1.
    发明专利
    未知

    公开(公告)号:DE19958151B4

    公开(公告)日:2006-05-04

    申请号:DE19958151

    申请日:1999-12-03

    Abstract: Lateral high voltage semiconductor element comprises a semiconductor substrate (1) of first conductivity with a semiconductor layer (2) of second conductivity having an active zone (3). Semiconductor regions (11, 12) of first and second conductivity are provided on the semiconductor layer by selective multiple epitaxy. An Independent claim is also included for a process for the production of a lateral high voltage semiconductor element, comprising back-etching an insulating layer provided on the edges of the semiconductor regions (11, 12) after selective multiple epitaxy and then carrying out further selective epitaxy to form a connecting layer. Preferred Features: The semiconductor regions have a thickness of 1-100 nm, especially 50 nm.

Patent Agency Ranking