公开(公告)号：JP2009076940A

公开(公告)日：2009-04-09

申请号：JP2008328259

申请日：2008-12-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  VAN MEER ASCHWIN LODEWIJK HEND ,  OTTENS JOOST JEROEN ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: H01L21/67109 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To disclose and provide an apparatus that is equipped with a substrate table for supporting substrate. SOLUTION: A supporting table includes a plurality of supporting protrusions, coming into contact with a substrate when used to support the substrate. This support table includes a plurality of heat transfer protrusions, extending toward the substrate without making contact with the substrate, when the substrate is supported by the supporting protrusions during use. A heat exchange gap, containing a gas for exchanging heat with the substrate, extends between the heat transfer protrusions and the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：公开并提供装备有用于支撑基板的基板台的装置。 解决方案：支撑台包括多个支撑突起，当用于支撑基板时与支撑基板接触。 该支撑台包括多个传热突起，当基板在使用期间由支撑突起支撑时，朝向基板延伸而不与基板接触。 包含用于与衬底交换热量的气体的热交换间隙在传热突起和衬底之间延伸。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007281462A

公开(公告)日：2007-10-25

申请号：JP2007090110

申请日：2007-03-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  ANTONIUS LEENDERS MARTINUS HEN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To vary fluid pressure by accelerating a substrate table and accelerating regulating fluid in a supplying device, in a removing device and/or in the substrate table. SOLUTION: A lithography apparatus comprises the substrate table WT which is formed for holding a substrate W and retains the regulating fluid and a regulation system 100 for regulating the substrate table. The regulation system 100 comprises a pressure damper 104 which is communicated with the regulation system 100 through fluid and controls pressure change of the system 100. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过加速衬底台和加速供给装置中的调节流体，在去除装置和/或衬底台中来改变流体压力。 解决方案：光刻设备包括形成用于保持基板W并保持调节流体的基板台WT和用于调节基板台的调节系统100。 调节系统100包括压力调节器104，其通过流体与调节系统100连通并控制系统100的压力变化。版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006128682A

公开(公告)日：2006-05-18

申请号：JP2005310028

申请日：2005-10-25

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/67109 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment and a device manufacturing method.
SOLUTION: Lithography equipment has a substrate support formed such that it supports a substrate, and a projection system formed such that it projects a patterned radiation beam to a target part of the substrate. The substrate support is operated such that the substrate is moved along a specified path of the target part as the next target of the substrate. The substrate support has a duct fabric for thermally stabilizing the substrate. This duct fabric supplies a thermal stabilization medium to the substrate through the duct, and removes the thermal stabilization medium virtually using the duct from a portion of the substrate support that supports the target part via the substrate support part that supports the target part preceding the substrate, thereby maintaining the target part as a next target thermally stably.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：平版印刷设备具有形成为支撑基板的基板支撑件和形成为使得其将图案化的辐射束投影到基板的目标部分的投影系统。 操作基板支撑件，使得基板沿着目标部件的指定路径移动，作为基板的下一个目标。 衬底支撑件具有用于热稳定衬底的管道织物。 这种管道织物通过管道向基底提供热稳定介质，并且通过经由基板支撑部分支撑目标部分的衬底支撑部分，基本上使用来自支撑目标部分的基板支撑件的管道的热稳定介质， 从而热稳定地将目标部分保持为下一个目标。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006121078A

公开(公告)日：2006-05-11

申请号：JP2005301607

申请日：2005-10-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  DONDERS SJOERD NICOLAAS L ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  VAN DER NET ANTONIUS J ,  TEUNISSEN FRANCISCUS JOHANNES ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAY JACOBUS JOHANNUS LEONA ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an upgraded system as well as a method that discharges a mixture of liquid and gas from a component of lithography equipment. SOLUTION: This is lithography equipment including a liquid supply system for immersing, in liquid, a space between a projection system and a substrate, an outlet for eliminating a mixture of liquid and and gas that passes a gap between a liquid sealing structure of the liquid supply system and the substrate, and a discharge system for taking out the mixture through the outlet, wherein the discharge system includes a separator tank for separating the liquid from the gas in the mixture, and a separator tank pressure controller connected to a non-liquid immersion area of the separator tank and maintaining stable pressure in the non-liquid immersion area. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供升级系统以及从光刻设备的部件排出液体和气体的混合物的方法。 解决方案：这是一种光刻设备，其包括用于在液体中浸入投影系统和基板之间的空间的液体供应系统，用于消除液体和气体混合物的出口，该出口通过液体密封结构 的液体供给系统和基板，以及用于通过出口取出混合物的排出系统，其中排出系统包括用于将液体与混合物中的气体分离的分离罐，以及分离罐压力控制器，其连接到 分离罐的非液浸区域，并且在非液浸区域保持稳定的压力。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009200530A

公开(公告)日：2009-09-03

申请号：JP2009138068

申请日：2009-06-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  DONDERS SJOERD NICOLAAS L ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  VAN DER NET ANTONIUS J ,  TEUNISSEN FRANCISCUS JOHANNES ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAY JACOBUS JOHANNUS LEONA ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an improved system and method for evacuating a mixture of liquid and gas from components in a lithographic apparatus. SOLUTION: The lithographic apparatus includes a liquid supply system configured to fill a space between a projection system and a substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, wherein the evacuation system has a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain stable pressure within the non-liquid-filled region. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于从光刻设备中的组件抽空液体和气体的混合物的改进的系统和方法。 解决方案：光刻设备包括液体供应系统，其配置成用液体填充投影系统和基底之间的空间，出口构造成去除液体和气体的混合物，其通过液体和液体的液体限制结构之间的间隙 所述液体供应系统和所述基板以及被配置为通过所述出口抽吸所述混合物的抽空系统，其中所述抽空系统具有布置成将液体与所述混合物中的气体分离的分离器罐和分离器箱压力控制器， 分离罐的充满液体的区域，被配置为在非液体填充区域内保持稳定的压力。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006128677A

公开(公告)日：2006-05-18

申请号：JP2005306586

申请日：2005-10-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  VAN MEER ASCHWIN LODEWIJK HEND ,  OTTENS JOOST JEROEN ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: H01L21/67109 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a device provided with a support table for supporting a substrate. SOLUTION: The support table WT includes a plurality of support protrusions 2 that contact the substrate W when used to support the substrate W, and includes a plurality of heat transmission protrusions 3 that never contact the substrate W and are extended towards the substrate W when the substrate W is supported by the protrusions 2 in use. A heat exchange gap containing gas for exchanging the heat with the substrate W is extended between the protrusions 3 and the substrate W. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种设置有用于支撑基板的支撑台的装置。 解决方案：支撑台WT包括多个支撑突起2，其在用于支撑基板W时与基板W接触，并且包括多个不接触基板W并且朝基板延伸的传热突起3 当基板W在使用中由突起2支撑时，W是W。 包含用于与衬底W交换热量的气体的热交换间隙在突起3和衬底W之间延伸。版权所有（C）2006，JPO＆NCIPI

公开(公告)号：SG136117A1

公开(公告)日：2007-10-29

申请号：SG2007025513

申请日：2007-04-05

Applicant: ASML NETHERLANDS BV

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  LEENDERS MARTINUS HENDRIKUS AN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN