公开(公告)号：WO0243937A3

公开(公告)日：2002-10-03

申请号：PCT/NL0100874

申请日：2001-12-03

Applicant: AQUAMARIJN HOLDING B V ,  VAN RIJN CORNELIS JOHANNES MAR ,  VOGELAAR LAURA ,  NIJDAM WIETZE ,  BARSEMA JONATHAN NATHANIEL ,  WESSLING MATTHIAS

Inventor： VAN RIJN CORNELIS JOHANNES MAR ,  VOGELAAR LAURA ,  NIJDAM WIETZE ,  BARSEMA JONATHAN NATHANIEL ,  WESSLING MATTHIAS

IPC: A61F2/04 ,  A61F2/06 ,  A61L27/50 ,  A61L27/56 ,  B01D67/00 ,  B01D69/00 ,  B01D69/08 ,  B01D69/12 ,  B01D71/02 ,  B01D71/64 ,  B01D71/68 ,  B01J19/00 ,  B01L3/00 ,  B01L3/02 ,  B29C33/00 ,  B29C41/08 ,  B29C41/38 ,  B29C67/02 ,  B81B1/00 ,  B81C1/00 ,  G01N27/447 ,  B01D29/01 ,  B01D69/06

CPC classification number: B01D67/0088 ,  A61F2/06 ,  A61F2002/044 ,  A61F2002/046 ,  A61L27/50 ,  A61L27/56 ,  B01D67/0009 ,  B01D67/0018 ,  B01D67/002 ,  B01D67/0069 ,  B01D67/0072 ,  B01D67/0093 ,  B01D69/00 ,  B01D69/02 ,  B01D69/08 ,  B01D69/12 ,  B01D71/02 ,  B01D71/64 ,  B01D71/68 ,  B01D2323/06 ,  B01D2323/08 ,  B01D2323/30 ,  B01D2325/022 ,  B01D2325/04 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00824 ,  B01J2219/00833 ,  B01J2219/00835 ,  B01J2219/00844 ,  B01J2219/0086 ,  B01J2219/00864 ,  B01J2219/00907 ,  B01L3/0241 ,  B01L3/5085 ,  B01L2200/12 ,  B01L2300/0819 ,  B29C33/0033 ,  B29C41/08 ,  B29C41/38 ,  B29C67/02 ,  B29K2105/0073 ,  B29L2031/737 ,  B81B2201/10 ,  B81C99/008 ,  B81C2201/0115 ,  B81C2201/034 ,  G01N27/44704 ,  H01L31/18 ,  Y10T428/24

Abstract: Using phase separation technique perforated as well as non-perforated polymeric structures can be made with high aspect ratios (>5). By varying the phase separation process the properties (e.g. porous, non-porous, dense, open skin) of the moulded product can be tuned. Applications are described in the field of micro fluidics (e.g. micro arrays, electrophoretic boards), optics, polymeric solar cells, ball grid arrays, and tissue engineering.

Abstract translation: 使用相分离技术穿孔以及非穿孔聚合物结构可以制成高纵横比（> 5）。 通过改变相分离方法，可以调节模制产品的性质（例如多孔，无孔，致密，开放的皮肤）。 应用在微流体学（例如微阵列，电泳板），光学，聚合物太阳能电池，球栅阵列和组织工程领域中描述。

公开(公告)号：WO2018013136A1

公开(公告)日：2018-01-18

申请号：PCT/US2016/042542

申请日：2016-07-15

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： CHEN, Chien-Hua ,  CUMBIE, Michael W. ,  MOUREY, Devin Alexander

IPC: G01N33/48 ,  B01D29/01 ,  B81B1/00

CPC classification number: B01L3/502753 ,  B01D29/01 ,  B01D29/012 ,  B01D29/03 ,  B01D29/56 ,  B01L3/502707 ,  B01L2200/0631 ,  B01L2300/0645 ,  B01L2300/0681 ,  B01L2300/0883 ,  B01L2300/0887 ,  B01L2400/0415 ,  B81B1/006 ,  B81B2201/10 ,  B81B2203/0338 ,  B81B2203/0353 ,  B81C1/00119 ,  B81C2201/0125 ,  B81C2201/013 ,  B81C2203/03

Abstract: A method may include etching a number of holes into a carrier wafer layer to form a plurality of filters in the carrier wafer layer, pattering a chamber layer over a first side of the carrier wafer layer to form chambers above each filter formed in the carrier wafer layer, forming a layer over the chamber layer, grinding a second side of the carrier wafer layer to expose the number of holes etched into the carrier wafer layer, and bonding a molded substrate to the carrier wafer layer opposite the chamber layer.

Abstract translation: 一种方法可以包括将多个孔蚀刻到载体晶圆层中以在载体晶圆层中形成多个滤波器，在载体晶圆层的第一侧上方形成腔体层以形成腔室 在形成于载体晶圆层中的每个滤波器上方，在腔体层上方形成层，研磨载体晶圆层的第二侧以暴露蚀刻到载体晶圆层中的多个孔，并且将模制衬底接合到载体晶圆层 与腔室层相对。

公开(公告)号：WO0136321A9

公开(公告)日：2002-07-04

申请号：PCT/US0031749

申请日：2000-11-17

Applicant: UNIV CALIFORNIA

Inventor： HANSFORD DEREK ,  FERRARI MAURO

IPC: B82B3/00 ,  B01D67/00 ,  B01D69/02 ,  B01D71/02 ,  B81B3/00 ,  B81C1/00 ,  B01D63/00 ,  B82B1/00

CPC classification number: B81C1/00158 ,  B01D67/0058 ,  B01D67/0062 ,  B01D67/0072 ,  B01D69/02 ,  B01D71/02 ,  B01D71/022 ,  B01D2325/02 ,  B01D2325/04 ,  B01D2325/08 ,  B81B2201/06 ,  B81B2201/10 ,  B81C2201/0109 ,  B81C2201/014 ,  B81C2201/053

Abstract: A method of forming a membrane with nanometer scale pores includes forming a sacrificial etch stop layer on a substrate. A base layer is constructed on the sacrificial etch stop layer. Micrometer scale pores are formed within the base layer. A sacrificial base layer is built on the base layer. The sacrificial base layer is removed from selected regions of the base layer to define nanometer scale pores within the base layer. The resultant membrane has sub-fifty nanometer pores formed within it.

Abstract translation: 形成具有纳米尺度孔隙的膜的方法包括在基底上形成牺牲蚀刻停止层。 在牺牲蚀刻停止层上构建基层。 在基层内形成微米级的孔。 牺牲基层建在基层上。 牺牲基层从基层的选定区域去除，以在基层内限定纳米尺度的孔。 所得的膜在其内形成有小于50纳米的孔。

公开(公告)号：WO1996040420A1

公开(公告)日：1996-12-19

申请号：PCT/US1996007417

申请日：1996-05-21

Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA

Inventor： THE REGENTS OF THE UNIVERSITY OF CALIFORNIA ,  CHU, Wen-Hua ,  FERRARI, Mauro

IPC: B01D67/00

CPC classification number: A61K9/0097 ,  A61K9/0024 ,  B01D39/1692 ,  B01D39/20 ,  B01D67/003 ,  B01D67/0034 ,  B01D67/0058 ,  B01D67/0062 ,  B01D67/0072 ,  B01D69/02 ,  B01D69/12 ,  B01D71/02 ,  B01D2325/04 ,  B01J13/02 ,  B81B3/007 ,  B81B2201/10 ,  B81C1/00087 ,  B81C2201/014 ,  C04B41/4582 ,  C23C16/01 ,  G03F7/00 ,  G03F7/0015

Abstract: Surface micromachining and bulk micromachining are employed for realizing a porous membrane (102A) with a bulk substrate (106) to form a particle filter (100). The filter (100) is sufficiently sturdy to allow for easy handling. It may be used as a diffusion barrier and under high pressures. A disclosed etching fabrication method is simple, reliable, and integrated-circuit compatible, and thus amenable to mass production. Electronic circuitry may be integrated on the surface of filter (100), as may be desired for several purposes, such as fluid characterization, capsule formation, or self-cleaning or charging of the surface of filter (100).

Abstract translation: 表面微加工和体微加工用于实现具有块状基底（106）的多孔膜（102A）以形成颗粒过滤器（100）。 过滤器（100）足够坚固以便于处理。 它可以用作扩散屏障并在高压下使用。 所公开的蚀刻制造方法是简单，可靠和集成电路兼容的，因此可以批量生产。 电子电路可以集成在过滤器（100）的表面上，如可能需要多种目的，例如流体表征，胶囊形成或过滤器（100）的表面的自清洁或充电。

公开(公告)号：EP2046490B1

公开(公告)日：2015-04-01

申请号：EP07728798.5

申请日：2007-05-04

Applicant: Robert Bosch GmbH

Inventor： FUCHS, Tino ,  LEINENBACH, Christina

IPC: B01D67/00 ,  B81C1/00 ,  B01D71/02 ,  B01D61/24

CPC classification number: B81C1/0069 ,  B01D61/243 ,  B01D67/003 ,  B01D67/0058 ,  B01D71/02 ,  B01D2323/35 ,  B01D2325/028 ,  B01D2325/08 ,  B01D2325/26 ,  B81B2201/10 ,  B81C2201/0115 ,  Y10T428/24893

公开(公告)号：EP2031425A1

公开(公告)日：2009-03-04

申请号：EP08169323.6

申请日：2003-02-12

Applicant: OC Oerlikon Balzers AG

Inventor： Edlinger, Johannes ,  Heine-Kempkens, Claus ,  Zueger, Othmar

IPC: G02B5/18 ,  G02B5/30 ,  C03B37/012 ,  B01L3/00 ,  B01D21/00

CPC classification number: G02B1/118 ,  B01D21/0012 ,  B01D39/2051 ,  B01L3/502707 ,  B01L3/50273 ,  B01L3/502753 ,  B01L3/502761 ,  B01L3/502792 ,  B01L2200/0647 ,  B01L2200/0668 ,  B01L2200/141 ,  B01L2300/0681 ,  B01L2300/0816 ,  B01L2300/0825 ,  B01L2300/16 ,  B01L2400/0406 ,  B01L2400/0409 ,  B01L2400/086 ,  B81B1/002 ,  B81B2201/047 ,  B81B2201/10 ,  B81B2203/0338 ,  B81C1/00119 ,  C23C14/04 ,  C23C14/046 ,  G02B5/1809 ,  G02B5/1847 ,  G02B5/3058 ,  G02B5/3083 ,  G02B2006/12097 ,  Y10S428/913 ,  Y10T428/24612 ,  Y10T428/24942 ,  Y10T428/249953 ,  Y10T428/249961 ,  Y10T428/249975 ,  Y10T428/249977 ,  Y10T428/249979 ,  Y10T428/24998 ,  Y10T428/31678 ,  Y10T436/111666 ,  Y10T436/112499 ,  Y10T436/25375 ,  Y10T436/255

Abstract: An optical component forming a wire grid polarizer comprising:
a substrate and
microchannels formed by side walls of adjacent
microstructures on the substrate, the microchannels being filled with air, the microstructures being covered by a coating and the coating nearly or completely closing the microchannels to substantially separate the microchannels from the environment of the component.
A method for producing such an optical component comprises the steps of:
providing a substrate,
providing microstructures on the substrate, wherein side walls of the microstructures form microchannels; and coating the microstructures thereby nearly or completely closing the microchannels to substantially separate the microchannels from the environment of the component.

Abstract translation: 一种形成线栅偏振器的光学元件，包括：衬底和由衬底上的相邻微结构的侧壁形成的微通道，微通道充满空气，微结构由涂层覆盖，涂层几乎或完全闭合微通道至基本上 将微通道与组件的环境分开。 制造这种光学部件的方法包括以下步骤：提供基板，在基板上提供微结构，其中微结构的侧壁形成微通道; 并且涂覆微结构从而几乎或完全关闭微通道，从而使微通道与组件的环境基本上分开。

公开(公告)号：EP1608590A1

公开(公告)日：2005-12-28

申请号：EP04722478.7

申请日：2004-03-22

Applicant: Technische Universiteit Delft

Inventor： VENSTRA, Warner, Jurrien

IPC: B81C1/00 ,  B81B3/00

CPC classification number: B81C1/0015 ,  B81B2201/10 ,  B81B2201/12 ,  B81B2203/019 ,  B81C1/00158 ,  B81C2201/0132

Abstract: The invention relates to a method for the fabrication of a membrane oriented in a (111) plane of a (100) silicon wafer. To this end the method comprises the following steps: applying a mask to both sides of the wafer, wherein portions of the sides are covered by the mask; and the at least partial removal by etching away silicon material from the portions of the two sides of the wafer that are not covered. This method is characterised in that the etching step substantially removes the silicon material forming recesses in the two surfaces of the wafer, such that the walls of the recesses are formed by (111) planes, and in that not covered portions at both sides of the wafer are aligned in relation to one another such that a (111) plane is formed and the distance d between said two planes is less than the thickness of the silicon wafer, so as to form a membrane in the (111) plane having a thickness d. Such a membrane has many application possibilities in the field of MEMS, for example by dividing the membrane into individual cantilevers.

公开(公告)号：EP1341655A2

公开(公告)日：2003-09-10

申请号：EP01998434.3

申请日：2001-12-03

Applicant: Aquamarijn Holding BV

Inventor： VAN RIJN, Cornelis, Johannes, Maria ,  VOGELAAR, Laura ,  NIJDAM, Wietze ,  BARSEMA, Jonathan, Nathaniel ,  WESSLING, Matthias

IPC: B29C33/00 ,  B01D67/00 ,  B01D69/06 ,  B01D29/01 ,  B29C41/38 ,  B29C67/02

CPC classification number: B01D67/0088 ,  A61F2/06 ,  A61F2002/044 ,  A61F2002/046 ,  A61L27/50 ,  A61L27/56 ,  B01D67/0009 ,  B01D67/0018 ,  B01D67/002 ,  B01D67/0069 ,  B01D67/0072 ,  B01D67/0093 ,  B01D69/00 ,  B01D69/02 ,  B01D69/08 ,  B01D69/12 ,  B01D71/02 ,  B01D71/64 ,  B01D71/68 ,  B01D2323/06 ,  B01D2323/08 ,  B01D2323/30 ,  B01D2325/022 ,  B01D2325/04 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00824 ,  B01J2219/00833 ,  B01J2219/00835 ,  B01J2219/00844 ,  B01J2219/0086 ,  B01J2219/00864 ,  B01J2219/00907 ,  B01L3/0241 ,  B01L3/5085 ,  B01L2200/12 ,  B01L2300/0819 ,  B29C33/0033 ,  B29C41/08 ,  B29C41/38 ,  B29C67/02 ,  B29K2105/0073 ,  B29L2031/737 ,  B81B2201/10 ,  B81C99/008 ,  B81C2201/0115 ,  B81C2201/034 ,  G01N27/44704 ,  H01L31/18 ,  Y10T428/24

Abstract: Using phase separation technique perforated as well as non-perforated polymeric structures can be made with high aspect ratios (>5). By varying the phase separation process the properties (e.g. porous, non-porous, dense, open skin) of the moulded product can be tuned. Applications are described in the field of micro fluidics (e.g. micro arrays, electrophoretic boards), optics, polymeric solar cells, ball grid arrays, and tissue engineering.

公开(公告)号：KR1020150031244A

公开(公告)日：2015-03-23

申请号：KR1020147036187

申请日：2013-06-28

Applicant: 인텔 아이피 코포레이션

Inventor： 오프너제랄드 ,  메이어토르스텐

IPC: B81C1/00 ,  B81B7/02 ,  H01L25/18

CPC classification number: B81C1/00238 ,  B81B7/008 ,  B81B2201/0235 ,  B81B2201/0242 ,  B81B2201/025 ,  B81B2201/0257 ,  B81B2201/0264 ,  B81B2201/0271 ,  B81B2201/10 ,  B81B2207/012 ,  B81B2207/053 ,  B81B2207/07 ,  B81B2207/096 ,  B81C1/0023 ,  B81C2203/0792 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2924/15311 ,  H01L2924/00014 ,  B81B7/02 ,  H01L25/18 ,  H01L2924/1461

Abstract: 실시예들에서, 패키지 어셈블리는 활성면 및 비활성면을 구비하는 마이크로 전자기계 시스템(MEMS) 및 주문형 집적 회로(ASIC)를 포함할 수 있다. 실시예들에서, MEMS는 하나 이상의 인터커넥트를 거쳐 ASIC에 직접 연결될 수 있다. MEMS, ASIC, 및 하나 이상의 인터커넥트는 캐비티를 정의하거나 형성함으로써 MEMS의 활성면 일부가 캐비티 내에 존재한다. 일부 실시예들에서, 패키지 어셈블리는 복수의 하나 이상의 인터커넥트를 거쳐 ASIC에 직접 연결된 복수의 MEMS를 포함할 수 있다. 다른 실시예들이 설명되고/되거나 특허청구될 수 있다.

公开(公告)号：JP2007091752A

公开(公告)日：2007-04-12

申请号：JP2006323954

申请日：2006-11-30

Applicant: Univ California ,  ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア

Inventor： CHU WEN-HUA ,  FERRARI MAURO

IPC: A61K9/48 ,  A61F2/02 ,  A61K9/00 ,  A61K9/50 ,  A61K35/12 ,  A61K35/39 ,  A61K47/04 ,  B01D39/16 ,  B01D39/20 ,  B01D67/00 ,  B01D69/02 ,  B01D69/10 ,  B01D69/12 ,  B01D71/02 ,  B01J13/00 ,  B01J13/02 ,  B81B1/00 ,  B81C1/00 ,  C04B41/45 ,  C23C16/01 ,  G03F7/00 ,  H01L21/205 ,  H01L21/302 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/31

CPC classification number: A61K9/0097 ,  A61K9/0024 ,  B01D39/1692 ,  B01D39/20 ,  B01D67/003 ,  B01D67/0034 ,  B01D67/0058 ,  B01D67/0062 ,  B01D67/0072 ,  B01D69/02 ,  B01D69/12 ,  B01D71/02 ,  B01D2325/04 ,  B01J13/02 ,  B81B3/007 ,  B81B2201/10 ,  B81C1/00087 ,  B81C2201/014 ,  C04B41/4582 ,  C23C16/01 ,  G03F7/00 ,  G03F7/0015

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing biologically-active molecules on a host organism. SOLUTION: The method comprises a. biologically compatible encapsulating capsules comprising bulk parts and pores, the pores permit dispersion of biologically-active molecules produced from cells, tissues or pharmaceutical compositions in the capsule in a biologically suitable rate while blocking the passage of immunological molecule outside of the encapsulating capsules, b. filling cells, tissues, or the pharmaceutical compositions which produce the biologically active molecules in the capsules, and c. administering the cells, tissues, or pharmaceutical compositions contained in the capsule to the host organism. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 待解决的问题：提供在宿主生物体上生产生物活性分子的方法。 解决方案：该方法包括a。 b。包含本体部分和孔的生物相容的包封胶囊，所述孔允许以细菌，组织或药物组合物从细胞，组织或药物组合物产生的生物活性分子以生物合适的速率分散，同时阻止免疫分子通过包封胶囊外部。 组织或在胶囊中产生生物活性分子的药物组合物，c。 将包含在胶囊中的细胞，组织或药物组合物施用于宿主生物体。 版权所有（C）2007，JPO＆INPIT