Abstract:
본 발명은 파리 눈 렌즈를 이용한 조명계 인터그레이터에 관한 것이다. 본 발명은, 다수의 파리 눈 렌즈로 구성되는 인터그레이터에서 파리 눈 렌즈의 각각을 지나온 부분 광속들의 중심이 조명하고자 하는 영역의 중심과 일치하도록 각 파리 눈 렌즈의 광축을 인터그레이터의 광축에 대해 소정의 각도로 기울어지게 하거나 일정한 각도로 절단 함으로써 구성되며, 종래의 인터그레이터 장치보다 광의 균일도를 향상시키고 광량의 손실을 줄여 효율을 높일 수 있을 뿐만 아니라 조명계 시스템의 크기를 줄여 경량화시킬 수 있는 효과가 있다.
Abstract:
본 발명은 웨이퍼 스탭퍼에 있어서 패턴을 지닌 마스크의 패턴이 옮겨질 웨이퍼 사이의 정렬방법 및 그 장치에 관한 것으로서 파이버 다발 혹은 파이버(51)를 사용하여 웨이퍼 정렬마크(6)을 조명하는 수단과 조명된 정렬마크를 보조렌즈(57)과 투영렌즈(2)를 함께 사용하여 CCD 카메라에 결상하는 수단과 파이버 다발 혹은 파이버(63)을 사용하여 빛나누개(65)에 의하여 마스크 패턴(56)을 조명하는 수단과 이 패턴을 절상렌즈(61)을 사용하여 CCD 카메라에 결상하는 수단을 특징으로 한다.
Abstract:
A tracking back method and a device for receiving signals are provided to perform trace back considering a hash-based trace back method, thereby performing accurate IP(Internet Protocol) trace back. Data including router information is received along with a moving path of an invader. The data is filtered so that simplified information is stored(S301,S303). It is determined whether the data is normally received through the simplified information(S307). Path loss is predicted according to a determination result(S309,S311).
Abstract:
PURPOSE: A modified illumination apparatus of a lithography apparatus is provided to form a modified illumination light without energy loss of the illumination light. CONSTITUTION: If a birefringent optical unit(566) is inserted between a light beam enlarger(565) and a zoom lens(567), an incident light(564) is separated into four beams(575), and the four separated beams forms a quadruple modified illumination light(569) on a position of a modified illumination plane located on a Fly's Eye integrator(568). Also, the position of the birefringent optical unit can be located between an illumination light source(563) and the light beam enlarger. The quadruple modified illumination light is reflected by a reflection mirror(570) and is converged to a mask via a condenser lens(571), and can be transferred to a wafer(574) by a transparent optical system(573).
Abstract:
PURPOSE: A polarizing beam splitter for two wavelengths and a method for fabricating the same are provided to reflect a S-wave and transmit a P-wave by depositing alternately a material having a high refractive index and a material having a low refractive index on an inclined plane of a prism. CONSTITUTION: A reticle(1) is used for receiving an ArF excimer laser with a wavelength of 193nm. A couple of rectangular prism(4,8) is used for transmitting the ArF excimer laser through the reticle(1). A multi-coating layer(5) is formed on each inclined plane of the rectangular prisms(4,8). A plurality of 1/4 wavelength plate(6,9) is used for changing a wavelength of the laser beam reflected by the multi-coating layer(5). A reflective mirror(7) is used for reflecting the laser beam transmitting the 1/4 wavelength plate(6). The laser beam reflected by the reflective mirror(7) is focused on a wafer(10).
Abstract:
PURPOSE: A method for extending depth of focus of an optical system for lithographic equipment using transmission-type optical parts made of a double refraction material is provided to extend a range of an image in a direction of an optical axis, by making the image located in different positions have a predetermined interval in an optical axial direction depending on a polarization component of illumination light. CONSTITUTION: An optical system uses transmission-type double refraction optical parts(210) made of a double refraction material or a double refraction optical unit composed of the optical parts. An image by the double refraction optical unit(200) is focused in different positions and in a direction of an optical axis of the optical system to extend depth of focus, depending on a polarization component of illumination light(20).
Abstract:
PURPOSE: A method for controlling an extension scope of a focus depth in an optical system using a double refraction material is provided to extend a depth of a focus by having an image of the optical system focused in different positions in an optical axis direction, and to control a position of the image by a simple manipulation of optical parts in the optical system. CONSTITUTION: In an optical system of an exposure equipment for forming a fine shape by focusing an image of an original mask on a photoresist layer applied on a substrate, parts forming the optical system is composed of penetrating optical parts made of a double refraction material or an optical unit composed of a combination of the penetrating optical parts. A depth of a focus is extended by having the image focused in different positions in an optical axis direction. And, the scope of the focus is controlled and maintained.
Abstract:
PURPOSE: A method for manufacturing a diaphragm for an exposure equipment is provided to maintain the resolution and improve the light transmitting degree. CONSTITUTION: A first resist pattern is formed in a selected area on a substrate. A first optical shielding material is formed on the substrate, which includes the first resist pattern. After the first resist pattern is removed, a second resist is formed on the structure. Then, the central portion of the second resist is removed. After a second optical shielding material is formed on the structure, the second resist is removed.
Abstract:
PURPOSE: A wafer or reticle aligning method is provided to align the wafer or the reticle in an exposing equipment by measuring the horizontal, vertical and revolving errors of the aligning mark. CONSTITUTION: The wafer or reticle aligning method comprises the steps of: marking the aligning marks more than two on the wafer or the reticle; dividing the wafer or the reticle into the two spaces and making each part of the aligning mark existed in each space having the different area or shape from each other; moving the relative position of the aligning ray; and aligning the relative position of the wafer or the reticle by using the time interval between the aligning signals and the relative intensity strength of the aligning signals.