Charged particle beam apparatus
    72.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号:US20080272300A1

    公开(公告)日:2008-11-06

    申请号:US12155347

    申请日:2008-06-03

    Abstract: When conditions for an electron gun mainly represented by extraction voltage V1 and accelerating voltage V0 are changed, a charged particle beam is once focused on a fixed position by means of a condenser lens and a virtual cathode position is calculated from a lens excitation of the condenser lens at that time and the mechanical positional relation of the electron gun to set an optical condition. For more accurate setting of the optical condition, a deflecting electrode device is provided at a crossover position of the condenser lens and a voltage is applied to the deflecting electrode device at a constant period so as to control the lens excitation of the condenser lens such that the amount of movement of an image is minimized on an image display unit such as CRT.

    Abstract translation: 当主要由提取电压V 1和加速电压V 0表示的电子枪的条件改变时,通过聚光透镜将带电粒子束一次聚焦在固定位置,并且从透镜激发计算虚拟阴极位置 此时的聚光透镜和电子枪的机械位置关系来设定光学条件。 为了更精确地设置光学条件,在聚光透镜的交叉位置处设置偏转电极装置,并且将电压以恒定周期施加到偏转电极装置,以便控制聚光透镜的透镜激发,使得 在诸如CRT的图像显示单元上图像的移动量​​最小化。

    Charged particle energy filter
    73.
    发明授权
    Charged particle energy filter 有权
    带电粒子能量过滤器

    公开(公告)号:EP2592642B1

    公开(公告)日:2018-04-11

    申请号:EP12191522.7

    申请日:2012-11-07

    Applicant: FEI COMPANY

    Abstract: A multi-element electrostatic chicane energy filter (300) , with the addition of electrostatic quadrupole and hexapole excitations to the dipole elements (302, 304, 306, 308). A charged particle energy filter according to the present invention with a combination of dipole, quadrupole, and hexapole elements capable of producing a line focus at an aperture (310) reduces space-charge effects and aperture damage. A preferred embodiment allows the filter to act as a conjugate blanking system. The energy filter is capable of narrowing the energy spread to result in a smaller beam.

    Automated ion beam idle
    74.
    发明公开
    Automated ion beam idle 审中-公开
    自动化离子束空闲

    公开(公告)号:EP2645402A3

    公开(公告)日:2015-03-25

    申请号:EP13161508.0

    申请日:2013-03-28

    Applicant: FEI Company

    Abstract: An improved method and apparatus for shutting down and restoring an ion beam in an ion beam system. Preferred embodiments provide a system for improved power control of a focused ion beam source, which utilizes an automatic detection of when a charged particle beam system is idle (the beam itself is not in use) and then automatically reducing the beam current to a degree where little or no ion milling occurs at any aperture plane in the ion column. Preferred embodiments include a controller operable to modify voltage to an extractor electrode and/or to reduce voltage to a source electrode when idle state of an ion source of the charged particle beam system is detected.

    Scanning microscope
    79.
    发明公开
    Scanning microscope 失效
    Rastermikroskop

    公开(公告)号:EP0811999A3

    公开(公告)日:2004-02-25

    申请号:EP97108821.6

    申请日:1997-06-02

    Applicant: Hitachi, Ltd.

    CPC classification number: H01J37/28 G02B21/002 H01J2237/043 H01J2237/22

    Abstract: A scanned image to be observed or to be recorded is formed by N two-dimensional scanning cycles of an irradiating charged particle or light beam. In order to adjust the averaged irradiation intensity of the sample, the irradiating beam can be blanked during some of the N cycles.

    Abstract translation: 通过照射带电粒子或光束的N个二维扫描周期形成待观察或待记录的扫描图像。 为了调整样品的平均照射强度,可以在N个周期的一些期间消除照射光束。

    METHOD AND APPARATUS FOR SPOT SHAPING AND BLANKING A FOCUSED BEAM
    80.
    发明授权
    METHOD AND APPARATUS FOR SPOT SHAPING AND BLANKING A FOCUSED BEAM 失效
    点阵形状和聚光束的方法和装置

    公开(公告)号:EP0211002B1

    公开(公告)日:1990-12-27

    申请号:EP86900374.9

    申请日:1985-11-25

    Inventor: KNAUER, Wolfgang

    Abstract: Charged particle source (14) delivers beam (20) which is collimated onto first aperture plate having first aperture (28). The beam passing therethrough is deflected by deflection plates (32, 34, 38 and 40) with respect to second aperture (46) in second aperture plate (44). The image (50) of the second aperture (46) is focused on the target plane (16) and the virtual image of the footprint (58) of the deflected beam is focused on the target plane (16). When these images overlap, a shaped beam (56) passes through. Scanning of the beam across the target plane by deflection plates (52 and 54) permits exposure of sharp-edged features (62) by positioning the image (60a) inside the margin (64) and then scanning the image (50b) thereacross to expose the sharp edge and thereupon picking up the image (60) so that they both scan across the feature to be exposed.

Patent Agency Ranking