POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.

    公开(公告)号:NL2009196A

    公开(公告)日:2013-02-27

    申请号:NL2009196

    申请日:2012-07-17

    Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

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