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    METHOD OF OPTIMIZING A METROLOGY PROCESS
    1.
    发明申请
    METHOD OF OPTIMIZING A METROLOGY PROCESS 审中-公开

    公开(公告)号：WO2019149493A1

    公开(公告)日：2019-08-08

    申请号：PCT/EP2019/050535

    申请日：2019-01-10

    Applicant: ASML NETHERLANDS B.V.

    Inventor： TSIATMAS, Anagnostis ,  VENSELAAR, Joannes, Jitse ,  REHMAN, Samee, Ur ,  MEDVEDYEVA, Mariya, Vyacheslavivna ,  FAGGINGER AUER, Bastiaan, Onne ,  ZAAL, Martijn, Maria ,  KONTOROUPI, Thaleia

    IPC: G03F7/20

    Abstract: Method of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process comprises illuminating the first target with a radiation spot and detecting radiation redirected by the first target. The applications of the metrology process include applications at either or both of a) plural positions of the radiation spot relative to the first target, and b) plural focus heights of the radiation spot. The measurement data comprises, for each application of the metrology process, a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method comprises determining either or both of an optimal alignment and an optimal focus height based on comparisons between the detected pupil representations in the measurement data and a reference pupil representation.

    PROVIDING A TRAINED NEURAL NETWORK AND DETERMINING A CHARACTERISTIC OF A PHYSICAL SYSTEM
    3.
    发明申请
    PROVIDING A TRAINED NEURAL NETWORK AND DETERMINING A CHARACTERISTIC OF A PHYSICAL SYSTEM 审中-公开

    公开(公告)号：WO2020064212A1

    公开(公告)日：2020-04-02

    申请号：PCT/EP2019/071874

    申请日：2019-08-14

    Applicant: ASML NETHERLANDS B.V.

    Inventor： REHMAN, Samee, Ur

    IPC: G03F7/20 ,  G06N3/04 ,  G06N3/08

    Abstract: A method of determining a characteristic, such as optical response, of a physical system having a material structure, such as a thin-film multilayer stack or other optical system, has the steps: providing (1430) a neural network (1440) with its network architecture configured based on a model (1420) of scattering of radiation by the material structure along the radiation's path; training (1450) and using (1460) the neural network to determine the characteristic of the physical system. The network architecture may be configured based on the model by configuring parameters including number of units per hidden layer, number of hidden layers, layer interconnection and dropout.

    METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM
    4.
    发明申请
    METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM 审中-公开

    公开(公告)号：WO2022008135A1

    公开(公告)日：2022-01-13

    申请号：PCT/EP2021/064156

    申请日：2021-05-27

    Applicant: ASML NETHERLANDS B.V.

    Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  TINNEMANS, Patricius, Aloysius, Jacobus ,  DEN BOEF, Arie, Jeffrey ,  BHATTACHARYYA, Kaustuve ,  REHMAN, Samee, Ur

    IPC: G03F7/20 ,  G03F9/00

    Abstract: Disclosed is a method of improving a measurement of a parameter of interest. The method comprises obtaining metrology data comprising a plurality of measured values of the parameter of interest, relating to one or more targets on a substrate, each measured value relating to a different measurement combination of a target of said one or more targets and a measurement condition used to measure that target and asymmetry metric data relating to asymmetry for said one or more targets. A respective relationship is determined for each of said measurement combinations relating a true value for the parameter of interest to the asymmetry metric data, based on an assumption that there is a common true value for the parameter of interest over said measurement combinations. These relationships are used to improve a measurement of the parameter of interest.

    ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
    6.
    发明申请
    ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES 审中-公开

    公开(公告)号：WO2022199958A1

    公开(公告)日：2022-09-29

    申请号：PCT/EP2022/054161

    申请日：2022-02-18

    Applicant: ASML NETHERLANDS B.V.

    Inventor： REHMAN, Samee, Ur ,  MENCHTCHIKOV, Boris ,  SOCHA, Robert, John

    IPC: G03F9/00

    Abstract: Disclosed is a method of identifying one or more dominant asymmetry modes relating to asymmetry in an alignment mark, the method comprises obtaining alignment data relating to measurement of alignment marks on at least one substrate using a plurality of alignment conditions; identifying one or more dominant orthogonal components of said alignment data, said one or more orthogonal components comprising a number of said orthogonal components which together sufficiently describes variance in said alignment data; and determining an asymmetry mode as dominant if it corresponds to an expected asymmetry mode shape which best matches one of said dominant orthogonal components. Alternatively, the method comprises, for each known asymmetric mode: determining a sensitivity metric; and determining an asymmetry mode as dominant if said sensitivity metric is above a sensitivity threshold.

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