公开(公告)号：NL2005118A

公开(公告)日：2011-02-22

申请号：NL2005118

申请日：2010-07-21

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  BANINE VADIM ,  HERPEN MAARTEN ,  YAKUNIN ANDREI ,  JAK MARTIN

IPC: G03F7/20 ,  G21K1/06

Abstract: A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation, A first region of the spectral purity filter has a first configuration that results in a first radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second, different configuration that results in a second, different radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength.

公开(公告)号：NL2006106A

公开(公告)日：2011-02-17

申请号：NL2006106

申请日：2011-01-31

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  BANINE VADIM ,  IVANOV VLADIMIR ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  KEMPEN ANTONIUS ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2004837A

公开(公告)日：2011-01-10

申请号：NL2004837

申请日：2010-06-07

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  IVANOV VLADIMIR ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  YAKUNIN ANDREI ,  GRAAF DENNIS ,  STAMM UWE

IPC: H05G2/00 ,  G03F7/20

Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.