公开(公告)号：US20080073585A1

公开(公告)日：2008-03-27

申请号：US11702677

申请日：2007-02-06

Applicant: Jitsuo Takada ,  Minoru Ikeda ,  Satoshi Matsufune

Inventor： Jitsuo Takada ,  Minoru Ikeda ,  Satoshi Matsufune

IPC: H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/09 ,  H01J2237/022 ,  H01J2237/045

Abstract: An ion implanting apparatus is provided, which prevents a failure of the processing object caused by a scattering of the deposited particles of the ion species on an inner surface of a through hole of a member that forms a beam geometry of an ion beam. Since at least an inner surface of the through hole 222 of the member 220 having a through hole and being capable of forming a beam geometry is coated with a thermal spraying film, unwanted deposition of the ion species on the inner surface of the through hole 222 is inhibited. Moreover, since a deposition film generated on the surface of the thermal spraying film has an unoriented poly-crystalline structure that exhibits extremely higher inter-layer adhesiveness, a failure of the processing object caused by a scattering of the particles peeled-off from the deposition layer is prevented.

Abstract translation: 提供了一种离子注入装置，其防止由形成离子束的束几何形状的构件的通孔的内表面上的离子物质的沉积颗粒的散射引起的加工对象的故障。 由于具有通孔并且能够形成光束几何形状的构件220的通孔222的至少内表面涂覆有热喷涂膜，所以不希望的沉积在通孔222的内表面上 被抑制。 此外，由于在热喷涂膜的表面上产生的沉积膜具有显示出非常高的层间粘附性的未取向的多晶体结构，所以由于从沉积物剥离的颗粒的飞散引起的加工对象的故障 防止了层。

公开(公告)号：US20080073578A1

公开(公告)日：2008-03-27

申请号：US11527842

申请日：2006-09-27

Applicant: Kasegn D. Tekletsadik ,  Russell J. Low

Inventor： Kasegn D. Tekletsadik ,  Russell J. Low

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/09 ,  H01J37/16 ,  H01J2237/0206 ,  H01J2237/026 ,  H01J2237/038 ,  H01J2237/08

Abstract: An apparatus includes a conductive structure and an insulated conductor disposed proximate an exterior portion of the conductive structure to modify an electric field about the conductive structure. The insulated conductor has an insulator with a dielectric strength greater than 75 kilovolts (kV)/inch disposed about a conductor. An ion implanter is also provided. The ion implanter includes an ion source configured to provide an ion beam, a terminal structure defining a cavity, the ion source at least partially disposed within the cavity, and an insulated conductor. The insulated conductor is disposed proximate an exterior portion of the terminal structure to modify an electric field about the terminal structure. The insulated conductor has an insulator with a dielectric strength greater than 75 kV/inch disposed about a conductor.

Abstract translation: 一种装置包括导电结构和布置在导电结构的外部附近的绝缘导体，以修改围绕导电结构的电场。 绝缘导体具有介于绝缘体上的介电强度大于75千伏（kV）/英寸的导体周围。 还提供了离子注入机。 离子注入机包括被配置为提供离子束的离子源，限定空腔的端子结构，至少部分地设置在空腔内的离子源和绝缘导体。 绝缘导体设置在端子结构的外部附近以修改围绕端子结构的电场。 绝缘导体具有介于绝缘体上的介电强度大于75kV /英寸的导体周围。

公开(公告)号：US07244949B2

公开(公告)日：2007-07-17

申请号：US11366533

申请日：2006-03-03

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle

IPC: G21K5/10 ,  G21K7/00 ,  H01J37/28

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

Abstract translation: 电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。 电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。 第一磁场区域被主光束路径和次光束路径穿过。 第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。 第一和第二磁场区域以基本上相反的方向偏转主光束路径。 第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。 第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

公开(公告)号：US20070138403A1

公开(公告)日：2007-06-21

申请号：US10569963

申请日：2004-08-02

Applicant: Dane Cubric ,  Pieter Kruit

Inventor： Dane Cubric ,  Pieter Kruit

IPC: H01J1/50

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/263 ,  H01J2237/045 ,  H01J2237/0453 ,  H01J2237/0455 ,  H01J2237/0456 ,  H01J2237/0458

Abstract: A particle optical apparatus including an aperture plate for shaping a particle beam before the particle beam enters a monochromator filter assembly. The aperture plate has at least one aperture and is adjustable with respect to the monochromator filter assembly, in normal operating conditions, so that the size of the aperture used to shape the particle beam can be varied, and therefore the beam current entering the filter assembly can be varied.

Abstract translation: 一种粒子光学装置，包括用于在粒子束进入单色器过滤器组件之前成形粒子束的孔板。 孔板具有至少一个孔，并且在正常操作条件下可相对于单色仪滤光器组件可调节，使得用于成形粒子束的孔的尺寸可以改变，因此射入电流进入过滤组件 可以变化。

公开(公告)号：US20070069149A1

公开(公告)日：2007-03-29

申请号：US11238570

申请日：2005-09-29

Applicant: Earl Weltmer

Inventor： Earl Weltmer

IPC: H01J3/38

CPC classification number: H01J37/045 ,  H01J37/09

Abstract: A combined aperture, aperture holder, vacuum feed through and beam blanker for a beam of charged particles fits into an existing aperture in a charged particle beam device such as a scanning electron microscope or an ion beam chamber.

Abstract translation: 用于带电粒子束的组合孔，孔保持器，真空进料通道和束消除器装配到带电粒子束装置（例如扫描电子显微镜或离子束室）中的现有孔中。

公开(公告)号：US07189982B2

公开(公告)日：2007-03-13

申请号：US11205086

申请日：2005-08-17

Applicant: Yuichi Madokoro ,  Shigeru Izawa ,  Kaoru Umemura ,  Hiroyasu Kaga

Inventor： Yuichi Madokoro ,  Shigeru Izawa ,  Kaoru Umemura ,  Hiroyasu Kaga

IPC: H01J37/08

CPC classification number: H01J37/09 ,  H01J2237/022 ,  H01J2237/0805 ,  H01J2237/3109

Abstract: In an aperture for use in an ion beam optical system having its surface coated with a liquid metal, instability of an ion source attributable to sputtering and re-deposition of an aperture base material is prevented. A focused ion beam apparatus using a liquid metal ion source has an aperture for limiting an ion beam diameter. The aperture has a vessel formed with a recess having, at its surface lowermost point, an aperture hole through which the ion beam passes and a liquid metal mounted on the recess, the liquid metal being used for the liquid metal ion source. Preferably, the aperture may be minimized in area of aperture entrance hole inner surface which exposes the base material by tapering an aperture hole portion, by which the ion beam passes, on the downstream side.

Abstract translation: 在用于其表面涂覆有液态金属的离子束光学系统的孔中，防止归因于溅射的离子源的不稳定性和孔基材的再沉积。 使用液体金属离子源的聚焦离子束装置具有用于限制离子束直径的孔。 孔具有形成有凹槽的容器，凹槽在其表面的最低点处具有离子束通过的孔眼和安装在凹部上的液态金属，液态金属用于液体金属离子源。 优选地，孔径可以在孔径入口孔内表面的面积中最小化，孔面内表面通过使下游侧的离子束通过的孔眼部分变细而露出基底材料。

公开(公告)号：US20070018093A1

公开(公告)日：2007-01-25

申请号：US11489437

申请日：2006-07-20

Applicant: Hyun-Sub Earm ,  Seung-Se Lee ,  Young-Dae Kim ,  Gon-Su Kang ,  Sung-Yeul An

Inventor： Hyun-Sub Earm ,  Seung-Se Lee ,  Young-Dae Kim ,  Gon-Su Kang ,  Sung-Yeul An

IPC: B01D59/44

CPC classification number: H01J49/24 ,  H01J37/05 ,  H01J37/09 ,  H01J37/3171 ,  H01J49/025 ,  H01J49/0495 ,  H01J2237/0225 ,  H01J2237/028 ,  H01J2237/31705

Abstract: In an analyzing chamber for a mass analyzer, a body of the analyzing chamber may include an inlet through which an ion beam enters and an outlet through which the ion beam leaves. A shielding section may be installed on a sidewall. The shielding section may prevent the ion beam traveling along a path in the body from causing damage to the sidewall of the body. A detector may be interposed between the sidewall of the body and the shielding section. The detector may detect an ion beam leaking through the shielding section. Accordingly, damage to the sidewall of the body may be sufficiently reduced and/or prevented.

Abstract translation: 在用于质量分析器的分析室中，分析室的主体可以包括离子束进入的入口和离子束离开的出口。 屏蔽部分可以安装在侧壁上。 屏蔽部分可以防止沿着身体中的路径行进的离子束对身体的侧壁造成损坏。 检测器可以插入在主体的侧壁和屏蔽部分之间。 检测器可以检测通过屏蔽部分泄漏的离子束。 因此，可以充分减少和/或防止对身体侧壁的损坏。

公开(公告)号：US20060284116A1

公开(公告)日：2006-12-21

申请号：US11445667

申请日：2006-06-02

Applicant: Donald Berrian ,  John Vanderpot

Inventor： Donald Berrian ,  John Vanderpot

IPC: H01J37/08

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/09 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H01J2237/30433 ,  H01J2237/31705

Abstract: A system and method for mitigating contamination in an ion implantation system is provided. The system comprises an ion source, a power supply operable to supply power to a filament and mirror electrode of the ion source, a workpiece handling system, and a controller, wherein the ion source is selectively tunable via the controller to provide rapid control of a formation of an ion beam. The controller is operable to selectively rapidly control power to the ion source, therein modulating a power of the ion beam between an implantation power and a minimal power in less than approximately 20 microseconds based, at least in part, to a signal associated with a workpiece position. Control of the ion source therefore mitigates particle contamination in the ion implantation system by minimizing an amount of time at which the ion beam is at the implantation current.

公开(公告)号：US20060232445A1

公开(公告)日：2006-10-19

申请号：US11450382

申请日：2006-06-12

Applicant: Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

Inventor： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

IPC: H03M1/22

CPC classification number: H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

公开(公告)号：US20050178982A1

公开(公告)日：2005-08-18

申请号：US11058695

申请日：2005-02-15

Applicant: Alexander Henstra ,  Jaroslav Chmelik

Inventor： Alexander Henstra ,  Jaroslav Chmelik

IPC: G21K1/00 ,  G21K1/02 ,  H01J37/05 ,  H01J37/09 ,  H01J37/153 ,  H01J37/26 ,  H01J3/26

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/153 ,  H01J37/26

Abstract: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 13 eccentrically through a lens 6. As a result of this, energy dispersion will occur in an image 15 formed by the lens 6. By projecting this image 15 onto a diaphragm 7, it is possible to only allow particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 16 will have a reduced energy spread. By adding a deflection unit 10, this particle beam 16 can be deflected toward the optical axis 2. One can also elect to deflect a beam 12 going through the middle of the lens 6—and having, for example, greater current—toward the optical axis.

Abstract translation: 本发明描述了发生能量选择的粒子源。 通过透镜6偏心地发送带电粒子13的光束来进行能量选择。其结果是，由透镜6形成的图像15中会发生能量分散。通过将该图像15投影到膜片7上， 可能只允许能谱范围的有限部分的粒子通过。 因此，通过的光束16将具有减小的能量扩展。 通过添加偏转单元10，该粒子束16可以朝向光轴2偏转。还可以选择使穿过透镜6的中部的光束12偏转并具有例如更大的电流朝向光学 轴。