公开(公告)号：KR1019970028051A

公开(公告)日：1997-06-24

申请号：KR1019950042071

申请日：1995-11-17

Applicant: 한국전자통신연구원

Inventor： 이각현 ,  김도훈 ,  정해빈 ,  유형준

IPC: F21V5/04

Abstract: 본 발명은 파리 눈 렌즈를 이용한 조명계 인터그레이터에 관한 것이다. 본 발명은, 다수의 파리 눈 렌즈로 구성되는 인터그레이터에서 파리 눈 렌즈의 각각을 지나온 부분 광속들의 중심이 조명하고자 하는 영역의 중심과 일치하도록 각 파리 눈 렌즈의 광축을 인터그레이터의 광축에 대해 소정의 각도로 기울어지게 하거나 일정한 각도로 절단 함으로써 구성되며, 종래의 인터그레이터 장치보다 광의 균일도를 향상시키고 광량의 손실을 줄여 효율을 높일 수 있을 뿐만 아니라 조명계 시스템의 크기를 줄여 경량화시킬 수 있는 효과가 있다.

公开(公告)号：KR100116429B1

公开(公告)日：1997-06-16

申请号：KR1019930026310

申请日：1993-12-03

Applicant: 한국전자통신연구원

Inventor： 김도훈 ,  이종현 ,  유형준

IPC: H01L21/027

公开(公告)号：KR1019940016714A

公开(公告)日：1994-07-23

申请号：KR1019920026635

申请日：1992-12-30

Applicant: 한국전자통신연구원

Inventor： 김도훈 ,  김윤태 ,  박흥옥 ,  권진혁 ,  김상철

IPC: G03F7/26

Abstract: 본 발명은 웨이퍼 스탭퍼에 있어서 패턴을 지닌 마스크의 패턴이 옮겨질 웨이퍼 사이의 정렬방법 및 그 장치에 관한 것으로서 파이버 다발 혹은 파이버(51)를 사용하여 웨이퍼 정렬마크(6)을 조명하는 수단과 조명된 정렬마크를 보조렌즈(57)과 투영렌즈(2)를 함께 사용하여 CCD 카메라에 결상하는 수단과 파이버 다발 혹은 파이버(63)을 사용하여 빛나누개(65)에 의하여 마스크 패턴(56)을 조명하는 수단과 이 패턴을 절상렌즈(61)을 사용하여 CCD 카메라에 결상하는 수단을 특징으로 한다.

公开(公告)号：KR1020090065163A

公开(公告)日：2009-06-22

申请号：KR1020070132622

申请日：2007-12-17

Applicant: 한국전자통신연구원 ,  고려대학교 산학협력단

Inventor： 윤병식 ,  김도훈 ,  인호 ,  최송인 ,  안지환

IPC: H04L12/26 ,  H04L12/22 ,  H04L12/28

CPC classification number: H04L63/1416 ,  H04L63/1441

Abstract: A tracking back method and a device for receiving signals are provided to perform trace back considering a hash-based trace back method, thereby performing accurate IP(Internet Protocol) trace back. Data including router information is received along with a moving path of an invader. The data is filtered so that simplified information is stored(S301,S303). It is determined whether the data is normally received through the simplified information(S307). Path loss is predicted according to a determination result(S309,S311).

Abstract translation: 提供跟踪返回方法和用于接收信号的装置，以便考虑到基于散列的跟踪回溯方法来执行追溯，从而执行准确的IP（因特网协议）跟踪。 包含路由器信息的数据与入侵者的移动路径一起被接收。 数据被过滤以便存储简化的信息（S301，S303）。 通过简化信息确定数据是否正常接收（S307）。 根据确定结果预测路径损耗（S309，S311）。

公开(公告)号：KR1020010053689A

公开(公告)日：2001-07-02

申请号：KR1019990054156

申请日：1999-12-01

Applicant: 한국전자통신연구원

Inventor： 김도훈 ,  정해빈 ,  김대용

IPC: H01L21/027

Abstract: PURPOSE: A modified illumination apparatus of a lithography apparatus is provided to form a modified illumination light without energy loss of the illumination light. CONSTITUTION: If a birefringent optical unit(566) is inserted between a light beam enlarger(565) and a zoom lens(567), an incident light(564) is separated into four beams(575), and the four separated beams forms a quadruple modified illumination light(569) on a position of a modified illumination plane located on a Fly's Eye integrator(568). Also, the position of the birefringent optical unit can be located between an illumination light source(563) and the light beam enlarger. The quadruple modified illumination light is reflected by a reflection mirror(570) and is converged to a mask via a condenser lens(571), and can be transferred to a wafer(574) by a transparent optical system(573).

Abstract translation: 目的：提供光刻设备的改进的照明装置，以形成照明光的能量损失的改进的照明光。 构成：如果将双折射光学单元（566）插入在光束放大器（565）和变焦透镜（567）之间，入射光（564）被分成四个光束（575），并且四个分离的光束形成 位于Fly Eye集成器（568）上的改进的照明平面的位置处的四倍修正的照明光（569）。 此外，双折射光学单元的位置可以位于照明光源（563）和光束放大器之间。 四重改型的照明光被反射镜570反射，并通过聚光透镜571会聚到掩模，并可通过透明光学系统（573）传送到晶片574。

公开(公告)号：KR100276081B1

公开(公告)日：2001-02-01

申请号：KR1019970054786

申请日：1997-10-24

Applicant: 한국전자통신연구원

Inventor： 김종수 ,  최상수 ,  정해빈 ,  유형준 ,  이각현 ,  김도훈

IPC: G02B1/10 ,  G02B5/04 ,  G02B27/28

Abstract: PURPOSE: A polarizing beam splitter for two wavelengths and a method for fabricating the same are provided to reflect a S-wave and transmit a P-wave by depositing alternately a material having a high refractive index and a material having a low refractive index on an inclined plane of a prism. CONSTITUTION: A reticle(1) is used for receiving an ArF excimer laser with a wavelength of 193nm. A couple of rectangular prism(4,8) is used for transmitting the ArF excimer laser through the reticle(1). A multi-coating layer(5) is formed on each inclined plane of the rectangular prisms(4,8). A plurality of 1/4 wavelength plate(6,9) is used for changing a wavelength of the laser beam reflected by the multi-coating layer(5). A reflective mirror(7) is used for reflecting the laser beam transmitting the 1/4 wavelength plate(6). The laser beam reflected by the reflective mirror(7) is focused on a wafer(10).

Abstract translation: 目的：提供一种用于两个波长的偏振分束器及其制造方法，用于反射S波并通过将具有高折射率的材料和具有低折射率的材料交替沉积在 棱镜的倾斜平面。 构成：将掩模版（1）用于接收波长为193nm的ArF准分子激光器。 一对矩形棱镜（4,8）用于通过光罩（1）传送ArF准分子激光器。 在矩形棱镜（4,8）的每个倾斜平面上形成多层涂层（5）。 多个1/4波长板（6,9）用于改变由多层涂层（5）反射的激光束的波长。 反射镜（7）用于反射透射1/4波长板（6）的激光束。 由反射镜（7）反射的激光束聚焦在晶片（10）上。

公开(公告)号：KR100269244B1

公开(公告)日：2000-12-01

申请号：KR1019980019516

申请日：1998-05-28

Applicant: 한국전자통신연구원

Inventor： 김도훈 ,  이각현 ,  최상수 ,  정해빈 ,  김보우

IPC: H01L21/027

CPC classification number: G02B27/0075 ,  G02B5/3083 ,  G03F7/70216

Abstract: PURPOSE: A method for extending depth of focus of an optical system for lithographic equipment using transmission-type optical parts made of a double refraction material is provided to extend a range of an image in a direction of an optical axis, by making the image located in different positions have a predetermined interval in an optical axial direction depending on a polarization component of illumination light. CONSTITUTION: An optical system uses transmission-type double refraction optical parts(210) made of a double refraction material or a double refraction optical unit composed of the optical parts. An image by the double refraction optical unit(200) is focused in different positions and in a direction of an optical axis of the optical system to extend depth of focus, depending on a polarization component of illumination light(20).

Abstract translation: 目的：提供使用由双折射材料制成的透射型光学部件的用于光刻设备的光学系统的焦点深度的方法，以通过使图像位于图像的方向上延伸图像的范围 在不同的位置上，根据照明光的偏振分量，在光轴方向上具有规定的间隔。 构成：光学系统使用由双折射材料制成的透射型双折射光学部件（210）或由光学部件组成的双折射光学单元。 通过双折射光学单元（200）的图像被聚焦在光学系统的光轴的不同位置和方向上，以根据照明光（20）的偏振分量来延长焦深。

公开(公告)号：KR1020000065562A

公开(公告)日：2000-11-15

申请号：KR1019990011966

申请日：1999-04-07

Applicant: 한국전자통신연구원

Inventor： 이각현 ,  김도훈 ,  최상수 ,  정해빈 ,  조경익

IPC: G03F7/207

CPC classification number: G03F7/70191 ,  G02B17/08 ,  G02B27/0075 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/7085

Abstract: PURPOSE: A method for controlling an extension scope of a focus depth in an optical system using a double refraction material is provided to extend a depth of a focus by having an image of the optical system focused in different positions in an optical axis direction, and to control a position of the image by a simple manipulation of optical parts in the optical system. CONSTITUTION: In an optical system of an exposure equipment for forming a fine shape by focusing an image of an original mask on a photoresist layer applied on a substrate, parts forming the optical system is composed of penetrating optical parts made of a double refraction material or an optical unit composed of a combination of the penetrating optical parts. A depth of a focus is extended by having the image focused in different positions in an optical axis direction. And, the scope of the focus is controlled and maintained.

Abstract translation: 目的：提供一种用于控制使用双折射材料的光学系统中的聚焦深度的扩展范围的方法，以通过使光学系统的图像在光轴方向上聚焦在不同位置来延长焦点的深度，以及 以通过简单地操纵光学系统中的光学部件来控制图像的位置。 构成：在用于通过将原始掩模的图像聚焦在施加在基板上的光致抗蚀剂层上形成微细形状的曝光设备的光学系统中，形成光学系统的部件由穿透光学部件组成，由双折射材料制成， 由穿透光学部件的组合构成的光学单元。 通过使图像在光轴方向上聚焦在不同位置来扩大焦点的深度。 并且，重点的范围得到控制和维护。

公开(公告)号：KR1020000037779A

公开(公告)日：2000-07-05

申请号：KR1019980052528

申请日：1998-12-02

Applicant: 한국전자통신연구원

Inventor： 최상수 ,  차한선 ,  김종수 ,  이각현 ,  김도훈 ,  정해빈 ,  조경익

IPC: H01L21/027

Abstract: PURPOSE: A method for manufacturing a diaphragm for an exposure equipment is provided to maintain the resolution and improve the light transmitting degree. CONSTITUTION: A first resist pattern is formed in a selected area on a substrate. A first optical shielding material is formed on the substrate, which includes the first resist pattern. After the first resist pattern is removed, a second resist is formed on the structure. Then, the central portion of the second resist is removed. After a second optical shielding material is formed on the structure, the second resist is removed.

Abstract translation: 目的：提供一种用于制造用于曝光设备的隔膜的方法以保持分辨率并提高透光度。 构成：在衬底上的选定区域中形成第一抗蚀剂图案。 第一光屏蔽材料形成在包括第一抗蚀剂图案的基板上。 在去除第一抗蚀剂图案之后，在结构上形成第二抗蚀剂。 然后，除去第二抗蚀剂的中心部分。 在结构上形成第二光屏蔽材料之后，去除第二抗蚀剂。

公开(公告)号：KR1020000002824A

公开(公告)日：2000-01-15

申请号：KR1019980023758

申请日：1998-06-23

Applicant: 한국전자통신연구원

Inventor： 손영준 ,  김도훈 ,  정해빈 ,  박흥옥 ,  김보우

IPC: H01L21/027

Abstract: PURPOSE: A wafer or reticle aligning method is provided to align the wafer or the reticle in an exposing equipment by measuring the horizontal, vertical and revolving errors of the aligning mark. CONSTITUTION: The wafer or reticle aligning method comprises the steps of: marking the aligning marks more than two on the wafer or the reticle; dividing the wafer or the reticle into the two spaces and making each part of the aligning mark existed in each space having the different area or shape from each other; moving the relative position of the aligning ray; and aligning the relative position of the wafer or the reticle by using the time interval between the aligning signals and the relative intensity strength of the aligning signals.

Abstract translation: 目的：提供晶片或掩模版对准方法，通过测量对准标记的水平，垂直和旋转误差来将晶片或掩模版对准曝光设备。 构成：晶片或掩模版对准方法包括以下步骤：在晶片或掩模版上标记两个以上的对准标记; 将晶片或掩模版分成两个空间，并使对准标记的每个部分存在于彼此不同的区域或形状的每个空间中; 移动对准射线的相对位置; 并且通过使用对准信号之间的时间间隔和对准信号的相对强度强度来对准晶片或掩模版的相对位置。