公开(公告)号：JPH0437A

公开(公告)日：1992-01-06

申请号：JP9493890

申请日：1990-04-12

Applicant: CANON KK

Inventor： CHINJU HIDEYUKI ,  IWAMOTO KAZUNORI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: F16F15/04 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To improve positioning and reset repeatability in the horizontal direction in an air spring to be applied to an X-ray exposure device by providing a restoring means for returning a center shaft of a load supporting part of a spring main frame in the load supporting direction to a predetermined center position in a flat surface transverse to that center shaft. CONSTITUTION:An air spring main frame 2 is loaded on a base plate 1, and a frame member 5 is fixed. A bearing 4 is installed to a load supporting shaft 3 provided in the upper of the spring main frame 2 freely to slide, and each one end of three coil springs 7 is fitted radially in the periphery thereof, and the other ends are fitted to the frame member 5 through vibration-proof rubbers 8. This vibration-proof rubbers 8, of which natural frequency is at least less than 30Hz and a low frequency at about 2Hz is desirable, prevent the transmission of the vibration, of which frequency is higher than the natural frequency, from the outside to the load side through the base plate 1 and the frame member 5. Consequently, the shaft 3 for supporting a load can move freely in the horizontal direction transverse to the vertical direction, and in the case that dislocation is generated in the horizontal surface, the shaft 3 is always returned to the original center position forcedly by the work of the coil springs 7.

公开(公告)号：JPH03290918A

公开(公告)日：1991-12-20

申请号：JP9201790

申请日：1990-04-09

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  MIYAJI GOJI ,  FUKUDA YOSHIAKI ,  CHIBA YUJI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: G03F1/22 ,  G03F1/60 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce and remove distortion of a mask substrate and a supporting frame and obtain highly accurate and highly reliable pattern exposure transfer by forming a slit-like groove in the vicinity of adhesive agent which joins the mask substrate to the supporting frame. CONSTITUTION:A slit-like stress buffering groove 7 is formed on a side of a supporting frame in the vicinity of adhesive agent a which joins a mask substrate 2 to the supporting frame 1. The stress buffering groove 7 is formed in a circle wherein portions 11 applied with the adhesive agent are provided on eight points. There are adhesive agent 3 for fixing the mask substrate on the supporting frame. As a result, influence of thermal stress due to the adhesive agent and stress at the time of shrinking can be reduced.

公开(公告)号：JPH03262114A

公开(公告)日：1991-11-21

申请号：JP5990590

申请日：1990-03-13

Applicant: CANON KK

Inventor： IWAMOTO KAZUNORI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  G21K5/00 ,  H01L21/027 ,  H01L21/30 ,  H05H13/04

Abstract: PURPOSE:To make it possible to improve the accuracy of transfer by a method wherein an radioactive-resistant optical system, with which the focus is placed on the side of exposure atmosphere by condensing the parallel ray components of a visible light, is provided and also an optical detection element to be used to detect the visible light is provided in the exposure atmosphere. CONSTITUTION:An X-ray resisting glass filter 304 which transmits the longer wavelength part than the visible light in a SOR beam 18, a visible light optical system 305 with which the parallel rays of the visible light transmitted through a filter are condensed and focussed, and a two-dimensional area sensor 306, which is the optical detection element to be used to detect the condensed visible light, are provided. When the incidence angle of the SOR beam 18 against the mask 307 of the SOR beam 18 and a wafer 308 is changed to 18' as shown on the diagram, the position of the light spot to be condensed by a lens 305 moves to 501' from 501. The deviations of incidence angle omegaX, and omegaY are computed by a computing device 310 based on the light spot positional signal on the deviation signal sent from a two-dimensional area sensor 306, and the signal showing the amount of driving of each actuator 27 is outputted to an actuator driver 311. As a result, each of actuators 27, 31 and 36 is driven, and the posture of an exposure device main body 20 is controlled so as to bring the incidence angle deviation omegaX and omegaY to zero.

公开(公告)号：JPH03262113A

公开(公告)日：1991-11-21

申请号：JP5990490

申请日：1990-03-13

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  KUROSAWA HIROSHI ,  UDA KOJI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce the error in quality of exposure, and to improve the preciseness of transfer by a method wherein the position of shade against the edge position in two different points respectively is detected using an illumination distribution measuring device, and the coordinate system, with which an illumination detector is aligned when illumination distribution is measured, is converted to the coordinate system of a driving table which controls edge position. CONSTITUTION:By driving a Y-state 122 in the state wherein two shutter units 106 and 107 are opened, the profile of X-ray intensity is measured by scanning an X-ray detector 161 in Y-direction in the region of exposure. The measurement of the X-ray intensity profile is conducted based on the coordinate system (the coordinate system of wafer stage) of the X-ray detector 161, and the corrective driving of the shutters is conducted based on a shutter driving coordinate system (the coordinate system of driving table), and a driving table, which indicates the time of passage of the position Y of edge in the wafer stage coordinate, is formed. Besides, the relative relation between the wafer stage coordinate system and the shutter driving coordinate system is detected, and the positional coordinate of edge is converted from the coordinate value of the wafer stage coordinate system to the coordinate value of the shutter driving coordinate system.

公开(公告)号：JPH03259508A

公开(公告)日：1991-11-19

申请号：JP5667490

申请日：1990-03-09

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  KUROSAWA HIROSHI ,  UDA KOJI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce the exposure amount error caused by rotary deviation around an exposure light axis and overlapping error, and improve transfer precision, by installing an exposure amount correcting means, an illuminance distribution measuring means, an operating means, and a parallelism constituting means. CONSTITUTION:Shutter units 106, 107 are turned into an open state; an X-ray detector 161 is scanned; the illuminance distribution of a part or the whole part of an exposure picture angle is measured; lines of constant illuminance (equi-illuminance lines) are obtained from the measured data. A motor 152 for a main shutter is driven, and a main shutter belt is interrupted at a position where a part of the exposure picture angle is obstructed. The inclination of shadow of an edge is measured at two different points with a detector 161. Whether the inclination of the edge with respect to the equi-illuminance lines is in a specified range is judged from the measured data. When the inclination is not in the range, driving amount of each of the actuators 176-178 necessary to obtain parallelism between the equi-illuminance lines and the edge is calculated, and the processing is repeated by driving each actuator. Thereby a resist pattern of uniform line width free from exposure amount irregularity can be obtained.

公开(公告)号：JPH03122477A

公开(公告)日：1991-05-24

申请号：JP25884489

申请日：1989-10-05

Applicant: CANON KK

Inventor： CHIBA YUJI ,  MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  SAKAMOTO EIJI ,  UZAWA SHUNICHI ,  KARIYA TAKUO

IPC: F25D3/10 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable the use of any kind of an actuator by a method wherein a housing to contain a heat generating drive source having an output shaft in a sealing manner is provided, and a sealing means is mounted to the portion, through which an output shaft is extended, of the housing. CONSTITUTION:The interior of a housing to contain a heat generating drive source in a sealing manner is managed to approximate an atmospheric pressure (760Torr) in He by means of a pressure gauge 22. Thus, dust generation and vaporization of grease and oil used for the slide part of a motor 10 is reduced because of pressure in atmosphere being high. A material of the motor 10 can be used without being limited to a material used as a vacuum part. Thus, the motor 10 can be used as an actuator in special environment without improving a good on a market. In this case, the portion, through which an output shaft is extended, of the housing is sealed with an O-ring seal 16.

公开(公告)号：JPH03120738A

公开(公告)日：1991-05-22

申请号：JP25707889

申请日：1989-10-03

Applicant: CANON KK

Inventor： KORENAGA NOBUSHIGE ,  GOTO SUSUMU ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: H01J37/22 ,  H01L21/66

Abstract: PURPOSE:To enable precise discrimination of a pattern edge regardless of a beam diameter and beam energy distribution by providing a electron irradiating means for irradiating and scanning a sample, on which a pattern to be measured is formed, with an electron beam and a transmitted electron detecting means for measuring the electron beam intensity transmitted through said sample. CONSTITUTION:When pitch spacings of mask patterns 172, 173 in the X-direction are measured, a stage is moved in the X-direction by an X-direction stage driving mechanism, and at that time, the stage position in the X-direction and the signal magnitude of high energy transmitted electrons from a connector 23 are simultaneously measured. The stage position is measured by laser interferometers 14, 13, The signal magnitude and the position data are digitized and are stored in a measuring microcomputer 30 so that the position data and signal magnitude data are correspond to each other. Then, the data, for which the signal magnitude is 1/2 of the maximum value, is retrieved and the position data corresponding to that data is extracted. This corresponds to the pattern edge position.

公开(公告)号：JPH0388400A

公开(公告)日：1991-04-12

申请号：JP22535689

申请日：1989-08-31

Applicant: CANON KK

Inventor： IWAMOTO KAZUNORI ,  CHIBA HIROSHI ,  OKAWA SHINKICHI ,  UZAWA SHUNICHI ,  KARIYA TAKUO ,  EBINUMA RYUICHI

IPC: H05K13/04 ,  H01L21/027

Abstract: PURPOSE:To reduce outer force to a precision equipment due to reduction in inner pressure of a vacuum container and prevent functional change and damage to the precision equipment by forming a fulcrum member for mounting the precision equipment into the vacuum container in a structure which can be deformed or rotated. CONSTITUTION:A precision equipment 1 in a unit, a vacuum container 2 whose internal part is set to a desired reduced pressure atmosphere, and first and second fulcrum members 3 and 4 which mount the precision equipment 1 into the vacuum container 2 so that it can be suspended in Y-direction are provided. The first and second fulcrum members 3 and 4 are provided apart in X-direction which crosses Y-direction at right angle, one of them has freedom in the direction of rotation so that force due to deformation of the vacuum container 2 may not be transmitting to the precision equipment 1 when the internal pressure within the vacuum container 2 is set to a desired reduced pressure atmosphere, and the other fixes the precision equipment 1 regarding Z direction for the vacuum container 2, thus drastically reducing outer force to the precision equipment 1 due to reduction in internal pressure within the vacuum container 2 and preventing functional change and damage to the precision equipment 1.

公开(公告)号：JPH0385718A

公开(公告)日：1991-04-10

申请号：JP22154089

申请日：1989-08-30

Applicant: CANON KK

Inventor： KUROSAWA HIROSHI ,  UDA KOJI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI ,  EBINUMA RYUICHI ,  KARIYA TAKUO

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

Abstract: PURPOSE:To prevent mutual interference of optical alignment devices and to improve safety against malfunction by enabling detection of abnormal mutual approach of the optical alignment devises through a contact. CONSTITUTION:When the state of alignment of an alignment mark is detected, four pick-ups 111, for example, move inside and outside a division in a mask and there is a possibility that they collide each other individually; therefore, a contact 110 is mounted on a point of each pick-up 111, for example, to detect abnormal mutual approach of the pick-ups. If an abnormal approach is detected, movement of all the pick-ups stops for a moment and each pick-up becomes movable in the direction to part each other. Then, after each pick-up retreats to an area having no possibility of collision, an origin of a pick-up stage 114 is obtained and the pick-up returns. The contact 110 is composed of an electrode and a sensor means detects abnormal mutual approach of optical alignment devices by the contact. A simple and compact structure of the sensor means is realized in this way.

公开(公告)号：JPH0298120A

公开(公告)日：1990-04-10

申请号：JP24990288

申请日：1988-10-05

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  AMAMIYA MITSUAKI ,  KARIYA TAKUO ,  SHIMODA ISAMU

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make it possible to correct any decline in helium purity due to air leakage as well as to avoid the decline in X-ray transmittivity by a method where in a means to constantly feed a specified amount of helium is provided in a stage containing chamber. CONSTITUTION:An X-ray source containing chamber 3 is exhausted by a high vacuum pump 13 with a partition valve 7 closed and a bypass valve 26 opened. On the other hand, a stage containing chamber 5 is exhausted by a low vacuum pimp 14 down to the pressure not exceeding 0.029Torr. At thin time, the bypass valve 26 is closed to exhaust the X-ray source containing chamber 3 down to the final pressure not exceeding 10 Torr. Later, the stage containing chamber 5 is fed with helium in purity of 99.9999% up to internal pressure of 150Torr. Thereafter, the pressure inside the stage containing chamber 5 is kept at 150Torr avoiding the dispersion thereof by a controller 21 and a variable valve 22 to continue the feeding of specified amount of helium corresponding to any air leakage amount.