Abstract:
A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+.
Abstract:
Disclosed is an optical fiber having a core with an alkali metal oxide dopant in an peak amount greater than about 0.002 wt. % and less than about 0.1 wt. %. The alkali metal oxide concentration varies with a radius of the optical fiber. By appropriately selecting the concentration of alkali metal oxide dopant in the core and the cladding, a low loss optical fiber may be obtained. Also disclosed are several methods of making the optical fiber including the steps of forming an alkali metal oxide-doped rod, and adding additional glass to form a draw perform. Preferably, the draw preform has a final outer dimension (d2), wherein an outer dimension (d1) of the rod is less than or equal to 0.06 times the final outer dimension (d2). In a preferred embodiment, the alkali metal oxide-doped rod is inserted into the centerline hole of a preform to form an assembly.
Abstract:
One aspect relates to a method for the manufacture of doped quartz glass. Moreover, one aspect relates to quartz glass obtainable according to the method including providing a soot body, treating the soot body with a gas, heating an intermediate product and vitrifying an intermediate product.
Abstract:
A single mode optical fiber having a core made from silica and less than or equal to about 6.5 weight % germania and having a maximum relative refractive index Δ1MAX. The optical fiber also has an inner cladding surrounding the core and having a minimum relative refractive index Δ2MIN. A difference between a softening point of the core and a softening point of the inner cladding is less than or equal to about 20° C., and Δ1MAX>Δ2MIN. The single mode optical fiber may also have an outer cladding surrounding the inner cladding made from silica or SiON. The outer cladding has a maximum relative refractive index Δ3MAX, and Δ3MAX>Δ2MIN. A method for manufacturing an optical fiber includes providing a preform to a first furnace, the preform, drawing the optical fiber from the preform, and cooling the drawn optical fiber in a second furnace.
Abstract:
Methods for producing an optical fiber by elongating a silica glass blank or a coaxial group of silica glass components, on the basis of which a fiber is obtained that comprises a core zone, an inner jacket zone enclosing the core zone and a ring zone surrounding the inner jacket zone, are known. In order to provide, proceeding from this, a method, a tubular semi-finished product and a group of coaxial components for the cost-effective production of an optical fiber, which is characterized by a high quality of the boundary between the core and jacket and by low bending sensitivity, according to the invention, the silica glass of the ring zone is provided in the form of a ring zone tube made of silica glass having a mean fluorine content of at least 6000 weight ppm and the tube has an inner tube surface and an outer tube surface, wherein via the wall of the ring zone tube, a radial fluorine concentration profile is adjusted which has an inner fluorine depletion layer with a layer thickness of at least 1 μm and no more than 10 μm, in which the fluorine content decreases toward the inner tube surface and is no more than 3000 weight ppm in a region close to the surface which has a thickness of 1 μm.
Abstract:
A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor, wherein the porogen is a C4 to C14 cyclic hydrocarbon compound having a non-branching structure and a degree of unsaturation equal to or less than 2; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the labile organic material to provide the porous film with pores and a dielectric constant less than 2.6.
Abstract:
The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.
Abstract:
There is provided a method for producing an optical fiber having low attenuation, the optical fiber including a core that contains an alkali metal element. An optical fiber preform that includes a core part and a cladding part is drawn with a drawing apparatus to form an optical fiber, the core part having an average concentration of an alkali metal element of 5 atomic ppm or more. During the drawing, the time the temperature of glass is maintained at 1500° C. or higher is 110 minutes or less. The drawing speed is preferably 1200 m/min or more and more preferably 1500 m/min to 2300 m/min. The optical fiber preform preferably has a diameter of 70 mm to 170 mm and more preferably 90 mm to 150 mm.
Abstract:
The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the mask blank has a birefringence, as measured at a wavelength of 193 nm, of 1 nm or less per substrate thickness. According to the present invention, mask blanks suitable for use in the immersion exposure technique and the polarized illumination technique are provided.
Abstract:
The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.