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公开(公告)号：WO2011056515A3
公开(公告)日：2011-08-25
申请号：PCT/US2010053977
申请日：2010-10-25
Applicant: ADVANCED TECH MATERIALS , JONES EDWARD E , YEDAVE SHARAD N , TANG YING , CHAMBERS BARRY LEWIS , KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , ZOU PENG
Inventor： JONES EDWARD E , YEDAVE SHARAD N , TANG YING , CHAMBERS BARRY LEWIS , KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , ZOU PENG
IPC: H01J37/317 , H01L21/265
CPC classification number: H01L21/265 , C23C14/48 , C23C14/52 , H01J37/08 , H01J37/3171 , H01J37/32055 , H01J37/32412 , H01J37/32449 , H01J2237/006 , H01J2237/022
Abstract: An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B2F4 or other alternatives to BF3. Various arc chamber thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, eqillibrium shifting, optimization of extraction optics, detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system.
Abstract translation: 一种离子注入系统和方法，提供掺杂剂气体进料管线中掺杂剂气体的冷却，以防止通过电弧室产生热量来加热和分解掺杂剂气体，例如使用硼源材料如B2F4或BF3的其它替代物。 描述了各种电弧室热管理装置，以及等离子体性质，特定流动布置，清洁过程，功率管理，eqillibrium变换，萃取光学器件的优化，流动通道中沉积物的检测以及源寿命优化的修改，以实现高效 离子注入系统的操作。
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2.发明申请CARBON DOPANT GAS AND CO-FLOW FOR IMPLANT BEAM AND SOURCE LIFE PERFORMANCE IMPROVEMENT 审中-公开用于植入光束和碳源生物质量改善的碳氢化合物气体和共流
公开(公告)号：WO2013122986A8
公开(公告)日：2014-08-28
申请号：PCT/US2013025840
申请日：2013-02-13
Applicant: ADVANCED TECH MATERIALS
Inventor： BYL OLEG , STURM EDWARD A , TANG YING , YEDAVE SHARAD N , SWEENEY JOSEPH D , SERGI STEVEN G , CHAMBERS BARRY LEWIS
IPC: H01L21/265 , H01J37/317
CPC classification number: H01L21/265 , H01J37/08 , H01J37/3171 , H01J2237/022 , H01L31/18 , H01L33/005
Abstract: Ion implantation processes and systems are described, in which carbon dopant source materials are utilized to effect carbon doping. Various gas mixtures are described, including a carbon dopant source material, as well as co-flow combinations of gases for such carbon doping. Provision of in situ cleaning agents in the carbon dopant source material is described, as well as specific combinations of carbon dopant source gases, hydride gases, fluoride gases, noble gases, oxide gases and other gases.
Abstract translation: 描述了离子注入工艺和系统，其中使用碳掺杂剂源材料来实现碳掺杂。 描述了各种气体混合物，包括碳掺杂剂源材料，以及用于这种碳掺杂的气体的共流组合。 描述了在碳掺杂剂源材料中提供原位清洁剂，以及碳掺杂剂源气体，氢化物气体，氟化物气体，惰性气体，氧化物气体和其它气体的特定组合。
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3.发明申请ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MAKING AND USING SAME 审中-公开同位素丰富的含硼化合物，以及制备和使用相同的方法
公开(公告)号：WO2012024310A3
公开(公告)日：2012-05-31
申请号：PCT/US2011047942
申请日：2011-08-16
Applicant: ADVANCED TECH MATERIALS , KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , YEDAVE SHARAD N , JONES EDWARD E , ZOU PENG , TANG YING , CHAMBERS BARRY LEWIS , RAY RICHARD S
Inventor： KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , YEDAVE SHARAD N , JONES EDWARD E , ZOU PENG , TANG YING , CHAMBERS BARRY LEWIS , RAY RICHARD S
CPC classification number: C01B35/061 , C01P2006/88 , H01J2237/006 , H01J2237/08 , H01J2237/31701 , Y02P20/134
Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.
Abstract translation: 一种同位素富集的含硼化合物，其包含两个或更多个硼原子和至少一个氟原子，其中至少一个硼原子含有浓度或比率大于天然丰度浓度或其比率的所需硼同位素 。 该化合物可以具有B2F4的化学式。 描述了这些化合物的合成方法，以及使用这些化合物的离子注入方法，以及储存和分配容器，其中富含同位素的含硼化合物有利地包含在随后的分配用途中。
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4.发明公开ISOTOPICALLY-ENRICHED BORON-CONTAINING COMPOUNDS, AND METHODS OF MAKING AND USING SAME 有权同位素富集含硼的生产和使用的化合物和方法
公开(公告)号：EP2606004A4
公开(公告)日：2014-02-19
申请号：EP11818672
申请日：2011-08-16
Applicant: ADVANCED TECH MATERIALS
Inventor： KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , YEDAVE SHARAD N , JONES EDWARD E , ZOU PENG , TANG YING , CHAMBERS BARRY LEWIS , RAY RICHARD S
CPC classification number: C01B35/061 , C01P2006/88 , H01J2237/006 , H01J2237/08 , H01J2237/31701 , Y02P20/134
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公开(公告)号：EP2494581A4
公开(公告)日：2015-03-18
申请号：EP10828832
申请日：2010-10-25
Applicant: ADVANCED TECH MATERIALS
Inventor： JONES EDWARD E , YEDAVE SHARAD N , TANG YING , CHAMBERS BARRY LEWIS , KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , ZOU PENG
IPC: H01J37/317 , H01J37/08 , H01L21/265
CPC classification number: H01L21/265 , C23C14/48 , C23C14/52 , H01J37/08 , H01J37/3171 , H01J37/32055 , H01J37/32412 , H01J37/32449 , H01J2237/006 , H01J2237/022
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Patent Agency Ranking
公开(公告)号：EP2248153A4
公开(公告)日：2012-01-18
申请号：EP09709805
申请日：2009-02-11
Applicant: SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING , ADVANCED TECH MATERIALS
Inventor： SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , SERGI STEVEN , FENG LIN , BISHOP STEVEN E , OLANDER KARL W , TANG YING
IPC: H01L21/265 , C23C16/44 , C23G5/00 , H01J37/08 , H01J37/16 , H01J37/18 , H01J37/317
CPC classification number: H01J37/3171 , C23C14/48 , C23C14/54 , C23C14/564 , H01J37/08 , H01J37/16 , H01J37/18 , H01J2237/082 , H01J2237/22
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公开(公告)号：SG2014006068A
公开(公告)日：2014-03-28
申请号：SG2014006068
申请日：2011-08-16
Applicant: ADVANCED TECH MATERIALS
Inventor： KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , YEDAVE SHARAD N , JONES EDWARD E , ZOU PENG , TANG YING , CHAMBERS BARRY LEWIS , RAY RICHARD S
Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B 2 F 4 . Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.
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公开(公告)号：SG188215A1
公开(公告)日：2013-04-30
申请号：SG2013011028
申请日：2011-08-16
Applicant: ADVANCED TECH MATERIALS
Inventor： KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , YEDAVE SHARAD N , JONES EDWARD E , ZOU PENG , TANG YING , CHAMBERS BARRY LEWIS , RAY RICHARD S
Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.
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公开(公告)号：SG173621A1
公开(公告)日：2011-09-29
申请号：SG2011057536
申请日：2009-08-12
Applicant: ADVANCED TECH MATERIALS
Inventor： SWEENEY JOSEPH D , YEDAVE SHARAD N , BYL OLEG , KAIM ROBERT , ELDRIDGE DAVID , FENG LIN , BISHOP STEVEN E , OLANDER W KARL , TANG YING
Abstract: Cleaning of an ion implantation system or components thereof, utilizing temperature and/or a reactive cleaning reagent enabling growth/etching of the cathode in an indirectly heated cathode for an ion implantation system by monitoring the cathode bias power and taking corrective action depending upon compared values to etch or regrow the cathode.
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公开(公告)号：SG10201406528PA
公开(公告)日：2014-12-30
申请号：SG10201406528P
申请日：2010-10-25
Applicant: ADVANCED TECH MATERIALS , ENTEGRIS INC
Inventor： JONES EDWARD E , YEDAVE SHARAD N , TANG YING , CHAMBERS BARRY LEWIS , KAIM ROBERT , SWEENEY JOSEPH D , BYL OLEG , ZOU PENG
Abstract: ION IMPLANTATION SYSTEM AND An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B F or 2 4 other alternatives to BF . Various arc chamber 3 thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, eqillibrium shifting, optimization of extraction optics,detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system. Fig.l -34-
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