公开(公告)号：KR1019950030257A

公开(公告)日：1995-11-24

申请号：KR1019940040232

申请日：1994-12-31

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이마후쿠고스케 ,  엔도쇼스케 ,  다하라가즈히로 ,  쓰치야히로시 ,  도모야스마사유키 ,  나이토유키오 ,  나가세키가즈야 ,  노나카료 ,  히로세게이조 ,  후카사와요시오 ,  고시이시아키라 ,  고바야시이사오

IPC: H01L21/3065

公开(公告)号：KR1019890014219A

公开(公告)日：1989-10-23

申请号：KR1019890002772

申请日：1989-03-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 고바야시이사오

IPC: B25J15/00

公开(公告)号：KR100349064B1

公开(公告)日：2003-01-24

申请号：KR1019940040232

申请日：1994-12-31

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이마후쿠고스케 ,  엔도쇼스케 ,  다하라가즈히로 ,  쓰치야히로시 ,  도모야스마사유키 ,  나이토유키오 ,  나가세키가즈야 ,  노나카료 ,  히로세게이조 ,  후카사와요시오 ,  고시이시아키라 ,  고바야시이사오

IPC: H01L21/3065

CPC classification number: H01J37/32623

Abstract: A plasma processing apparatus comprises a chamber, and an upper electrode and a lower electrode, parallelly provided in the chamber to oppose each other at a predetermined interval, for defining a plasma generation region between the electrodes. An object to be processed is mounted on the lower electrode. RF powers are supplied to the electrodes, so that a plasma generates between the electrodes, thereby performing a plasma process with respect to the object to be processed. A cylindrical ground electrode is provided around the plasma generation region in the chamber, for enclosing the plasma in the plasma generation region, and has a plurality of through holes for passing a process gas.

Abstract translation: 等离子体处理装置包括腔室和平行地设置在腔室中以预定间隔彼此相对的上电极和下电极，用于限定电极之间的等离子体产生区域。 待处理物体安装在下电极上。 将RF功率提供给电极，使得在电极之间产生等离子体，由此对待处理的对象执行等离子体处理。 在腔室内的等离子体产生区域周围提供圆柱形接地电极，用于将等离子体封闭在等离子体产生区域中，并且具有用于使处理气体通过的多个通孔。