公开(公告)号：JP2003113481A

公开(公告)日：2003-04-18

申请号：JP2002227213

申请日：2002-08-05

Applicant: IBM

Inventor： BHATT ANILKUMAR C ,  WAGNER JEROME J

IPC: B01D19/00 ,  B01D1/24 ,  B01D3/14 ,  C01B32/50 ,  C07C68/08 ,  C23F1/46 ,  H01L21/306

Abstract: PROBLEM TO BE SOLVED: To provide a method for recovering an organic solvent from a waste liquid containing the organic solvent, supercritical carbon dioxide (CO2 ), and an etchant contaminants. SOLUTION: In this method, the organic solvent is separated from the waste liquid comprising supercritical CO2 , the organic solvent, and the etchant contaminants. The method comprises separating the supercritical CO2 by subjecting the waste liquid to elevated temperature and/or reduced pressure, to thereby obtain a first composition containing supercritical CO2 and a second composition containing the organic solvent free of the supercritical CO2 ; and then removing non-volatile etching contaminants from the second composition, to recover the organic solvent by at least one of the following: evaporation, distillation, filtration, centrifugation and settling.

公开(公告)号：ES2151501T3

公开(公告)日：2001-01-01

申请号：ES93480108

申请日：1993-07-30

Applicant: IBM

Inventor： BANTU NAGESCHWER R ,  KEESLER ROSS W ,  SINCLAIR TERRY D ,  BHATT ANILKUMAR C ,  PAPATHOMAS KONSTANTINOS ,  WAGNER JEROME J

IPC: B01D3/00 ,  C07D317/36 ,  G03F7/30 ,  G03F7/42 ,  H01L21/02 ,  H01L21/027 ,  H01L21/30

公开(公告)号：AT196902T

公开(公告)日：2000-10-15

申请号：AT93480108

申请日：1993-07-30

Applicant: IBM

Inventor： BANTU NAGESCHWER R ,  KEESLER ROSS W ,  SINCLAIR TERRY D ,  BHATT ANILKUMAR C ,  PAPATHOMAS KONSTANTINOS ,  WAGNER JEROME J

IPC: B01D3/00 ,  C07D317/36 ,  G03F7/30 ,  G03F7/42 ,  H01L21/02 ,  H01L21/027 ,  H01L21/30

公开(公告)号：DE69329537D1

公开(公告)日：2000-11-16

申请号：DE69329537

申请日：1993-07-30

Applicant: IBM

Inventor： BANTU NAGESCHWER R ,  KEESLER ROSS W ,  SINCLAIR TERRY D ,  BHATT ANILKUMAR C ,  PAPATHOMAS KONSTANTINOS ,  WAGNER JEROME J

IPC: B01D3/00 ,  C07D317/36 ,  G03F7/30 ,  G03F7/42 ,  H01L21/02 ,  H01L21/027 ,  H01L21/30

公开(公告)号：CA2110472A1

公开(公告)日：1994-09-02

申请号：CA2110472

申请日：1993-12-01

Applicant: IBM

Inventor： BHATT ANILKUMAR C ,  BUDA LEO R ,  EDWARDS ROBERT D ,  HART PAUL J ,  INGRAHAM ANTHONY P ,  MARKOVICH VOYA R ,  MOLLA JAYNAL A ,  MURPHY RICHARD G ,  SAXENMEYER GEORGE J JR ,  WALKER GEORGE F ,  WHALEN BETTE J ,  ZARR RICHARD S

IPC: G01R31/28 ,  H01L21/60 ,  H01L21/66 ,  G01R31/26

Abstract: A method of testing semiconductor chips is disclosed. The individual semiconductor chips have I/O, power, and ground contacts. In the method of the invention a chip carrier is provided. The chip carrier has contacts corresponding to the contacts on the semiconductor chip. The carrier contacts have dendritic surfaces. The chip contacts are brought into conductive contact with the conductor pads on the chip carrier. Test signal input vectors are applied to the inputs of the semiconductor chip, and output signal vectors are recovered from the semiconductor chip. After testing, the chip may be removed from the substrate. Alternatively, the chip may be bonded through the dendritic conductor pads to the substrate after successful testing.

公开(公告)号：DE69329537T2

公开(公告)日：2001-06-07

申请号：DE69329537

申请日：1993-07-30

Applicant: IBM

Inventor： BANTU NAGESCHWER R ,  KEESLER ROSS W ,  SINCLAIR TERRY D ,  BHATT ANILKUMAR C ,  PAPATHOMAS KONSTANTINOS ,  WAGNER JEROME J

IPC: B01D3/00 ,  C07D317/36 ,  G03F7/30 ,  G03F7/42 ,  H01L21/02 ,  H01L21/027 ,  H01L21/30

公开(公告)号：SG67425A1

公开(公告)日：1999-09-21

申请号：SG1997003615

申请日：1995-08-11

Applicant: IBM

Inventor： BHATT ANILKUMAR C ,  KSENAK GARY S ,  PAPATHOMAS KOSTAS I ,  SHURTLEFF JAMES A ,  WAGNER JEROME J

IPC: G03F7/32 ,  G03F7/42 ,  B01D53/72 ,  B01D53/14 ,  G03F7/30

Abstract: A method is disclosed for using the simple, environmentally-friendly organic compounds gamma-butyrolactone and benzyl alcohol to develop and to strip free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases the developers and strippers include gamma butyrolactone or benzyl alcohol. The developers and strippers optionally also include a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water. During development of the photopatterned resist or solder mask, the unpolymerized regions are dissolved in the disclosed developers. During stripping of the resist or solder mask, the polymerized regions are debonded from a circuit board in the disclosed strippers. Following removal of the developers and strippers, any residual monomers or polymers of the resist or solder mask as well as residual developing solution and stripping solution are rinsed from the printed circuit package. A method is also disclosed for treating the combined developer and stripper rinse effluents in an activated biomass to reduce the biological oxygen demand of the developer/stripper/resist/solder mask waste streams.