公开(公告)号：JPH10182989A

公开(公告)日：1998-07-07

申请号：JP25249297

申请日：1997-09-17

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  FAHEY JAMES THOMAS ,  HEFFERON GEORGE JOSEPH ,  HUANG WU-SONG ,  JAGANNATHAN PREMLATHA ,  KATNANI AHMAD DAUOD ,  KHOJASTEH MAHMOUD ,  KWONG RANEE WAI-LING ,  KIM YAN LEE ,  SACHDEV HARBANS SINGH ,  SACHDEV KRISHNA GANDI ,  SOORIYAKUMARAN RATNAM ,  WOOD ROBERT LAVIN

IPC: C08L25/02 ,  C08L61/10 ,  C08L101/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To make a composition hardly receive a disadvantageous reaction with environmental contaminants, enhance the tolerance for variable or long delay between exposure and printing after the exposure or printing after the exposure and development, eliminate any deterioration in a profile, stabilize the solubility in solvents and impart storage life thereof in a solution for a long period at ambient temperature. SOLUTION: This microlithographic composition comprises a composition, containing a film-forming polymer substituted at the o-position with an acid unstable compound containing a ketal component in at least a part of a chemically bound recurring hydroxyl group and an acid-generating compound, capable of forming an acid by exposure to actinic radiations and chemically bound to the polymer and used as the microlithographic composition. The acid generated by the exposure initiates the cleavage of at least a part of the compound containing the ketal component and the exposed composition becomes selectively more soluble in an aqueous base as compared with an unexposed composition.

公开(公告)号：DE69231175D1

公开(公告)日：2000-07-20

申请号：DE69231175

申请日：1992-10-23

Applicant: IBM

Inventor： SACHDEV HARBANS SINGH ,  CONLEY WILLARD EARL ,  JAGANNATHAN PREMLATHA ,  KATNANI AHMAD DAUOD ,  WAI-LING KWONG RANEE ,  LINEHAN LEO LAWRENCE ,  MIURA STEVE SEIICHI ,  SMITH RANDOLPH JOSEPH

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30

Abstract: High sensitivity, high contrast, heat-stable resist compositions for use in deep UV, i-line e-beam and x-ray lithography. These compositions comprise a film-forming polymer having aromatic rings activated for electrophilic substitution, an acid catalyzable crosslinking agent which forms a hydroxy-stabilized carbonium ion, and a photoacid generator. The compositions are aqueous base developable.

公开(公告)号：DE69231175T2

公开(公告)日：2000-12-14

申请号：DE69231175

申请日：1992-10-23

Applicant: IBM

Inventor： SACHDEV HARBANS SINGH ,  CONLEY WILLARD EARL ,  JAGANNATHAN PREMLATHA ,  KATNANI AHMAD DAUOD ,  WAI-LING KWONG RANEE ,  LINEHAN LEO LAWRENCE ,  MIURA STEVE SEIICHI ,  SMITH RANDOLPH JOSEPH

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30

Abstract: High sensitivity, high contrast, heat-stable resist compositions for use in deep UV, i-line e-beam and x-ray lithography. These compositions comprise a film-forming polymer having aromatic rings activated for electrophilic substitution, an acid catalyzable crosslinking agent which forms a hydroxy-stabilized carbonium ion, and a photoacid generator. The compositions are aqueous base developable.