公开(公告)号：CA3235933A1

公开(公告)日：2023-04-27

申请号：CA3235933

申请日：2022-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DONMEZ NOYAN INCI ,  VAN DER WOORD TIES WOUTER ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  KLEIN ALEXANDER LUDWIG ,  HOUWELING ZOMER SILVESTER ,  VERMEULEN PAUL ALEXANDER ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA

IPC: G03F1/62

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：IL312111A

公开(公告)日：2024-06-01

申请号：IL31211124

申请日：2024-04-11

Applicant: ASML NETHERLANDS BV ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Inventor： BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：CA3149349A1

公开(公告)日：2021-03-04

申请号：CA3149349

申请日：2020-08-20

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  BALTUSSEN SANDER ,  BANINE VADIM YEVGENYEVICH ,  DOLGOV ALEXANDR ,  DONMEZ NOYAN INCI ,  HOUWELING ZOMER SILVESTER ,  NOTENBOOM ARNOUD WILLEM ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER ,  VLES DAVID FERDINAND ,  VORONINA VICTORIA ,  YEGEN HALIL GOKAY

IPC: G03F1/62 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.

公开(公告)号：CA3148137A1

公开(公告)日：2021-02-04

申请号：CA3148137

申请日：2020-07-24

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN PAUL ,  BIRON MAXIME ,  DONMEZ NOYAN INCI ,  FERRE LLIN LOURDES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  KUNTZEL JAN HENDRIK WILLEM ,  NOTENBOOM ARNOUD WILLEM ,  ROLLIER ANNE-SOPHIE ,  VAN DER WOORD TIES WOUTER ,  VAN ZWOL PIETER-JAN

IPC: G03F1/62

Abstract: A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly comprising a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus comprising such pellicles.