公开(公告)号：NL2003294A

公开(公告)日：2010-03-09

申请号：NL2003294

申请日：2009-07-27

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ,  VERSTAPPEN LEONARDUS

IPC: G01B11/00 ,  G03F9/00

公开(公告)号：NL2009853A

公开(公告)日：2013-06-26

申请号：NL2009853

申请日：2012-11-21

Applicant: ASML NETHERLANDS BV

Inventor： ELINGS WOUTER ,  BILSEN FRANCISCUS ,  MOL CHRISTIANUS ,  MOS EVERHARDUS ,  TOLSMA HOITE ,  BERGE PETER TEN ,  WIJNEN PAUL ,  VERSTAPPEN LEONARDUS ,  DICKER GERALD ,  JUNGBLUT REINER ,  CHUNG-HSUN LI

IPC: G03F7/20

Abstract: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan.

公开(公告)号：NL2005332A

公开(公告)日：2011-04-14

申请号：NL2005332

申请日：2010-09-08

Applicant: ASML NETHERLANDS BV

Inventor： VERSTAPPEN LEONARDUS ,  BOEF ARIE

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2003990A

公开(公告)日：2010-07-01

申请号：NL2003990

申请日：2009-12-21

Applicant: ASML NETHERLANDS BV

Inventor： MEGENS HENRICUS ,  KIERS ANTOINE ,  FINDERS JOZEF ,  QUAEDACKERS JOHANNES ,  SCHAAR MAURITS ,  VERSTAPPEN LEONARDUS ,  LEEWIS CHRISTIAN ,  LAARHOVEN HENDRIK

IPC: G01N21/47 ,  G03F7/20