Abstract:
Provided are a periphery coating apparatus which can efficiently form a coating layer with sufficiently uniform thickness, on only the periphery of a substrate, a periphery coating method and a storage medium for the same. A periphery coating unit performs a scan in control which rotates a wafer (W) and moves a resist solution nozzle (27) from the outside of the periphery (Wb) of the wafer (W) to the periphery (Wc) of the wafer (W) while discharging a resist solution from the resist solution nozzle (27), and a scan out control which rotates the wafer (W) and moves the resist solution nozzle (27) from the periphery (Wc) of the wafer (W) to the outside of the periphery (Wb) of the wafer (W) while discharging the resist solution from the resist solution nozzle (27). When the scan out control is carried out, the resist solution nozzle (27) is moved at a velocity (V2) which is lower than a velocity (V3) at which the resist solution moves to the periphery (Wc) of the wafer (W).
Abstract:
본 발명은 기판의 전체면에 각종 도포액을 도포할 때에, 기판의 전체면을 도포액으로 피복하는 데 필요한 도포액의 액량을 삭감할 수 있는 도포 처리 방법을 제공하는 것을 목적으로 한다. 회전하는 기판의 표면에 도포액을 공급하고, 공급된 도포액을 기판의 외주측으로 확산시킴으로써, 기판의 표면에 도포액을 도포하는 도포 처리 방법에 있어서, 회전하는 기판의 표면에 도포액을 공급하는 공급 위치를, 외주측으로 확산되는 도포액의 이동에 따라 외주측으로 이동시키면서, 도포액을 기판의 표면에 공급하는 공급 공정(S17)을 포함한다.
Abstract:
PURPOSE: A coating process method, computer readable recording medium, and coating process apparatus are provided to reduce an amount of resist solutions for coating the surface of a wafer by preventing the resist solutions from splashing. CONSTITUTION: A cassette arrangement stand(10) is installed in a cassette station(2). A plurality of cassettes is arranged on the cassette arrangement stand in a row. A wafer transfer device(12) transfers a wafer from the cassette. A process station(3) includes five process device groups. The cassette station, the process station, and an interface station(4) are integrally connected.