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公开(公告)号:KR101849411B1
公开(公告)日:2018-04-16
申请号:KR1020120045224
申请日:2012-04-30
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/66
CPC classification number: G01N21/956 , G01N21/8806 , G01N21/93 , G01N21/9501 , G01N2021/9513 , G06T7/0004
Abstract: 본발명의과제는검사용기판을사용하는일 없이조명부의조도의저하에의한검사의문제가발생하는것을방지할수 있는기술을제공하는것이다. 하우징내에설치된적재대에적재된기판을피사체로서촬상하여검사를행하는검사모드와, 조명부의조도를확인하기위한메인터넌스모드사이에서모드를선택하기위한모드선택부와, 상기하우징내에설치되어, 상기조명부의광을촬상부의촬상소자에도광하기위한도광부재와, 메인터넌스모드실행시에상기도광부재를통해촬상소자에의해취득한조명부의광의휘도가, 미리설정된허용범위내인지여부를판정하는판정부와, 상기판정부에의해상기휘도가상기허용범위로부터벗어나있다고판정되었을때에조명부의교환을필요로하는것을통지하기위한통지부를구비하도록기판검사장치를구성한다.
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公开(公告)号:KR101595593B1
公开(公告)日:2016-02-18
申请号:KR1020110043716
申请日:2011-05-11
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/16 , H01L21/6715
Abstract: 본발명의과제는처리블록의설치면적을억제하는동시에장치의가동효율의저하를억제할수 있는기술을제공하는것이다. 검사모듈에의한검사에서기판에이상이검출되었을때에, 기억부에기억된데이터에기초하여, 후속의기판의반송모드를, 모드 M1 및 M2로부터선택하기위한모드선택부를구비하도록도포, 현상장치를구성한다. 상기모드 M1은현상처리용단위블록에있어서의기판이처리된모듈을특정하여, 후속의기판을, 특정된모듈이외의모듈로반송하도록단위블록용반송기구의동작을제어하는모드이고, 상기모드 M2는기판이처리된현상처리용단위블록을특정하여, 후속의기판을, 특정된현상처리용단위블록이외의현상처리용단위블록으로반송하도록전달기구의동작을제어하는모드이다.
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公开(公告)号:KR1020120133999A
公开(公告)日:2012-12-11
申请号:KR1020120045224
申请日:2012-04-30
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/66
CPC classification number: G01N21/956 , G01N21/8806 , G01N21/93 , G01N21/9501 , G01N2021/9513 , G06T7/0004
Abstract: PURPOSE: A substrate inspection apparatus, a substrate inspection method, and a storage medium are provided to prevent an inspection problem of a substrate due to illumination degradation in a lighting part without transferring a controlling substrate to the apparatus. CONSTITUTION: A mode selection part(46) selects a mode from a loading table inspection mode and a maintenance mode. A light guiding member is installed within a housing and guides light of a lighting part to an image pickup device. A determination part determines whether or not the brightness of the light in the lighting part acquired by the image pickup device is in a predetermined tolerance range using the light guiding member when the maintenance mode is executed. A notifying part(45) notifies that it is necessary to have the exchange of the lighting part when the determination part determines the brightness of the light is beyond the predetermined tolerance range. [Reference numerals] (30,HH) Image pickup device 1-2048; (32) Lens; (34) A/D converter; (35) Output correction part; (36) Signal processing part; (37) Converting part; (4) Control part; (42) CPU; (43) Program storing part; (45) Display part(notifying part); (46) Input part; (51) Program for an inspection mode; (52) Program for a maintenance mode; (53) Target value of brightness, upper bound of a indication value, and tolerance range of the difference from the target value; (55) Lamp exchange date; (56) Reference data; (62) Elapsed time of the indication value; (63) Need or not need for lamp exchange, the presence of indication value change; (AA) Image pickup device; (BB) Digital value(0-255); (CC) Brightness(0-255); (DD) Correction value; (EE) Indication value; (FF) Indication value setting data; (GG) Determined indication value; (II) Brightness α-γ
Abstract translation: 目的:提供基板检查装置,基板检查方法和存储介质,以防止由于照明部分的照明劣化而导致的基板的检查问题,而不将控制基板传送到设备。 构成:模式选择部(46)从装载台检查模式和维护模式中选择模式。 导光构件安装在壳体内并将照明部分的光引导到图像拾取装置。 确定部件确定当执行维护模式时,由图像拾取装置获取的照明部分中的光的亮度是否在使用导光部件的预定公差范围内。 通知部件(45)通知当确定部件确定光的亮度超过预定公差范围时,需要更换照明部件。 (附图标记)(30,HH)图像拾取装置1-2048; (32)镜头; (34)A / D转换器; (35)输出校正部; (36)信号处理部分; (37)转换件; (4)控制部分; (42)CPU; (43)程序存储部分; (45)显示部(通知部); (46)输入部分; (51)检查模式程序; (52)维护方式的程序; (53)亮度的目标值,指示值的上限,以及与目标值的差的公差范围; (55)灯交换日期; (56)参考数据; (62)指示值的经过时间; (63)需要或不需要灯交换,指示值存在变化; (AA)摄像装置; (BB)数字值(0-255); (CC)亮度(0-255); (DD)校正值; (EE)指示值; (FF)指示值设定数据; (GG)确定指示值; (II)亮度α&ggr;
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公开(公告)号:KR1020120005937A
公开(公告)日:2012-01-17
申请号:KR1020110043716
申请日:2011-05-11
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: G03F7/16 , H01L21/6715 , H01L21/0274
Abstract: PURPOSE: A coating and developing apparatus, a method thereof, and a memory medium are provided to apply a unit block for a dual developing process, thereby suppressing the degradation of operation efficiency of the coating and developing apparatus. CONSTITUTION: A carrier block(S1) comprises a loading stand(11) which loads a carrier(C), an opening and closing part(12), and a transfer arm. The transfer arm comprises five wafer holding support parts in up and down directions. A processing block(S2) comprises unit blocks(B1-B6) which perform liquid processing process in a wafer. The unit block comprises a heating module, a main arm, and a return region. A liquid processing unit comprises an antireflection film formation module(BCT1, 2) and a resist film formation module(COT1,2).
Abstract translation: 目的:提供一种涂布和显影装置,其方法和存储介质以应用用于双显影处理的单位块,从而抑制涂层和显影装置的操作效率的劣化。 构成:载体块(S1)包括装载载体(C)的装载台(11),开闭部分(12)和传送臂。 传送臂在上下方向上包括五个晶片保持支撑部。 处理块(S2)包括在晶片中执行液体处理处理的单元块(B1-B6)。 单元块包括加热模块,主臂和返回区域。 液体处理单元包括防反射膜形成模块(BCT1,2)和抗蚀膜形成模块(COT1,2)。
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