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    Lithograph apparatus and method for manufacturing device
    2.
    发明专利
    Lithograph apparatus and method for manufacturing device 有权
    LITHOGRAPH设备和制造设备的方法

    公开(公告)号：JP2005142565A

    公开(公告)日：2005-06-02

    申请号：JP2004319973

    申请日：2004-11-04

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： TEGENBOSCH HENRICUS GERARDUS

    IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H02K41/02 ,  H02K41/03

    CPC classification number: G03F7/70758

    Abstract: PROBLEM TO BE SOLVED: To provide a conveying structure for moving substrates and/or masks mutually and relatively within a lithograph apparatus. SOLUTION: The conveying structure includes a linear motor equipped with beams and a sliding body. The beam is hollow and the inner surface concave inward crosses the conveying direction. The sliding body comes into contact with and is supported by the inner surface concave at least in the two directions crossing the conveying direction. It is preferable that the transfer section of the motor (electromagnet) be arranged on the sliding body on the outside of the inner space of the beam between the support areas of the substrate or the mask. Due to this, it becomes possible to reduce the torque generated by the acceleration of the motor. Further, it is possible to apply a pre-tension for a gas bearer between the beam and the sliding body by using the motor. COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供用于在光刻设备内相互且相对地移动基板和/或掩模的输送结构。

    解决方案：输送结构包括配有梁和滑动体的线性电机。 梁是中空的，并且向内凹的内表面穿过输送方向。 滑动体至少在与输送方向交叉的两个方向上与内表面接触并由其支撑。 电动机（电磁体）的转印部优选配置在基板的内部空间的外侧的滑动体的基板或掩模的支撑区域之间。 由此，能够减小由电动机的加速度产生的转矩。 此外，可以通过使用电动机对梁和滑动体之间的气体承载体施加预张力。 版权所有（C）2005，JPO＆NCIPI

    5.
    发明专利
    未知

    公开(公告)号：DE602004011724T2

    公开(公告)日：2009-02-19

    申请号：DE602004011724

    申请日：2004-11-03

    Applicant: ASML NETHERLANDS BV

    Inventor： TEGENBOSCH HENRICUS GERARDUS

    IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H02K41/02 ,  H02K41/03

    Abstract: A transport structure is provided for moving a substrate and or mask relative to one another in a lithographic apparatus. The transport structure comprises a linear motor with a beam and a slide. The beam is hollow with a concave interior surface transverse to the transport direction. The slide is supported against the concave interior surface in at least two directions transverse to the transport direction. Preferably, the transporter part of the motor (an electromagnet) is located on the slide outside the interior space of the beam, between a support area for the substrate or mask. This makes it possible to reduce the torque due to the motor acceleration. Also the motor can be used to provide pretension for a gas bearing between the beam and the slide.

    7.
    发明专利
    未知

    公开(公告)号：DE602004011724D1

    公开(公告)日：2008-03-27

    申请号：DE602004011724

    申请日：2004-11-03

    Applicant: ASML NETHERLANDS BV

    Inventor： TEGENBOSCH HENRICUS GERARDUS

    IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H02K41/02 ,  H02K41/03

    Abstract: A transport structure is provided for moving a substrate and or mask relative to one another in a lithographic apparatus. The transport structure comprises a linear motor with a beam and a slide. The beam is hollow with a concave interior surface transverse to the transport direction. The slide is supported against the concave interior surface in at least two directions transverse to the transport direction. Preferably, the transporter part of the motor (an electromagnet) is located on the slide outside the interior space of the beam, between a support area for the substrate or mask. This makes it possible to reduce the torque due to the motor acceleration. Also the motor can be used to provide pretension for a gas bearing between the beam and the slide.

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