公开(公告)号：EP0445651B1

公开(公告)日：1996-07-10

申请号：EP91102968.4

申请日：1991-02-27

Applicant: TENCOR INSTRUMENTS

Inventor： Malin, Cosmas ,  Sawatzki, Harry

IPC: H01L21/00

CPC classification number: H01L21/68707 ,  Y10S414/141

公开(公告)号：EP0673498A1

公开(公告)日：1995-09-27

申请号：EP93922797.0

申请日：1993-09-30

Applicant: TENCOR INSTRUMENTS

Inventor： WHEELER, William, R.

IPC: G01B21 ,  G01B7

CPC classification number: G01B7/34

Abstract: A stylus profilometer having a counterbalanced stylus with a motion transducer using a vane (41) moving between parallel, spaced-apart, conductive plates (35 and 37) which damp the motion of the vane by means of trapped air. The vane forms an electrode with the plates so that the combination is a pair of capacitors in a balanced bridge arrangement. Motion of the stylus causes an unbalance of the bridge indicative of the extent of stylus motion. A lever arm (59) associated with the stylus has a tip (57) influenced by a magnetic field which biases the stylus or controls force on a surface to be measured. The entire assembly has a very low moment of inertia to reduce the effects of vibration on the stylus and thereby increase resolution of the device and reduce damage to the substrate.

Abstract translation: 一种具有带有运动传感器的平衡触针的触针表面轮廓仪，该触针使用在平行的，间隔开的导电板（35和37）之间移动的叶片（41），所述导电板借助于捕获的空气阻尼叶片的运动。 叶片与平板形成一个电极，因此该组合是平衡桥布置中的一对电容器。 手写笔的运动导致桥梁的不平衡，指示手写笔运动的程度。 与触针相关联的杠杆臂（59）具有受磁场影响的尖端（57），所述磁场偏置触针或控制待测表面上的力。 整个组件具有非常低的惯性矩，以减小振动对触针的影响，从而提高设备的分辨率并减少对基板的损坏。

公开(公告)号：EP0624787B1

公开(公告)日：2002-11-27

申请号：EP94104137.8

申请日：1994-03-17

Applicant: TENCOR INSTRUMENTS

Inventor： Marxer,Norbert

IPC: G01N21/88

CPC classification number: G01N21/9501

公开(公告)号：EP0979398A1

公开(公告)日：2000-02-16

申请号：EP97929786.8

申请日：1997-06-03

Applicant: Tencor Instruments

Inventor： LESLIE, Brian, C. ,  NIKOONAHAD, Mehrdad ,  WELLS, Keith, B.

IPC: G01N21/00 ,  G01N21/88

CPC classification number: G01N21/95607 ,  G01N21/94 ,  G01N21/9501

Abstract: In an optical scanning system (200) for detecting particles and pattern defects on a sample surface (240), a light beam (238) is focused to an illuminated spot on the surface and the spot is scanned across a scan line. A detector (11b) is positioned adjacent to the surface to collect scattered light from the spot where the detector includes a one- or two-dimensional array of sensors. Light scattered from the illuminated spot at each of a plurality of positions along the scan line is focused onto a corresponding sensor in the array. A plurality of detectors symmetrically placed with respect to the illuminating beam detect laterally and forward scattered light from the spot.

公开(公告)号：EP0804722A4

公开(公告)日：1999-03-24

申请号：EP95943798

申请日：1995-12-08

Applicant: TENCOR INSTRUMENTS

Inventor： JORDON JOHN R III ,  NIKOONAHAD MEHRDAD ,  WELLS KEITH B

IPC: G01B11/30 ,  G01B11/02 ,  G01N21/88 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G01R31/28 ,  G01R31/308 ,  G06T1/00 ,  G06T7/00 ,  H01L21/66 ,  G01N21/00

CPC classification number: G01N21/95623 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8825 ,  G01R31/2831 ,  G01R31/308 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A high throughput surface inspection system with enhanced detection sensitivity is described. The acquired data is processed in real time at a high rate of below 50 MHZ thereby reducing the cost for data processing. Anomalies are detected and verified by comparing adjacent repeating patterns and the height of the surface (40) is monitored and corrected dynamically to reduce misregistration errors between adjacent repeating patterns. Local thresholds employing neighborhood information are used for detecting and verifying the presence of anomalies. The sampled point spread function of the combined illumination (22) and collection system (90, 92, 111b) is exploited for anomaly detection and verification.

公开(公告)号：EP0870188A1

公开(公告)日：1998-10-14

申请号：EP95916391.0

申请日：1995-04-13

Applicant: Tencor Instruments

Inventor： NIKOONAHAD, Mehrdad

IPC: G01B11 ,  G01N21 ,  G02B26 ,  G02F1 ,  G03F7 ,  H01L21

CPC classification number: G03F7/70641 ,  G01N21/95623 ,  G02F1/113

Abstract: An apparatus for both deflecting a beam of light illuminating a spot on a surface and varying the size of the spot, electronically, without changing any system components. The apparatus includes an acousto-optic deflector (10) driven with a linear FM signal produced by a chirp signal generator (16). The linear FM signal is characterized with a dispersion rate, and the chirp signal generator includes a chirp dispersion selector to vary the dispension rate. A beam of collimated light (13) passes through the acousto-optic deflector (10) and appropriate focusing optics (14, 15) image the beam onto a spot in a nominal focal plane (17). The chirp dispension selector (17) sets the dispension rate in accord to a nominal rate, resulting in the beam illuminating a spot (18) in the focal plane (17). Generally, the focal plane coincides with a wafer surface (24), of the type having periodic (27b) and non-periodic (27c) features on it.

公开(公告)号：EP0804722A1

公开(公告)日：1997-11-05

申请号：EP95943798.0

申请日：1995-12-08

Applicant: Tencor Instruments

Inventor： JORDON, John, R., III ,  NIKOONAHAD, Mehrdad ,  WELLS, Keith, B.

IPC: G01B11 ,  G01N21 ,  G01R31 ,  G06T1 ,  G06T7 ,  H01L21

CPC classification number: G01N21/95623 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8825 ,  G01R31/2831 ,  G01R31/308 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A high throughput surface inspection system with enhanced detection sensitivity is described. The acquired data is processed in real time at a high rate of below 50 MHZ thereby reducing the cost for data processing. Anomalies are detected and verified by comparing adjacent repeating patterns and the height of the surface (40) is monitored and corrected dynamically to reduce misregistration errors between adjacent repeating patterns. Local thresholds employing neighborhood information are used for detecting and verifying the presence of anomalies. The sampled point spread function of the combined illumination (22) and collection system (90, 92, 111b) is exploited for anomaly detection and verification.

Abstract translation: 一种用于检测表面（40）上的异常（例如颗粒或图案缺陷）的光学系统，包括：光学器件（22,26,34,36），其布置成提供以倾斜角照射表面的辐射束（38） ; 至少两个检测器（110a，110b，111a，111b）; 布置成收集从表面散射的辐射的至少两个光学元件（110a，110b，111a，111b），每个光学元件布置成将所收集的散射辐射引导到相应的一个检测器，使得检测器提供输出信号 响应于此，其中光学元件被定位成使得每个检测器感测从表面沿不同方向散射的辐射; 一种装置，包括使所述梁和所述表面之间相对运动的移动台（124）; 以及处理器（200）处理来自所述检测器输出信号的信息，所述信号涉及从所述检测器的不同方向从所述表面的不同部分散射的辐射，并且被布置为识别异常; 所述装置还包括声光偏转器（30），使得每个移动台和声光偏转器引起光束和表面之间的相对运动，使得光束扫描覆盖基本上整个表面的扫描路径，所述扫描路径 所述扫描路径段包括扫描路径段（50,50'，50“，50”）的多个阵列，其中所述扫描路径段中的至少一些具有比所述表面（40）的尺寸短的跨度，并且因此 使光束照射表面的不同部分，并且使得检测器响应于由光束照射的表面的不同部分的辐射而提供输出信号。

公开(公告)号：EP0742895A4

公开(公告)日：1999-09-29

申请号：EP95942393

申请日：1995-11-03

Applicant: TENCOR INSTRUMENTS

Inventor： GROSS KENNETH P

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/8806

Abstract: An apparatus and method for inspecting a substrate (14), such as a semiconductor wafer, includes crossed cylindrical optical elements (44) that form an elliptical beam (40) that is caused to scan in parallel fashion at an oblique angle to the substrate (14). Preferably, the smaller dimension of the elliptical beam (40) is perpendicular to the direction of the scan of the beam across the wafer. A reflector (38) converts an angularly varying beam to a telecentrically scanning beam and also provides focusing only in the direction parallel to the telecentric scan.

公开(公告)号：EP0797763A1

公开(公告)日：1997-10-01

申请号：EP95943768.0

申请日：1995-12-08

Applicant: Tencor Instruments

Inventor： NIKOONAHAD, Mehrdad ,  STOKOWSKI, Stanley, E.

IPC: G01B11 ,  G01N21 ,  G01R31 ,  G06T1 ,  G06T7 ,  H01L21

CPC classification number: G01N21/95623 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8825 ,  G01R31/2831 ,  G01R31/308 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A high sensitivity and high throughput surface inspection system directs a focused beam of light (38) at a grazing angle towards the surface to be inspected (40). Relative motion is caused between the beam (38) and the surface (40) so that the beam (38) scans a scan path covering substantially the entire surface and light scattered along the path is collected for detecting anomalies. The scan path comprises a plurality of arrays of straight scan path segments. The focused beam of light (38) illuminates an area of the surface between 5-15 microns in width and this system is capable of inspecting in excess of about 40 wafers per hour for 150 millimeter diameter wafers (6-inch wafers), in excess of about 20 wafers per hour for 200 millimeter diameter wafers (8-inch wafers) and in excess of about 10 wafers per hour for 300 millimeter diameter wafers (12-inch wafers).

公开(公告)号：EP0790482A1

公开(公告)日：1997-08-20

申请号：EP97300808.9

申请日：1997-02-07

Applicant: Tencor Instruments

Inventor： Samsavar, Amin ,  Wheeler, William R. ,  Eaton, Steven G. ,  Zhuang, Jian-Ping

IPC: G01B7/34 ,  G01N27/00

CPC classification number: G01Q10/04 ,  G01B3/008 ,  G01B7/34 ,  G01Q10/02 ,  G01Q30/02 ,  G01Q70/06 ,  Y10S977/834 ,  Y10S977/849 ,  Y10S977/852 ,  Y10S977/867 ,  Y10S977/868 ,  Y10S977/872 ,  Y10S977/874

Abstract: A dual stage scanning instrument includes a sensor 60 for sensing a parameter of a sample 90 and coarse and fine stage 70,80 for causing relative motion between the sensor 60 and the sample 90. The coarse stage 80 has a resolution of about 1 micrometer and the fine stage 70 has a resolution of 1 nanometer or better. The sensor 60 is used to sense the parameter when both stages cause relative motion between the sensor assembly 60 and the sample 80. The sensor 60 may be used to sense height variations of the sample surface as well as thermal variations, electrostatic, magnetic, light reflectivity or light transmission parameters at the same time when height variation is sensed. By performing a long scan at a coarser resolution and short scans at high resolution using the same probe tips at fixed relative positions, data obtained from the long and short scans can be correlated accurately.

Abstract translation: 双级扫描仪器包括用于感测样品90的参数的传感器60以及用于引起传感器60和样品90之间的相对运动的粗细级70,80和粗级70,80。粗级80具有约1微米的分辨率， 细级70具有1纳米或更好的分辨率。 传感器60用于在两个阶段引起传感器组件60和样本80之间的相对运动时感测参数。传感器60可用于感测样品表面的高度变化以及热变化，静电，磁性，光线 同时检测高度变化时的反射率或光透射参数。 通过使用相同的探针尖端在固定的相对位置以较粗分辨率和高分辨率的短扫描进行长扫描，可以准确地相关联从长扫描和短扫描获得的数据。