 및 유기 용매를 포함하는 것을 특징으로 하는 반도체 조립용 접착필름 조성물에 관한 것이다. 본 발명의 반도체 조립용 접착필름 조성물은, 라디칼중합으로 경화가 이루어짐으로써 반도체 제조 공정시 빠른 경화로 인하여 공정성을 향상시킬 수 있는 반도체 조립용 접착필름을 제공할 수 있다. 반도체 조립용 접착필름, 라디칼 중합형 엘라스토머, 퍼옥시드, 실란 커플링제, 다이쉐어값, 반도체공정
Abstract:
A composition for forming an adhesive film is provided to prevent an acrylic adhesive binder and UV curable acrylate from being transferred to an adhesive layer when used in a dicing die bonding film, and to realize high pick-up property even in large chips greater than 10 mm X 10 mm after UV irradiation. A composition for forming an adhesive film comprises: (A) 100 parts by weight of a polymer binder resin; (B) 20-150 parts by weight of a low-molecular weight UV curable acrylate; (C) 0.1-10 parts by weight of a thermal curing agent; and (D) 0.1-5 parts by weight of a photopolymerization initiator based on 100 parts by weight of the UV curable acrylate. The adhesive film formed by the composition has a sea-island surface structure, wherein the island region has an average size of 1-10 micrometers.
Abstract:
A composition for an anisotropic conductive film, and an anisotropic conductive film prepared from the composition are provided to improve initial adhesive strength, to reduce contact resistance and to enhance reliance even under the condition of high temperature and high humidity. A composition for an anisotropic conductive film comprises 5-50 wt% of at least one kind of resin selected from polyurethane and its modified resin; 5-50 wt% of at least one kind of resin selected from an indene resin and its copolymer; 1-50 wt% of a (meth)acrylate oligomer or polymer; 1-30 wt% of a (meth)acrylate monomer; 0.1-15 wt% of a radical initiator; and 0.01-20 wt% of a conductive particle. Preferably the polyurethane and its modified resin have an average molecular weight (Mw) of about 10,000-1,000,000.
Abstract:
A composition for an anisotropic conductive film is provided to inhibit flow of polymer particles during hot pressing, to allow maintenance of a low electric contact resistance even under severe conditions including high temperature and high humidity, and to realize excellent reliability. A composition for an anisotropic conductive film comprises: (i) 5-50 wt% of a thermoplastic resin; (ii) 0.1-30 wt% of polymer microparticles; (iii) 1-50 wt% of a (met)acrylate oligomer; (iv) 0.1-15 wt% of a radical initiator; and (v) 0.1-15 wt% of a radical initiator; and (vi) 0.01-20 wt% of conductive particles, wherein the polymer microparticles have a size equal to or smaller than the conductive particles and a softening point of 140-180 deg.C. The polymer microparticle is at least one selected from the group consisting of tetrafluoroethylene-perfluoro(alkylvinylether) copolymer, tetrafluoroethylene-hexafluoropropylene copolymer, tetrafluoroethylene-hexafluoropropylene-perfluoro(alkylvinylether) copolymer, tetrafluoroethylene-ethylene copolymer, polyvinylidene fluoride, polychlorotrifluoroethylene, chlorotrifluoroethylene-ethylene copolymer.
Abstract:
An anisotropic conductive film composition, and an anisotropic conductive film formed from the composition are provided to improve initial adhesive strength, to increase the reliance even under high temperature and high humidity and under thermal impact, to enhance productivity and to lower contact resistance. An anisotropic conductive film composition comprises 5-50 wt% of a thermoplastic resin; 1-50 wt% of an acrylic copolymer resin having a glass transition temperature of 5-120 deg.C; 1-30 wt% of a (meth)acrylate oligomer; 1-30 wt% of a (meth)acrylate monomer; 0.1-15 wt% of a radical initiator; and 0.01-20 wt% of a conductive particle. Also an anisotropic conductive film composition comprises 5-50 wt% of a thermoplastic resin; 1-50 wt% of an acrylic copolymer resin having a glass transition temperature of 5-120 deg.C; 1-80 wt% of at least one of epoxy monomer, oligomer or resin selected from the group consisting of bisphenolic, novolac, glycidyl, aliphatic and alicyclic epoxy compounds; 0.1-15 wt% of a thermal curing agent for epoxy; and 0.01-20 wt% of a conductive particle.
Abstract:
An anisotropic conductive film composition, and an anisotropic conductive film formed from the composition are provided to improve initial adhesive strength, to reduce contact resistance and to prevent the generation of short between circuits, thereby enhancing productivity. An anisotropic conductive film composition comprises 5-50 wt% of a thermoplastic resin; 5-50 wt% of a styrene-acrylonitrile copolymer resin; 1-50 wt% of a (meth)acrylate oligomer; 1-30 wt% of a (meth)acrylate monomer; 0.1-15 wt% of a radical initiator; and 0.01-20 wt% of a conductive particle. Also an anisotropic conductive film composition comprises 5-50 wt% of a thermoplastic resin; 5-50 wt% of a styrene-acrylonitrile copolymer resin; 1-80 wt% of at least one of epoxy monomer, oligomer or resin selected from the group consisting of bisphenolic, novolac, glycidyl, aliphatic and alicyclic epoxy compounds; 0.1-15 wt% of a thermal curing agent for epoxy; and 0.01-20 wt% of a conductive particle.
Abstract:
A dicing die bond film suitable for processing a thin film wafer is provided to remove a chip flying effect by increasing fixing force to a ring frame. A dicing die bond film includes a supporting base layer, an adhesive layer, and a fixing adhesive layer. The adhesive layer includes a lower adhesive layer(32) and an upper adhesive layer(22). The lower adhesive layer is laminated on the supporting base layer. The upper adhesive layer is laminated on the lower adhesive layer. The peel strength between the lower adhesive layer and the ring frame is 0.007N/mm to 1.000N/mm. The peel strength between the upper adhesive and the fixing adhesive layer is 0.002N/mm to 0.020N/mm after the peel strength. Further, the upper adhesive layer contains 30-90 wt.% of acryl copolymer, 10-70 wt.% of acryl compound and 0.1-10 wt.% of photoinitiator based on 100 wt.% of the upper adhesive layer.
Abstract:
본 발명은 아크릴계 고분자, 에폭시 수지, 페놀형 경화 수지, 경화 촉매, 실란 커플링제 및 충진제를 포함하고 경화 후 공-연속으로 상 분리되는 반도체 다이 접착제 조성물 및 이로부터 제조된 접착제 필름에 관한 것이다. 본 발명에 따르는 접착 필름은 경화부의 함량이 많더라도 연 구조성과 필름의 인장강도 증가를 동시에 만족시키므로, 필름이 끊어지지 않고 단단하여 반도체 조립시 높은 신뢰성을 확보할 수 있다. 공-연속 상, 가교성 관능기, 반도체 접착 필름, 다이 접착(die attach), 아크릴계 고분자, 페놀형 경화 수지, 경화 촉매, 실란 커플링제
Abstract:
이면연삭공정, 다이싱 공정, 및 픽업-다이 어태칭 공정을 하나의 테이프에 의해 수행할 수 있다는 장점이 있으며, 특히 점착층과 제2 접착층의 계면에 자외선 경화제를 포함하여 자외선 경화시 점착층과 함께 경화되는 제1 접착층을 둠으로서 점착층의 박리특성을 월등히 향상시킬 수 있는 반도체 패키지용 복합기능 테이프가 제공된다. 본 발명에 따른 반도체 패키지용 복합기능 테이프는 기재필름의 일면에 형성된 자외선 경화형 점착층, 상기 점착층 상에 형성되는 제1 접착층, 및 제2 접착층을 포함한다. 반도체, 패키지, 복합, 이면연삭, 다이싱, 다이본딩, 어태칭, 점착층, 접착층