Abstract:
PURPOSE: A wavelength tuning method of an optical device is provided to increase the refractive index of a dielectric layer by thermally treating the dielectric layer and to increase the wavelength of light passing through the dielectric layer and a core pattern. CONSTITUTION: An optical device including a core pattern(5) and a dielectric layer(7) covering the core pattern is formed on a substrate(1). The refractive index of the dielectric layer is increased by thermally treating the optical device. The dielectric layer is composed of an SiON film. A bottom clad layer(3) prevents an impurity in the core pattern from being diffused. A top clad layer(9) is made through a deposition process and has an even refractive index distribution through a high temperature treatment.
Abstract:
PURPOSE: An optical network structure of a multicore central processing apparatus is provided to develop a CPU chip comprising hundreds of or thousands of cores. CONSTITUTION: An optical network structure of a multicore central processing apparatus comprises: ring resonator WDM(wavelength division multiplexing) filters corresponding to a plurality cores(CR1-CR12); one or more control units(CU) for receiving optical signal transformed to a waveguide and transmistting the optical signal to the waveguide.
Abstract:
PURPOSE: An optical devices and fabricating method thereof are provided to improve the reliability of an optical device. CONSTITUTION: A cladding layer(141) includes a top cladding layer and a bottom cladding layer. A core(121) includes a plurality of rings between the top and bottom cladding layer. An insertion layer(125) is interposed between the core and the cladding layer and has a refractive index higher which is between the refractive index of the core and the cladding layer.
Abstract:
An optical vision chip and an image recognition method using the same are provided to perform an image recognition operation while not requiring complex mathematical equations or calculation by directly comparing an object image with a standard model image. An optical vision chip includes the first display element(10), the second display element(14), and an optical sensor(18). A size and a shape of the first pixel(12) of the first display element and the second pixel(16) of the second display element are overlapped with those of a sensor pixel of the optical sensor. The first display element displays an object image, and the second display element displays a standard model image stored at an external memory. When the second display element displays the standard model image, the brightness of the standard model image is a complement to the brightness of the object image. The optical sensor outputs an electric signal, which expresses an optical difference between the object image and the standard model image, via an electrode line. If the electric signal outputted by the optical sensor is sent to an external display unit, an optical difference of the image can be displayed.
Abstract:
A waveguide p-i-n photodiode is provided to acquire the maximum coupling coefficient between the photodiode itself and a single mode optical fiber or a silica waveguide by using a graded index distribution centering on an optical absorption layer. A lower optical guide layer is formed on a substrate(10). An optical absorption layer(18) is formed on the lower optical guide layer. An upper optical guide layer is on the optical absorption layer. A clad layer(26) is formed on the upper optical guide layer. The lower optical guide layer, the optical absorption layer and the upper optical guide layer are used for forming a core layer, wherein the core layer is used as a waveguide. The resultant structure has a symmetrical graded index distribution centering on the optical absorption layer.
Abstract:
본 발명은 가입자용이나 파장분할다중(WDM) 방식의 광통신 시스템에 사용되는 반도체 광소자의 제작 방법에 관한 것으로, 단일 활성층에 레이저 다이오드(Laser Diode; LD)와 반도체 광증폭기(Semiconductor Optical Amplifier; SOA)가 집적된다. 레이저 다이오드와 반도체 광증폭기는 서로 광학적으로 연결되며, 이온 주입에 의해 전기적으로 절연된다. 각각의 전극을 통해 독립적으로 전류를 주입하면 레이저 다이오드(LD)에서 생성된 광이 반도체 광증폭기(SOA)에 의해 증폭되기 때문에 발진개시전류가 낮고 출력광의 세기가 높다. 반도체 광증폭기, 레이저 다이오드, 전류차단층, 전류주입층, 이온주입
Abstract:
PURPOSE: An SG-DFB(Sampled Grating Distributed Feed-Back) tunable semiconductor laser WITH an SG-DBR(Sampled Grating Distributed Bragg Reflector) is provided to tune a wavelength by integrating an SG-DFB structure and an SG-DBR structure and forming a phase control region of the SG-DFB structure. CONSTITUTION: A sampled grating(39) is formed on an n-type InP substrate(31) used as a lower clad layer. A phase control region of an InGaAsP waveguide and a gain region of an active layer are formed on the sampled grating. A p-type InP clad layer(32) used as an upper clad layer is formed thereon. A plurality of electrodes are formed on the p-type InP clad layer. A phase control region electrode(36) is formed on the phase control region. A gain region electrode(37) is formed on the gain region. A non-reflective thin film(33) is formed on a section of a semiconductor laser diode.
Abstract:
A waveguide with a reduced phase error and a photonics device including the same are provided. A waveguide structure may include a lower clad; a core pattern which has at least one curved section and is provided on the lower clad; a beam deflection pattern which is disposed on the core pattern; and an upper clad which covers the core pattern with the beam deflection pattern. The beam deflection pattern is made of a material with a refractive index larger than that of the upper clad and smaller than or equal to that of the core pattern and may include a portion with a width which is increased or decreased, or vibrates according to the curved section.
Abstract:
링 공진기의 공진파장 가변 방법이 제공된다. 링 공진기의 공진파장 가변 방법은 링 도파로 및 링 도파로를 피복하는 유전체층을 포함하는 링 공진기를 준비하고, 링 공진기를 가열하여 유전체층의 굴절률 상변화(refractive index phase change)를 유도하는 것을 포함한다.