METHOD FOR TRANSFERRING GRAPHENE
    123.
    发明申请
    METHOD FOR TRANSFERRING GRAPHENE 审中-公开
    转印石墨的方法

    公开(公告)号:US20170057812A1

    公开(公告)日:2017-03-02

    申请号:US15220234

    申请日:2016-07-26

    Applicant: GRAPHENEA S.A.

    Abstract: A method of transferring graphene onto a target substrate having cavities and/or holes or onto a substrate having at least one water soluble layer is disclosed. It comprises the steps of: applying a protective layer (4) onto a sample comprising a stack (20) formed by a graphene monolayer (2) grown on a metal foil or on a metal thin film on a silicon substrate (1); attaching to said protective layer (4) a frame (5) comprising at least one outer border and at least one inner border, said frame (5) comprising a substrate and a thermal release adhesive polymer layer, the frame (5) providing integrity and allowing the handling of said sample; removing or detaching said metal foil or metal thin film on a silicon substrate (1); once the metal foil or metal thin film on a silicon substrate (1) has been removed or detached, drying the sample; depositing the sample onto a substrate (7); removing said frame (5) by cutting through said protective layer (4) at said at least one inner border of the frame (5) or by thermal release.

    Abstract translation: 公开了一种将石墨烯转移到具有空穴和/或空穴的目标基底上或具有至少一个水溶性层的基底上的方法。 其包括以下步骤:将保护层(4)施加到包含由在金属箔上生长的石墨烯单层(2)或在硅衬底(1)上的金属薄膜上形成的堆叠(20)的样品上; 附接到所述保护层(4)包括至少一个外边界和至少一个内边界的框架(5),所述框架(5)包括基底和热释放粘合聚合物层,所述框架(5)提供完整性和 允许处理所述样品; 在硅衬底(1)上移除或分离所述金属箔或金属薄膜; 一旦硅衬底(1)上的金属箔或金属薄膜被去除或分离,干燥样品; 将样品沉积到衬底(7)上; 通过在框架(5)的所述至少一个内边界处切割所述保护层(4)或通过热释放来移除所述框架(5)。

    MEMS-CMOS DEVICE THAT MINIMIZES OUTGASSING AND METHODS OF MANUFACTURE
    126.
    发明申请
    MEMS-CMOS DEVICE THAT MINIMIZES OUTGASSING AND METHODS OF MANUFACTURE 有权
    最小化出口的MEMS-CMOS器件和制造方法

    公开(公告)号:US20160221819A1

    公开(公告)日:2016-08-04

    申请号:US14748012

    申请日:2015-06-23

    Abstract: A MEMS device is disclosed. The MEMS device includes a first substrate. At least one structure is formed within the first substrate. The first substrate includes at least one first conductive pad thereon. The MEMS device also includes a second substrate. The second substrate includes a passivation layer. The passivation layer includes a plurality of layers. A top layer of the plurality of layers comprises an outgassing barrier layer. At least one second conductive pad and at least one electrode are coupled to the top layer. At least one first conductive pad is coupled to the at least one second conductive pad.

    Abstract translation: 公开了MEMS器件。 MEMS器件包括第一衬底。 在第一基板内形成至少一个结构。 第一衬底包括至少一个第一导电焊盘。 MEMS装置还包括第二基板。 第二基板包括钝化层。 钝化层包括多个层。 多个层的顶层包括除气阻挡层。 至少一个第二导电焊盘和至少一个电极耦合到顶层。 至少一个第一导电焊盘耦合到所述至少一个第二导电焊盘。

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