公开(公告)号：JP2007281462A

公开(公告)日：2007-10-25

申请号：JP2007090110

申请日：2007-03-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  ANTONIUS LEENDERS MARTINUS HEN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To vary fluid pressure by accelerating a substrate table and accelerating regulating fluid in a supplying device, in a removing device and/or in the substrate table. SOLUTION: A lithography apparatus comprises the substrate table WT which is formed for holding a substrate W and retains the regulating fluid and a regulation system 100 for regulating the substrate table. The regulation system 100 comprises a pressure damper 104 which is communicated with the regulation system 100 through fluid and controls pressure change of the system 100. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过加速衬底台和加速供给装置中的调节流体，在去除装置和/或衬底台中来改变流体压力。 解决方案：光刻设备包括形成用于保持基板W并保持调节流体的基板台WT和用于调节基板台的调节系统100。 调节系统100包括压力调节器104，其通过流体与调节系统100连通并控制系统100的压力变化。版权所有（C）2008，JPO＆INPIT

公开(公告)号：SG136117A1

公开(公告)日：2007-10-29

申请号：SG2007025513

申请日：2007-04-05

Applicant: ASML NETHERLANDS BV

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  LEENDERS MARTINUS HENDRIKUS AN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN