X-Ray Spectroscopy in a charged-particle microscope

    公开(公告)号:US20190172681A1

    公开(公告)日:2019-06-06

    申请号:US16173175

    申请日:2018-10-29

    Applicant: FEI Company

    Abstract: A method of operating a charged particle microscope comprising: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles, and irradiating the specimen with said beam; Using a detector to detect X-ray radiation emanating from the specimen in response to said irradiation, and to produce a spectrum comprising X-ray characteristic peaks on a Bremsstrahlung background, comprising the following additional steps: Using an elemental decomposition algorithm to analyze the characteristic peaks in said spectrum, thereby determining a reference group of major chemical elements contributing to the spectrum; Calculating an average atomic number for said reference group, and using this in a predictive model to generate a calculated Bremsstrahlung profile for the reference group; Fitting said calculated Bremsstrahlung profile to the Bremsstrahlung background in said spectrum, and attributing a discrepancy between the latter and the former to a residual element absent from, or incorrectly quantified in, said reference group.

    Methods and apparatus for semiconductor sample workflow

    公开(公告)号:US10312162B2

    公开(公告)日:2019-06-04

    申请号:US15615494

    申请日:2017-06-06

    Applicant: FEI Company

    Abstract: Apparatus and methods are described for the automated transfer and storage of transmission electron microscope (TEM) and scanning/transmission electron microscope (STEM) lamella samples throughout a semiconductor manufacturing facility using existing automation infrastructure such as a Front Opening Unified Pod (FOUP). Also provided are wafer facsimiles corresponding to outer dimensions of semiconductor, data storage or solar cell wafers, wherein the facsimiles adapted to store, carry and/or provide a testing platform for testing of samples taken from semiconductor, data storage or solar cell wafers.

    SPECIMEN PREPARATION AND INSPECTION IN A DUAL-BEAM CHARGED PARTICLE MICROSCOPE

    公开(公告)号:US20190108971A1

    公开(公告)日:2019-04-11

    申请号:US16036017

    申请日:2018-07-16

    Applicant: FEI Company

    Abstract: A method of preparing a specimen in a dual-beam charged particle microscope having: an ion beam column, that can produce an ion beam that propagates along an ion axis; an electron beam column, that can produce an electron beam that propagates along an electron axis, comprising the following steps: Providing a precursor sample on a sample holder; Using said ion beam to cut a furrow around a selected portion of said sample; Attaching a manipulator needle to said portion, severing said portion from the rest of said sample, and using the needle to perform a lift-out of the portion away from the rest of the sample, particularly comprising: Configuring the manipulator needle to have multiple degrees of motional freedom, comprising at least: Eucentric tilt a about a tilt axis that passes through an intersection point of said ion and electron axes and is perpendicular to said electron axis; Rotation φ about a longitudinal axis of the needle; Whilst maintaining said portion on said needle, using said ion beam to machine at least one surface of said portion, so as to create said specimen; Whilst maintaining said portion on said needle, inspecting it with said electron beam, for at least two different values of said φ rotation.

    LAMELLA-SHAPED TARGETS FOR X-RAY GENERATION
    127.
    发明申请

    公开(公告)号:US20190017942A1

    公开(公告)日:2019-01-17

    申请号:US16032889

    申请日:2018-07-11

    Applicant: FEI Company

    Inventor: Jorge Filevich

    Abstract: A method and system are disclosed for producing an x-ray image of a sample using a lamella-shaped target to improve the usual tradeoff between imaging resolution and image acquisition time. A beam of electrons impacts the lamella-shaped target normal to the narrower dimension of the lamella which then determines the virtual source size along that axis. For low-energy x-ray generation, the small electron penetration depth parallel to the wider dimension of the lamella determines the virtual source size along that axis. Conductive cooling of the target is improved over post targets with the same imaging resolution. The lamella-shaped target is long enough to ensure that the electron beam does not impact the support structure which would degrade the imaging resolution. Target materials may be selected from the same metals used for bulk or post targets, including tungsten, molybdenum, titanium, scandium, vanadium, silver, or a refractory metal.

    Optical nanoprobing of integrated circuits

    公开(公告)号:US10175295B2

    公开(公告)日:2019-01-08

    申请号:US15192976

    申请日:2016-06-24

    Applicant: FEI Company

    Abstract: Apparatus for electrical and optical nanoprobing at resolution beyond optical diffraction limit. Navigation microscope is configured for navigation to a region of interest. A probe spatial positioner supports a fork and an oscillating piezotube is attached to the free end of the fork and provides an output indicating of a distance to the sample. A single-mode optical fiber having a near-field transducer formed at an end thereof is attached to the oscillating piezotube such that the near-field transducer extends below the oscillating piezotube towards the sample. A photodetector is positioned to detect photons collected from the sample. The near-field transducer may be formed as a tapered section formed at the end of the single-mode optical fiber, a metallic coating formed at a tip of the tapered section, and an aperture formed in the metallic coating so as to expose the tip of the tapered section through the metallic coating.

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